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Author : H. Adam
Publisher : Unknown
Page : 128 pages
File Size : 42,6 Mb
Release : 1966
Category : Vacuum technology
ISBN : OCLC:150495009
Author : H. Adam
Publisher : Elsevier
Page : 304 pages
File Size : 42,9 Mb
Release : 2013-10-22
Category : Technology & Engineering
ISBN : 9781483164939
1965 Transactions of the Third International Vacuum Congress, Volume 2, Part I documents the proceedings on the Third International Vacuum Congress held in Stuttgart, Germany on June 28-July 2, 1965. This compilation is divided into four sessions. Session 1 focuses on evaporation and thin films, while Session 2 deals with the flow of gases. The components and materials of orthodox vacuum pumps are covered in Session 3. The last session concentrates on pressure measurement and leak detection. The topics discussed include developments in the vacuum deposition of electronic film circuits; bulk sublimation of titanium; transmission probability determination with directed mass motion and with mean free path considerations; measuring the density and direction of gas molecular flow using an ionization detector; and porous metal isolation traps and cryosorbents in vacuum technique. The factors influencing the performance and design of water-cooled condensers; electrode dimensions of the Bayard-Alpert ionization gauge and its sensitivity; and analysis of the changes in Pirani gauge characteristics are also deliberated in this text. This volume is beneficial to students and researchers conducting work on vacuum, including other related subjects such as etymology, electromagnetism, and quantum mechanics.
Author : Hans Adam
Publisher : Unknown
Page : 0 pages
File Size : 41,8 Mb
Release : 1966
Category : Vacuum technology
ISBN : LCCN:66004985
Author : H. Adam
Publisher : Elsevier
Page : 182 pages
File Size : 53,5 Mb
Release : 2016-04-16
Category : Technology & Engineering
ISBN : 9781483164892
1965 Transactions of the Third International Vacuum Congress, Volume 1: Invited Papers is the first of two-volumes that review the state of knowledge in vacuum technology. The present volume comprises the opening address by Prof Auwárter and the twelve comprehensive main lectures. In keeping with the purpose of an international congress, the organizers took great pains to ensure that the choice of topics for the main lectures not only covered the scientific fundamentals as a whole, but also gave appropriate consideration to the technical applications. An analysis of the submitted topics shows that the strong points of research and development lie in the fields of ""Coating and Thin Layers"", ""Adsorption and Desorption,"" and ""Pressure Measurement and Leak Detection"". In the fields of application, ""Vacuum Metallurgy"" ranks highly. The papers published in the transactions originate from many European and overseas countries, proof that vacuum science is not only keenly pursued in all major industrial countries, but also that the new organizational form of the IUVSTA is capable of winning the services of all these countries for fruitful international cooperation in the vacuum field.
Author : H. Adam
Publisher : Elsevier
Page : 278 pages
File Size : 42,8 Mb
Release : 2013-10-22
Category : Technology & Engineering
ISBN : 9781483156309
1965 Transactions of the Third International Vacuum Congress, Volume 2 presents the methods for the epitaxial growth of silicon, which makes use of an ultra-thin layer of a silicon alloy on the substrate surface to develop epitaxial layers at temperature as low as 750°C. This book discusses the potential advantages of the technique and the mechanism of the epitaxial growth process. Organized into four sessions encompassing 42 chapters, this volume starts with an overview of the exact influence of the thin alloy layer. This text then describes the novel X-ray method and its application to semiconductor thin-film problems. Other chapters consider the field of electronic carrier transport in semiconductor films with particular reference to active thin-film devices and their typical behavior. The final chapter deals with the beta-ray single-scatter gauge, which are tested and described in very simple operation. This book is a valuable resource for physicists and scientists.
Author : Hans Adam
Publisher : Unknown
Page : 288 pages
File Size : 51,6 Mb
Release : 1967
Category : Vacuum
ISBN : MINN:31951D00027232N
Author : Anonim
Publisher : Unknown
Page : 882 pages
File Size : 47,9 Mb
Release : 1967-10
Category : Nuclear energy
ISBN : PSU:000047758698
Author : H. Adam
Publisher : Pergamon
Page : 128 pages
File Size : 49,7 Mb
Release : 2024-07-03
Category : Electronic
ISBN : 0080121268
Author : H. Adam
Publisher : Pergamon
Page : 128 pages
File Size : 51,7 Mb
Release : 1967-01
Category : Electronic
ISBN : 0080121276
Author : Nagamitsu Yoshimura
Publisher : Academic Press
Page : 575 pages
File Size : 51,8 Mb
Release : 2020-02-15
Category : Technology & Engineering
ISBN : 9780128197035
A Review: Ultrahigh-Vacuum Technology for Electron Microscopes provides information on the fundamentals of ultra-high vacuum systems. It covers the very subtle process that can help increase pressure inside the microscope (or inside any other ultra-high vacuum system) and the different behavior of the molecules contributing to this kind of process. Prof Yoshimura’s book offers detailed information on electron microscope components, as well as UHV technology. This book is an ideal resource for industrial microscopists, engineers and scientists responsible for the design, operation and maintenance of electron microscopes. In addition, engineering students or engineers working with electron microscopes will find it useful. Teaches how to incorporate diffusion pumps for UHV electron microscopy Presents the work of an author who brings a lifetime of experience working on vacuum technology and electron microscopes
Author : H. Adam
Publisher : Elsevier
Page : 235 pages
File Size : 52,6 Mb
Release : 2013-10-22
Category : Science
ISBN : 9781483186054
Sessions 9-13 discusses subjects in the field of cryogenics, vacuum metallurgy, sputtering, gettering, adsorption, desorption, and space simulation. The development and functional description of a cryo pump is covered in the first section of the book. The second section covers the measurement of the pumping speed of a cryo surface cooled with liquid nitrogen. The third topic is the examination of the cryo-getter pump. The van Arkel method is the transformation of a crude metal to a halogen compound. This method is broadly covered in the volume. A section of the text focuses on the production of copper castings of great purity. Another section described the new developments in electron beam welding under vacuum. Triode sputtering is then discussed in detail. The heat of chemisorption of carbon monoxide on polycrystalline nickel is carefully investigated. This is followed by a description of the xenon collector. The book can provide valuable insights to physicists, chemists, engineers, students, and researchers.
