Supercritical Fluid Cleaning

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Supercritical Fluid Cleaning

Author : Samuel P. Sawan
Publisher : Elsevier
Page : 307 pages
File Size : 49,8 Mb
Release : 1998-12-31
Category : Technology & Engineering
ISBN : 9780815519164

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Supercritical Fluid Cleaning by Samuel P. Sawan Pdf

Although supercritial fluid (SCF) technology is now widely used in extraction and purification processes (in the petrochemical, food and pharmaceuticals industries), this book is the first to address the new application of cleaning. The objective is to provide a roadmap for readers who want to know whether SCF technology can meet their own processing and cleaning needs. It is particularly helpful to those striving to balance the requirements for a clean product and a clean environment. The interdisciplinary subject matter will appeal to scientists and engineers in all specialties ranging from materials and polymer sciences to chemistry and physics. It is also useful to those developing new processes for other applications, and references given at the end of each chapter provide links to the wider body of SCF literature. The book is organized with topics progressing from the fundamental nature of the supercritical state, through process conditions and materials interactions, to economic considerations. Practical examples are included to show how the technology has been successfully applied. The first four chapters consider principles governing SCF processing, detailing issues such as solubility, design for cleanability, and the dynamics of particle removal. The next three chapters discuss surfactants and microemulsions, SCF interaction with polymers, and the use of supercritical carbon dioxide (CO2) as a cleaning solvent. The closing chapters focus on more practical considerations such as scaleup, equipment costs, and financial analysis.

Handbook for Critical Cleaning, Second Edition - 2 Volume Set

Author : Barbara Kanegsberg,Edward Kanegsberg
Publisher : CRC Press
Page : 1109 pages
File Size : 45,9 Mb
Release : 2020-01-02
Category : Science
ISBN : 9781466515949

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Handbook for Critical Cleaning, Second Edition - 2 Volume Set by Barbara Kanegsberg,Edward Kanegsberg Pdf

This set consists of two volumes: Cleaning Agents and Systems and Applications, Processes, and Controls. Updated, expanded, re-organized, and rewritten, this two-volume handbook covers cleaning processes, applications, management, safety, and environmental concerns. The editors rigorously examine technical issues, cleaning agent options and systems, chemical and equipment integration, and contamination control, as well as cleanliness standards, analytical testing, process selection, implementation and maintenance, specific application areas, and regulatory issues. A collection of international contributors gives the text a global viewpoint. Color illustrations, video clips, and animation are available online to help readers better understand presented material.

Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques

Author : Rajiv Kohli,K.L. Mittal
Publisher : Elsevier
Page : 830 pages
File Size : 46,8 Mb
Release : 2018-11-27
Category : Technology & Engineering
ISBN : 9780128155783

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Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques by Rajiv Kohli,K.L. Mittal Pdf

Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries Serves as a guide to the selection of precision cleaning techniques for specific applications

Handbook for Critical Cleaning

Author : Barbara Kanegsberg,Edward Kanegsberg
Publisher : CRC Press
Page : 687 pages
File Size : 55,5 Mb
Release : 2000-12-26
Category : Science
ISBN : 9781420039825

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Handbook for Critical Cleaning by Barbara Kanegsberg,Edward Kanegsberg Pdf

With all the cleaning approaches available, how do you choose which one is best for your needs? Components manufacturers wonder which will provide a competitive edge. Chemists and engineers worry about the effect of any process modification on a critical component or on the stability of an irreplaceable antique. There is no silver bullet, n

Supercritical Fluid Technology for Drug Product Development

Author : Peter York,Uday B. Kompella,Boris Y. Shekunov
Publisher : CRC Press
Page : 640 pages
File Size : 55,6 Mb
Release : 2004-03-23
Category : Medical
ISBN : 9780824751029

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Supercritical Fluid Technology for Drug Product Development by Peter York,Uday B. Kompella,Boris Y. Shekunov Pdf

Interconnecting the fundamentals of supercritical fluid (SCF) technologies, their current and anticipated utility in drug delivery, and process engineering advances from related methodological domains and pharmaceutical applications, this volume unlocks the potential of supercritical fluids to further the development of improved pharmaceutical products-from drug powders for respiratory delivery to drug delivery systems for controlled release.

Cleaning with Solvents: Science and Technology

Author : John Durkee
Publisher : William Andrew
Page : 779 pages
File Size : 54,8 Mb
Release : 2013-11-29
Category : Science
ISBN : 9781455731619

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Cleaning with Solvents: Science and Technology by John Durkee Pdf

