High Power Impulse Magnetron Sputtering

Author : Daniel Lundin,Jon Tomas Gudmundsson,Tiberiu Minea
Publisher : Unknown
Page : 398 pages
File Size : 42,7 Mb
Release : 2019-09-13
Category : Technology & Engineering
ISBN : 9780128124543

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High Power Impulse Magnetron Sputtering by Daniel Lundin,Jon Tomas Gudmundsson,Tiberiu Minea Pdf

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

Author : Daniel Lundin,Tiberiu Minea,Jon Tomas Gudmundsson
Publisher : Elsevier
Page : 398 pages
File Size : 40,6 Mb
Release : 2019-08-28
Category : Technology & Engineering
ISBN : 9780128124550

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High Power Impulse Magnetron Sputtering by Daniel Lundin,Tiberiu Minea,Jon Tomas Gudmundsson Pdf

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

Author : André Anders
Publisher : Springer Science & Business Media
Page : 555 pages
File Size : 46,5 Mb
Release : 2009-07-30
Category : Science
ISBN : 9780387791081

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Cathodic Arcs by André Anders Pdf

Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.

Author : Donald M. Mattox
Publisher : William Andrew
Page : 378 pages
File Size : 55,5 Mb
Release : 2018-08-21
Category : Technology & Engineering
ISBN : 9780128130858

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The Foundations of Vacuum Coating Technology by Donald M. Mattox Pdf

The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating

Author : Anonim
Publisher : Academic Press
Page : 268 pages
File Size : 42,8 Mb
Release : 1999-10-14
Category : Science
ISBN : 9780080542935

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Ionized Physical Vapor Deposition by Anonim Pdf

This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes

Author : Diederik Depla,Stijn Mahieu
Publisher : Springer Science & Business Media
Page : 584 pages
File Size : 50,5 Mb
Release : 2008-06-24
Category : Technology & Engineering
ISBN : 9783540766643

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Reactive Sputter Deposition by Diederik Depla,Stijn Mahieu Pdf

In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Author : D. M. Mattox
Publisher : Cambridge University Press
Page : 947 pages
File Size : 43,7 Mb
Release : 2014-09-19
Category : Technology & Engineering
ISBN : 9780080946580

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Handbook of Physical Vapor Deposition (PVD) Processing by D. M. Mattox Pdf

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Author : Daniel Lundin
Publisher : Unknown
Page : 46 pages
File Size : 52,8 Mb
Release : 2008
Category : Electronic
ISBN : 9173939323

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Plasma Properties in High Power Impulse Magnetron Sputtering by Daniel Lundin Pdf

Author : Yves Huttel
Publisher : John Wiley & Sons
Page : 416 pages
File Size : 52,8 Mb
Release : 2017-06-19
Category : Technology & Engineering
ISBN : 9783527340606

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Gas-Phase Synthesis of Nanoparticles by Yves Huttel Pdf

The first overview of this topic begins with some historical aspects and a survey of the principles of the gas aggregation method. The second part covers modifications of this method resulting in different specialized techniques, while the third discusses the post-growth treatment that can be applied to the nanoparticles. The whole is rounded off by a review of future perspectives and the challenges facing the scientific and industrial communities. An excellent resource for anyone working with the synthesis of nanoparticles, both in academia and industry.

Author : Felipe de Campos Carreri
Publisher : BoD – Books on Demand
Page : 220 pages
File Size : 47,7 Mb
Release : 2022-09-07
Category : Technology & Engineering
ISBN : 9783839612873

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Investigation of industrially-suited processes for deposition of oxide thin films by high power impulse magnetron sputtering. by Felipe de Campos Carreri Pdf

The scope of this work is to investigate and to develop advanced HIPIMS processes for deposition of oxides, utilizing industrial-scale equipment and technology. Two classes of oxide materials were studied: insulating (aluminum oxide) and conducting oxides (indium-tin oxide and aluminum-doped zinc oxide). The electrical properties of the oxides have a significant influence on the process design, as the issues and approaches for deposition of insulating materials are fairly different from conducting materials. Different types of reactive process control were also investigated, utilizing optical emission spectroscopy to control the oxygen flow and lambda probes to control the discharge power. A non-reactive process was also studied for indium-tin oxide.

