Fundamentals Of Semiconductor Manufacturing And Process Control

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Fundamentals of Semiconductor Manufacturing and Process Control

Author : Gary S. May,Costas J. Spanos
Publisher : John Wiley & Sons
Page : 428 pages
File Size : 44,8 Mb
Release : 2006-05-26
Category : Technology & Engineering
ISBN : 9780471790273

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Fundamentals of Semiconductor Manufacturing and Process Control by Gary S. May,Costas J. Spanos Pdf

A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.

Fundamentals of Semiconductor Processing Technology

Author : Badih El-Kareh,Lou N. Hutter
Publisher : Springer Science & Business Media
Page : 605 pages
File Size : 49,5 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781461522096

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Fundamentals of Semiconductor Processing Technology by Badih El-Kareh,Lou N. Hutter Pdf

The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.

Semiconductor Manufacturing Handbook

Author : Hwaiyu Geng
Publisher : McGraw Hill Professional
Page : 915 pages
File Size : 46,9 Mb
Release : 2005-05-18
Category : Technology & Engineering
ISBN : 9780071445597

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Semiconductor Manufacturing Handbook by Hwaiyu Geng Pdf

WORLD-CLASS SEMICONDUCTOR MANUFACTURING EXPERTISE AT YOUR FINGERTIPS This is a comprehensive reference to the semiconductor manufacturing process and ancillary facilities -- from raw material preparation to packaging and testing, applying basics to emerging technologies. Readers charged with optimizing the design and performance of manufacturing processes will find all the information necessary to produce the highest quality chips at the lowest price in the shortest time possible. The Semiconductor Manufacturing Handbook provides leading-edge information on semiconductor wafer processes, MEMS, nanotechnology, and FPD, plus the latest manufacturing and automation technologies, including: Yield Management Automated Material Handling System Fab and Cleanroom Design and Operation Gas Abatement and Waste Treatment Management And much more Written by 60 international experts, and peer reviewed by a seasoned advisory board, this handbook covers the fundamentals of relevant technology and its real-life application and operational considerations for planning, implementing, and controlling manufacturing processes. It includes hundreds of detailed illustrations and a list of relevant books, technical papers, and websites for further research. This inclusive, wide-ranging coverage makes the Semiconductor Manufacturing Handbook the most comprehensive single-volume reference ever published in the field. STATE-OF-THE-ART SEMICONDUCTOR TECHNOLOGIES AND MANUFACTURING PROCESSES: SEMICONDUCTOR FUNDAMENTALS How Chips Are Designed and Made * Substrates * Copper and Low-k Dielectrics * Silicide Formation * Plasma * Vacuum * Photomask WAFER PROCESSING TECHNOLOGIES Microlithography * Ion Implantation * Etch * PVD/ALD * CVD * ECD * Epitaxy * CMP * Wet Cleaning FINAL MANUFACTURING Packaging * Grinding, Stress Relief, Dicing * Inspection, Measurement, and Testing NANOTECHNOLOGY, MEMS, AND FPD GAS AND CHEMICALS Specialty Gas System and DCA * Gas Abatement Systems * Chemical and Slurries Delivery System * Ultra Pure Water FAB YIELD, OPERATIONS, AND FACILITIES Yield Management * Automated Materials Handling System * Metrology * Six Sigma * Advanced Process Control * EHS * Fab Design and Construction * Cleanroom * Vibration and Acoustic Control * ESD * Airborne Molecular Control * Particle Monitoring * Wastewater Neutralization Systems

Fundamental Principles of Optical Lithography

Author : Chris Mack
Publisher : John Wiley & Sons
Page : 503 pages
File Size : 51,9 Mb
Release : 2011-08-10
Category : Technology & Engineering
ISBN : 9781119965077

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Fundamental Principles of Optical Lithography by Chris Mack Pdf

The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

Microchip Fabrication, 5th Ed.