Author : Marsbed H. Hablanian
Publisher : Routledge
Page : 487 pages
File Size : 44,5 Mb
Release : 2017-11-13
Category : Science
ISBN : 9781351440684
Offering a basic understanding of each important topic in vacuum science and technology, this book concentrates on pumping issues, emphasizes the behavior of vacuum pumps and vacuum systems, and explains the relationships between pumps, instrumentation and high-vacuum system performance. The book delineates the technical and theoretical aspects of the subject without getting in too deep. It leads readers through the subtleties of vacuum technology without using a dissertation on mathematics to get them there. An interesting blend of easy-to-understand technician-level information combined with engineering data and formulae, the book provides a non-analytical introduction to high vacuum technology.
Author : Anonim
Publisher : Unknown
Page : 980 pages
File Size : 42,9 Mb
Release : 1973
Category : Space environment
ISBN : SRLF:AA0001074400
Author : E. L. Grove,Alfred J. Perkins
Publisher : Springer Science & Business Media
Page : 339 pages
File Size : 54,7 Mb
Release : 2013-11-11
Category : Science
ISBN : 9781468487008
Volume 7 of Developments in Applied Spectroscopy is a collection of forty-two papers selected from those that were presented at the 7th National Meeting of the Society of Applied Spectroscopy, held (in place of the 19th Mid-America Symposium on Spectroscopy) in Chicago, May 13-17, 1968. These papers, selected by the editors and reviewed by persons knowledgeable in the field, are those of the symposium type and not those pertaining to specific research topics that one would expect to be submitted to a journal. It is the opinion of the committee that this type of publication has an important place in the literature. The relatively large number of papers would result in quite a sizable volume if bound in one set of covers. For this reason, and to present the material in areas of more specific mterest, Volume 7 was divided into two parts, Part A, Physical-Inorganic, and Part B, Physical-Organic Developments. The 7th National Meeting was sponsored by the Chicago Section as host in cooperation with the St. Louis, New England, Penn York, Niagara-Frontier, Cincinnati, Ohio Valley, New York, Baltimore-Washington, North Texas, Rocky Mountain, and Southeastern Sections of the Society for Applied Spectroscopy and the Chicago Gas Chromatography Group. The editors wish to express their appreciation to the authors and to those who helped with the reviewing. The latter include Dr. Elma Lanterman, Mr. John E. Forrette, Dr. Carl Moore, Dr. B. Jaselskis, Mr. H. G. Zelinski, Mr.
Author : J Anderson
Publisher : Elsevier
Page : 568 pages
File Size : 45,7 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9780323145695
Chemisorption and Reactions on Metallic Films, Volume 1 is a six-chapter text that describes the role of evaporated metal films in advancing the understanding of the metal-gas interface chemistry. Chapter 1 presents electron microscopy and diffraction studies and their contributions in elucidating the growth and structure of polycrystalline and epitaxially grown films. Chapter 2 describes the techniques of preparation and characterization of metallic films and examines the heats of adsorption, electrical conductivity, surface area, and sticking probabilities of such films. Chapter 3 discusses the strength of pairwise interactions; the influence of the intermetallic bond on the equilibrium shape of metal crystallites; the bonding of individual metal atoms to different crystallographic planes; the interaction of metal atoms and crystallites with non-conducting substrates; and the effects of residual gases on this interaction. Chapters 4 and 5 address the adsorption of metallic films, with an emphasis on general trends in adsorptive and electronic properties of bulk metals. These chapters also discuss the effects of adsorption on the electrical conductance of island-like and coherent films and on the ferromagnetic properties of films. Chapter 6 evaluates the application of infrared spectroscopy to the studies of the surfaces of metal films and the use of the available infrared spectroscopic data in reconciling the results of adsorption studies on oxide-supported metal particles with those obtained with clean evaporated metal films prepared under ultra high vacuum conditions. Research scientists and graduate students who are interested in the fundamentals of adsorption and catalysis will find this volume invaluable.