High-precision cleaning is required across a wide range of sectors, including aerospace, defense, medical device manufacturing, pharmaceutical processing, semiconductor/electronics, etc. Cleaning parts and surfaces with solvents is simple, effective and low-cost. Although health and safety and environmental concerns come into play with the use of solvents, this book explores how safe and compliant solvent-based cleaning techniques can be implemented. A key to this is the selection of the right solvent. The author also examines a range of newer "green" solvent cleaning options. This book supplies scientific fundamentals and practical guidance supported by real-world examples. Durkee explains the three principal methods of solvent selection: matching of solubility parameters, reduction of potential for smog formation, and matching of physical properties. He also provides guidance on the safe use of aerosols, wipe-cleaning techniques, solvent stabilization, economics, and many other topics. A compendium of blend rules is included, covering the physical, chemical, and environmental properties of solvents. Three methods explained in detail for substitution of suitable solvents for those unsuitable for any reason: toxic solvents don't have to be tolerated; this volume explains how to do better Enables users to make informed judgments about their selection of cleaning solvents for specific applications, including solvent replacement decisions Explains how to plan and implement solvent cleaning systems that are effective, economical and compliant with regulations

Handbook of Silicon Wafer Cleaning Technology

Author : Karen Reinhardt,Werner Kern
Publisher : William Andrew
Page : 760 pages
File Size : 40,7 Mb
Release : 2018-03-16
Category : Technology & Engineering
ISBN : 9780323510851

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Handbook of Silicon Wafer Cleaning Technology by Karen Reinhardt,Werner Kern Pdf

Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process

Developments in Surface Contamination and Cleaning - Vol 5

Author : Rajiv Kohli,K. L. Mittal
Publisher : William Andrew
Page : 241 pages
File Size : 55,7 Mb
Release : 2012-11-29
Category : House & Home
ISBN : 9781437778816

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Developments in Surface Contamination and Cleaning - Vol 5 by Rajiv Kohli,K. L. Mittal Pdf

Resumen: Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ̥killer defects̲ today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated." Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical." A single source document addressing everything from the sources of contamination to their removal and prevention." Amply referenced and profusely illustrated.

Guide to Cleaner Technologies

Author : Anonim
Publisher : Unknown
Page : 52 pages
File Size : 53,8 Mb
Release : 1994
Category : Pollution
ISBN : UCR:31210012661102

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Guide to Cleaner Technologies by Anonim Pdf

Process Intensification

Author : Ramamurthy Nagarajan
Publisher : CRC Press
Page : 271 pages
File Size : 51,8 Mb
Release : 2023-04-10
Category : Science
ISBN : 9781000841527

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Process Intensification by Ramamurthy Nagarajan Pdf

Process Intensification: Faster, Better, Cheaper presents basic concepts and applications of process intensification (PI) and links their common effects across processes. It defines two fundamental parameters, PI factor, and Cost Impact (CI) factor, and uses these to analyze various applications where Process Intensification has been carried out. Process Intensification principles have, in the past, been applied to diverse fields, ranging from biodiesel production to offshore processing, and this book unifies these aspects to identify the common factors that drive process enhancements. Each chapter investigates a specific application, discusses the key PI principles, and includes problem sets and examples. The book also provides case studies and realworld examples throughout the chapters. Features: Explores Cost Impact of Process Intensification, and their relative magnitudes, as a universal metric Covers a range of industrial applications, including heat and mass transfer, atomization and comminution, and enhanced oil recovery Discusses the application of Process Intensification for clean coal technology and environmental remediation Includes end-of-chapter problems, examples, and case studies The book is intended for senior undergraduate chemical and mechanical engineering students taking courses in Process Design, Process Optimization, Process Synthesis, and Process Intensification. Instructors will be able to utilize a Solutions Manual and Lecture Slides for their course. The eBook+ version includes the following enhancements: Open-ended essay questions to encourage conceptual thinking and apply new information Pop-up explanations of selected concepts and terms throughout the chapters Interactive definition flashcards that summarize key takeaways at the end of the chapter Quizzes within chapters to help readers refresh their knowledge

Particle Adhesion and Removal

Author : K. L. Mittal,Ravi Jaiswal
Publisher : John Wiley & Sons
Page : 576 pages
File Size : 50,5 Mb
Release : 2015-01-06
Category : Technology & Engineering
ISBN : 9781118831540

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Particle Adhesion and Removal by K. L. Mittal,Ravi Jaiswal Pdf

The book provides a comprehensive and easily accessiblereference source covering all important aspects of particleadhesion and removal. The core objective is to cover bothfundamental and applied aspects of particle adhesion and removalwith emphasis on recent developments. Among the topics to be covered include: 1. Fundamentals of surface forces in particle adhesion andremoval. 2. Mechanisms of particle adhesion and removal. 3. Experimental methods (e.g. AFM, SFA,SFM,IFM, etc.) tounderstand particle-particle and particle-substrateinteractions. 4. Mechanics of adhesion of micro- and nanoscaleparticles. 5. Various factors affecting particle adhesion to a variety ofsubstrates. 6. Surface modification techniques to modulate particleadhesion. 7. Various cleaning methods (both wet & dry) for particleremoval. 8. Relevance of particle adhesion in a host of technologies rangingfrom simple to ultra-sophisticated.

Thin Film Materials, Processes, and Reliability

Author : G. S. Mathad
Publisher : The Electrochemical Society
Page : 438 pages
File Size : 46,8 Mb
Release : 2003
Category : Technology & Engineering
ISBN : 1566773938

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Thin Film Materials, Processes, and Reliability by G. S. Mathad Pdf