Author : Peter Van Zant
Publisher : McGraw Hill Professional
Page : 658 pages
File Size : 42,9 Mb
Release : 2004-06-09
Category : Technology & Engineering
ISBN : 9780071501392

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Microchip Fabrication, 5th Ed. by Peter Van Zant Pdf

The #1 book in the industry for more than 15 years! Utilizing a straightforward, math-free pathology, this is a novice-friendly guide to the semiconductor fabrication process from raw materials through shipping the finished, packaged device. Challenging quizzes and review summaries make this the perfect learning guide for technicians in training. * NEW chapter on nanotechnology * NEW sections on 300mm wafer processing * Processes and devices, and Green processing * Every chapter updated to reflect the latest processing techniques

Run-to-Run Control in Semiconductor Manufacturing

Author : James Moyne,Enrique del Castillo,Arnon M. Hurwitz
Publisher : CRC Press
Page : 368 pages
File Size : 47,6 Mb
Release : 2018-10-08
Category : Technology & Engineering
ISBN : 9781420040661

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Run-to-Run Control in Semiconductor Manufacturing by James Moyne,Enrique del Castillo,Arnon M. Hurwitz Pdf

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Fundamentals of Semiconductor Fabrication

Author : Gary S. May,S. M. Sze
Publisher : John Wiley & Sons
Page : 0 pages
File Size : 41,5 Mb
Release : 2004
Category : Integrated circuits
ISBN : 0471452386

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Fundamentals of Semiconductor Fabrication by Gary S. May,S. M. Sze Pdf

"This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition. The book integrates Computer Modeling & Simulation tools throughout. Process simulation is used as a tool for what-if analysis and discussion. Comprehensive coverage of process sequence helps readers connect individual steps into a cohesive whole."--

Microchip Fabrication

Author : Peter Van Zant
Publisher : Unknown
Page : 322 pages
File Size : 49,6 Mb
Release : 1984
Category : Integrated circuits
ISBN : UOM:39015035728065

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Microchip Fabrication by Peter Van Zant Pdf

Advances in Chemical Mechanical Planarization (CMP)

Author : Babu Suryadevara
Publisher : Woodhead Publishing
Page : 650 pages
File Size : 50,9 Mb
Release : 2021-09-10
Category : Technology & Engineering
ISBN : 9780128218198

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Advances in Chemical Mechanical Planarization (CMP) by Babu Suryadevara Pdf

Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. Reviews the most relevant techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for current and emerging materials Addresses consumables and process control for improved CMP, including post-CMP

Semiconductor Industry

Author : J. Michael Sherer
Publisher : CRC Press
Page : 216 pages
File Size : 42,8 Mb
Release : 2018-10-03
Category : Technology & Engineering
ISBN : 9781420027198

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Semiconductor Industry by J. Michael Sherer Pdf

Given the myriad exhaust compounds and the corresponding problems that they can pose in an exhaust management system, the proper choice of such systems is a complex task. Presenting the fundamentals, technical details, and general solutions to real-world problems, Semiconductor Industry: Wafer Fab Exhaust Management offers practical guidance on selecting an appropriate system for a given application. Using examples that provide a clear understanding of the concepts discussed, Sherer covers facility layout, support facilities operations, and semiconductor process equipment, followed by exhaust types and challenges. He reviews exhaust point-of-use devices and exhaust line requirements needed between process equipment and the centralized exhaust system. The book includes information on wet scrubbers for a centralized acid exhaust system and a centralized ammonia exhaust system and on centralized equipment to control volatile organic compounds. It concludes with a chapter devoted to emergency releases and a separate chapter of examples illustrating these systems in use. Drawing on the author's 20 years of industry experience, the book shows you how to customize strategies specific to your needs, solve current problems, and prevent future issues in your exhaust management systems.

Introduction to Quality Management in the Semiconductor Industry

Author : Juergen Wittmann,Werner Bergholz
Publisher : Createspace Independent Publishing Platform
Page : 454 pages
File Size : 49,6 Mb
Release : 2018-05
Category : Electronic
ISBN : 1718637500

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Introduction to Quality Management in the Semiconductor Industry by Juergen Wittmann,Werner Bergholz Pdf

The "Students' Version is a "black and white" only version with a slightly reduced number of pages as compared to the full version of this text book. The primary purpose of our book is to provide the "fast lane" to practical quality engineering and management in the semi-conductor industries. In line with this objective, this book is meant to be more a guide to practical quality engineering and management, rather than a scientific treatise. Although it has been written for the semiconductor technology community, it goes without saying that it is useful for almost all other industrial areas, since in a way semiconductor technology (in particular micro-electronics) is a good model case how 100% stringent QM can be implemented in practice.

