Download Full eBooks in PDF
Coulomb Interactions In Focused Ion Beam Systems Book in PDF, ePub and Kindle version is available to download in english. Read online anytime anywhere directly from your device. Click on the download button below to get a free pdf file of Coulomb Interactions In Focused Ion Beam Systems book. This book definitely worth reading, it is an incredibly well-written.
Author : Lucas Joseph Vijgen
Publisher : Delft University Press
Page : 160 pages
File Size : 44,7 Mb
Release : 1994-12-01
Category : Coulomb excitation
ISBN : 9040710473
Author : Jon Orloff,Lynwood Swanson,Mark Utlaut
Publisher : Springer Science & Business Media
Page : 304 pages
File Size : 41,9 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781461507659
In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.
Author : Bijoy Bhattacharyya,Biswanath Doloi
Publisher : Academic Press
Page : 782 pages
File Size : 45,5 Mb
Release : 2019-09-17
Category : Technology & Engineering
ISBN : 9780128128954
Modern Machining Technology: Advanced, Hybrid, Micro Machining and Super Finishing Technology explores complex and precise components with challenging shapes that are increasing in demand in industry. As the first book to cover all major technologies in this field, readers will find the latest technical developments and research in one place, allowing for easy comparison of specifications. Technologies covered include mechanical, thermal, chemical, micro and hybrid machining processes, as well as the latest advanced finishing technologies. Each topic is accompanied by a basic overview, examples of typical applications and studies of performance criteria. In addition, readers will find comparative advantages, model questions and solutions. Addresses a broad range of modern machining techniques, providing specifications for easy comparison Includes descriptions of the main applications for each method, along with the materials or products needed Provides the very latest research in processes, including hybrid machining
Author : Anonim
Publisher : DIANE Publishing
Page : 88 pages
File Size : 48,7 Mb
Release : 2024-07-02
Category : Electronic
ISBN : 9781437985719
Author : Bernhard Wolf
Publisher : CRC Press
Page : 725 pages
File Size : 45,8 Mb
Release : 2017-07-12
Category : Technology & Engineering
ISBN : 9781351829946
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Author : Jon Orloff
Publisher : CRC Press
Page : 666 pages
File Size : 48,5 Mb
Release : 2017-12-19
Category : Science
ISBN : 9781420045550
With the growing proliferation of nanotechnologies, powerful imaging technologies are being developed to operate at the sub-nanometer scale. The newest edition of a bestseller, the Handbook of Charged Particle Optics, Second Edition provides essential background information for the design and operation of high resolution focused probe instruments. The book’s unique approach covers both the theoretical and practical knowledge of high resolution probe forming instruments. The second edition features new chapters on aberration correction and applications of gas phase field ionization sources. With the inclusion of additional references to past and present work in the field, this second edition offers perfectly calibrated coverage of the field’s cutting-edge technologies with added insight into how they work. Written by the leading research scientists, the second edition of the Handbook of Charged Particle Optics is a complete guide to understanding, designing, and using high resolution probe instrumentation.
Author : Anonim
Publisher : Unknown
Page : 294 pages
File Size : 52,6 Mb
Release : 1999
Category : Electron optics
ISBN : UOM:39015048127925
Author : Zheng Cui
Publisher : Springer
Page : 432 pages
File Size : 50,6 Mb
Release : 2016-08-10
Category : Technology & Engineering
ISBN : 9783319393612
This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of each technology is introduced and illustrated with minimum mathematics involved. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale. This book provides readers with a toolkit that will help with any of their nanofabrication challenges.
Author : Maja D. Bachmann
Publisher : Springer Nature
Page : 167 pages
File Size : 47,5 Mb
Release : 2020-08-28
Category : Technology & Engineering
ISBN : 9783030513627
This thesis presents pioneering work in the relatively new field of focused ion beam (FIB) sculpting of single crystals to produce bespoke devices and enable the investigation of physics that cannot be studied in bulk samples. It begins with a comprehensive and didactic account of how to achieve this sculpting, revealing the ‘tricks of the trade’ of state-of-the-art FIB microstructuring. In subsequent chapters, the author presents ground-breaking results obtained from microstructures of the delafossite oxide metal PdCoO2 and the heavy fermion superconductor CeIrIn5. In these elegant, forefront experiments, a new form of directional ballistic transport in the ultra-pure delafossites is described and explained. Furthermore, a new way to spatially modulate superconductivity induced by strain is demonstrated with electrical transport measurements that agree well with predictions based on thermoelastic finite element simulations.