Author : Mark A. Prelas,Andrew Benedictus,Li-Te Steven Lin,Galina Popovici,Peter Gielisse
Publisher : Springer Science & Business Media
Page : 378 pages
File Size : 45,8 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9789401155922

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Diamond Based Composites by Mark A. Prelas,Andrew Benedictus,Li-Te Steven Lin,Galina Popovici,Peter Gielisse Pdf

Diamond-based composites, with their advantages of hardness, high Young's modulus and the like, have demonstrated new and unusual features, such as stability to high temperatures and pressure shocks and a large internal surface that can be controlled to offer customised electrical, magnetic and optical properties, leading to efficient filters, absorbents, sensors and other tools for environmental control and monitoring. The current book covers the synthesis of materials, their characterization and properties, trends in high pressure and high temperature technologies, low pressure technologies, basic principles of DBC material science, and future developments in electronics, optics, industrial tools and components, biotechnology, and medicine. Wide band-gap materials are considered, ranging from molecular clusters, nanophase materials, growth, processing and synthesis. The processing of composite based materials can be classified into six basic methods: in situ growth, high pressure/high temperature catalytic conversion; mix and sinter (c-BN plus metal-ceramic polymer mix); direct sintering; direct polymorphic conversion; shock detonation; and SHS sintering.

Author : L. B. Freund,S. Suresh
Publisher : Cambridge University Press
Page : 772 pages
File Size : 43,5 Mb
Release : 2004-01-08
Category : Technology & Engineering
ISBN : 1139449826

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Thin Film Materials by L. B. Freund,S. Suresh Pdf

Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.

Author : Dumitru Luca,Lucel Sirghi,Claudiu Costin
Publisher : Springer
Page : 352 pages
File Size : 45,6 Mb
Release : 2017-09-08
Category : Technology & Engineering
ISBN : 9783319674599

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Recent Advances in Technology Research and Education by Dumitru Luca,Lucel Sirghi,Claudiu Costin Pdf

This book presents selected contributions to the 16th International Conference on Global Research and Education Inter-Academia 2017 hosted by Alexandru Ioan Cuza University of Iași, Romania from 25 to 28 September 2017. It is the third volume in the series, following the editions from 2015 and 2016. Fundamental and applied research in natural sciences have led to crucial developments in the ongoing 4th global industrial revolution, in the course of which information technology has become deeply embedded in industrial management, research and innovation – and just as deeply in education and everyday life. Materials science and nanotechnology, plasma and solid state physics, photonics, electrical and electronic engineering, robotics and metrology, signal processing, e-learning, intelligent and soft computing have long since been central research priorities for the Inter-Academia Community (I-AC) – a body comprising 14 universities and research institutes from Japan and Central/East-European countries that agreed, in 2002, to coordinate their research and education programs so as to better address today’s challenges. The book is intended for use in academic, government, and industrial R&D departments as a reference tool in research and technology education. The 42 peer-reviewed papers were written by more than 119 leading scientists from 14 countries, most of them affiliated to the I-AC.

Author : Charles Bishop
Publisher : William Andrew
Page : 602 pages
File Size : 48,6 Mb
Release : 2015-08-15
Category : Technology & Engineering
ISBN : 9780323296908

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Vacuum Deposition onto Webs, Films and Foils by Charles Bishop Pdf

Vacuum Deposition onto Webs: Films and Foils, Third Edition, provides the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging. Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology, including solar energy products that are moving from rigid panels onto cheaper and more versatile flexible substrates, flexible electronic circuit ‘boards’, and flexible displays. In this third edition, all chapters are thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest developments in Atomic Layer Deposition (ALD). Provides the know-how to maximize productivity of vacuum coating systems Thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest on Atomic Layer Deposition (ALD) Presents the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating Enables engineers to specify systems more effectively and enhances dialogue between non-specialists and suppliers/engineers Empowers those in rapidly expanding fields such as solar energy, display panels, and flexible electronics to unlock the potential of vacuum coating to transform their processes and products

Author : Peter M. Martin
Publisher : William Andrew
Page : 932 pages
File Size : 47,7 Mb
Release : 2009-12-01
Category : Technology & Engineering
ISBN : 9780815520320

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Handbook of Deposition Technologies for Films and Coatings by Peter M. Martin Pdf

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.