Industrial Controls and Manufacturing

Author : Edward W. Kamen
Publisher : Elsevier
Page : 230 pages
File Size : 43,6 Mb
Release : 1999-07-15
Category : Technology & Engineering
ISBN : 9780080508627

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Industrial Controls and Manufacturing by Edward W. Kamen Pdf

Growing numbers of engineering graduates are finding employment in the control systems area with applications to manufacturing. To be properly prepared for such positions, it is desirable that the students be exposed to the topics of process control, discrete logic control and the fundamentals of manufacturing. Presently there is no existing textbook and/or reference that combine together process control, discrete logic control and the fundamentals of manufacturing. This is a book that fills that gap. This book integrates together the theory with a number of illustrative examples. Constructive procedures will be given for designing controllers and manufacturing lines, including methods for designing digital controllers, fuzzy logic controllers and adaptive controllers, and methods for the design of the flow of operations in a manufacturing line. One chapter will be devoted to equipment interfacing and computer communications, with the focus on fieldbuses, device drivers and computer networks. There are no existing control-oriented textbooks that bring this material into the picture, although interfacing and communications are becoming a bigger and bigger part of the overall control problem. Covers both analog and digital control using P/PI/PID controllers and discrete logic control using ladder logic diagrams and programmable logic controllers Contains a brief introduction to model predictive control, adaptive control, and neural net control Covers control from the device/process level up to and including the production system level Contains an introduction to manufacturing systems with the emphasis on performance measures, flow-line analysis, and line balancing Contains a chapter on equipment interfacing with a brief introduction on OLE for process control (OPC), the GEM standard, fieldbuses, and Ethernet Material is based on a course with a lab project developed and taught at the Georgia Institute of Technology Coverage is at the introductory level with a minimal amount of background required to read the text

Introduction to Manufacturing

Author : Michel Baudin,Torbjørn Netland
Publisher : Taylor & Francis
Page : 800 pages
File Size : 40,8 Mb
Release : 2022-12-27
Category : Business & Economics
ISBN : 9781351110303

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Introduction to Manufacturing by Michel Baudin,Torbjørn Netland Pdf

This Introduction to Manufacturing focuses students on the issues that matter to practicing industrial engineers and managers. It offers a systems perspective on designing, managing, and improving manufacturing operations. On each topic, it covers the key issues, with pointers on where to dig deeper. Unlike the many textbooks on operations management, supply chain management, and process technology, this book weaves together these threads as they interact in manufacturing. It has five parts: Getting to Know Manufacturing: Fundamental concepts of manufacturing as an economic activity, from manufacturing strategy to forecasting market demand Engineering the Factory: Physical design of factories and processes, the necessary infrastructure and technology for manufacturing Making Information Flow: The "central nervous system" that triggers and responds to events occurring in production Making Materials Flow: The logistics of manufacturing, from materials handling inside the factory via warehousing to supply chain management Enhancing Performance: Managing manufacturing performance and methods to maintain and improve it, both in times of normal operations and emergencies Supported with rich illustrations and teaching aids, Introduction to Manufacturing is essential reading for industrial engineering and management students – of all ages and backgrounds – engaged in the vital task of making the things we all use.

Introduction to Metrology Applications in IC Manufacturing

Author : Bo Su,Eric Solecky,Alok Vaid
Publisher : Unknown
Page : 187 pages
File Size : 54,9 Mb
Release : 2015
Category : Integrated circuits
ISBN : 1628416629

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Introduction to Metrology Applications in IC Manufacturing by Bo Su,Eric Solecky,Alok Vaid Pdf

Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. Includes example spreadsheets of measurement uncertainty analysis--specifically, precision, matching, and relative accuracy.