Author : Joseph A. Eichmeier,Manfred Thumm
Publisher : Springer Science & Business Media
Page : 548 pages
File Size : 48,9 Mb
Release : 2008-03-04
Category : Technology & Engineering
ISBN : 9783540719298
Nineteen experts from the electronics industry, research institutes and universities have joined forces to prepare this book. It does nothing less than provide a complete overview of the electrophysical fundamentals, the present state of the art and applications, as well as the future prospects of microwave tubes and systems. The book does the same for optoelectronics vacuum devices, electron and ion beam devices, light and X-ray emitters, particle accelerators and vacuum interrupters.
Author : Bo Wu
Publisher : Unknown
Page : 276 pages
File Size : 52,7 Mb
Release : 2002
Category : Electronic
ISBN : UCAL:C3484005
Author : David Ferry,John R. Barker,Carlo Jacoboni
Publisher : Springer Science & Business Media
Page : 616 pages
File Size : 51,8 Mb
Release : 1991-07-31
Category : Science
ISBN : 030643881X
The technological means now exists for approaching the fundamentallimiting scales of solid state electronics in which a single carrier can, in principle, represent a single bit in an information flow. In this light, the prospect of chemically, or biologically, engineered molccular-scale structures which might support information processing functions has enticed workers for many years. The one common factor in all suggested molecular switches, ranging from the experimentally feasible proton-tunneling structure, to natural systems such as the micro-tubule, is that each proposed structure deals with individual information carrying entities. Whereas this future molecular electronics faces enormous technical challenges, the same Iimit is already appearing in existing semiconducting quantum wires and small tunneling structures, both superconducting and normal meta! devices, in which the motion of a single eh arge through the tunneling barrier can produce a sufficient voltage change to cut-off further tunneling current. We may compare the above situation with today's Si microelectronics, where each bit is encoded as a very !arge number, not necessarily fixed, of electrons within acharge pulse. The associated reservoirs and sinks of charge carriers may be profitably tapped and manipulated to proviele macro-currents which can be readily amplified or curtailed. On the other band, modern semiconductor ULSI has progressed by adopting a linear scaling principle to the down-sizing of individual semiconductor devices.
Author : John T.L. Thong
Publisher : Springer Science & Business Media
Page : 467 pages
File Size : 51,8 Mb
Release : 2013-06-29
Category : Science
ISBN : 9781489915221
Although exploratory and developmental activity in electron beam testing (EBT) 25 years, it was not had already been in existence in research laboratories for over until the beginning of the 1980s that it was taken up seriously as a technique for integrated circuit (IC) testing. While ICs were being fabricated on design rules of several microns, the mechanical ne edle probe served quite adequately for internal chip probing. This scenario changed with growing device complexity and shrinking geometries, prompting IC manufacturers to take note ofthis new testing technology. It required several more years and considerable investment by electron beam tester manufacturers, however, to co me up with user-friendly automated systems that were acceptable to IC test engineers. These intervening years witnessed intense activity in the development of instrumentation, testing techniques, and system automation, as evidenced by the proliferation of technical papers presented at conferences. With the shift of interest toward applications, the technology may now be considered as having come of age.
Author : P. Rai-Choudhury
Publisher : IET
Page : 784 pages
File Size : 51,7 Mb
Release : 1997
Category : Technology & Engineering
ISBN : 0852969066
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Author : M. Gentili,Carlo Giovannella,Stefano Selci
Publisher : Springer Science & Business Media
Page : 214 pages
File Size : 49,6 Mb
Release : 2013-03-09
Category : Science
ISBN : 9789401582612
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).