Lecture Notes On Principles Of Plasma Processing

Author : Francis F. Chen,Jane P. Chang
Publisher : Springer Science & Business Media
Page : 213 pages
File Size : 49,7 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781461501817

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Lecture Notes on Principles of Plasma Processing by Francis F. Chen,Jane P. Chang Pdf

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Author : Michael A. Lieberman,Alan J. Lichtenberg
Publisher : John Wiley & Sons
Page : 795 pages
File Size : 49,9 Mb
Release : 2005-04-08
Category : Science
ISBN : 9780471724247

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Principles of Plasma Discharges and Materials Processing by Michael A. Lieberman,Alan J. Lichtenberg Pdf

A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

Author : Giorgio Speranza,Wei Liu,Luca Minati
Publisher : CRC Press
Page : 121 pages
File Size : 54,7 Mb
Release : 2019-04-10
Category : Science
ISBN : 9780429555206

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Applications of Plasma Technologies to Material Processing by Giorgio Speranza,Wei Liu,Luca Minati Pdf

This book provides a survey of the latest research and developments in plasma technology. In an easy and comprehensive manner, it explores what plasma is and the technologies utilized to produce plasma. It then investigates the main applications and their benefits. Different from other books on the topic that focus on specific aspects of plasma technology, the intention is to provide an introduction to all aspects related to plasma technologies. This book will be an ideal resource for graduate students studying plasma technologies, in addition to researchers in physics, engineering, and materials science Features Accessible and easy to understand Provides simple yet exhaustive explanations of the foundations Explores the latest technologies and is filled with practical applications and case studies

Author : Hubert Rauscher,Massimo Perucca,Guy Buyle
Publisher : John Wiley & Sons
Page : 428 pages
File Size : 45,8 Mb
Release : 2010-04-16
Category : Technology & Engineering
ISBN : 3527630465

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Plasma Technology for Hyperfunctional Surfaces by Hubert Rauscher,Massimo Perucca,Guy Buyle Pdf

Based on a project backed by the European Union, this is a must-have resource for researchers in industry and academia concerned with application-oriented plasma technology research. Clearly divided in three sections, the first part is dedicated to the fundamentals of plasma and offers information about scientific and theoretical plasma topics, plasma production, surface treatment process and characterization. The second section focuses on technological aspects and plasma process applications in textile, food packaging and biomedical sectors, while the final part is devoted to concerns about the environmental sustainability of plasma processes.

Author : Hana Barankova,Ladislav Bardos
Publisher : John Wiley & Sons
Page : 208 pages
File Size : 49,6 Mb
Release : 2022-01-31
Category : Technology & Engineering
ISBN : 9781119826897

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Microwave Plasma Sources and Methods in Processing Technology by Hana Barankova,Ladislav Bardos Pdf

A practical introduction to microwave plasma for processing applications at a variety of pressures In Microwave Plasma Sources and Methods in Processing Technology, the authors deliver a comprehensive introduction to microwaves and microwave-generated plasmas. Ideal for anyone interested in non-thermal gas discharge plasmas and their applications, the book includes detailed descriptions, explanations, and practical guidance for the study and use of microwave power, microwave components, plasma, and plasma generation. This reference includes over 130 full-color diagrams to illustrate the concepts discussed within. The distinguished authors discuss the plasmas generated at different levels of power, as well as their applications at reduced, atmospheric and higher pressures. They also describe plasmas inside liquids and plasma interactions with combustion flames. Microwave Plasma Sources and Methods in Processing Technology concludes with an incisive exploration of new trends in the study and application of microwave discharges, offering promising new areas of study. The book also includes: • A thorough introduction to the basic principles of microwave techniques and power systems, including a history of the technology, microwave generators, waveguides, and wave propagation • A comprehensive exploration of the fundamentals of the physics of gas discharge plasmas, including plasma generation, Townsend coefficients, and the Paschen curve • Practical discussions of the interaction between plasmas and solid surfaces and gases, including PVD, PE CVD, oxidation, sputtering, evaporation, dry etching, surface activation, and cleaning • In-depth examinations of microwave plasma systems for plasma processing at varied parameters Perfect for researchers and engineers in the microwave community, as well as those who work with plasma applications, Microwave Plasma Sources and Methods in Processing Technology will also earn a place in the libraries of graduate and PhD students studying engineering physics, microwave engineering, and plasmas.

Author : Professor K.S. K.S Sree Harsha
Publisher : Elsevier
Page : 1176 pages
File Size : 47,8 Mb
Release : 2005-12-16
Category : Technology & Engineering
ISBN : 0080480314

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Principles of Vapor Deposition of Thin Films by Professor K.S. K.S Sree Harsha Pdf

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Author : Oleg O. Baranov,Igor Levchenko,Shuyan Xu,Kateryna Bazaka
Publisher : Springer Nature
Page : 82 pages
File Size : 55,5 Mb
Release : 2022-05-31
Category : Technology & Engineering
ISBN : 9783031020353

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Advanced Concepts and Architectures for Plasma-Enabled Material Processing by Oleg O. Baranov,Igor Levchenko,Shuyan Xu,Kateryna Bazaka Pdf

Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.

Author : Nicolas Posseme
Publisher : Elsevier
Page : 136 pages
File Size : 48,8 Mb
Release : 2017-01-25
Category : Technology & Engineering
ISBN : 9780081011966

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Plasma Etching Processes for CMOS Devices Realization by Nicolas Posseme Pdf

Plasma etching has long enabled the perpetuation of Moore's Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer term) and sub 20 nm devices, plasma etching requirements have become more and more stringent. Now more than ever, plasma etch technology is used to push the limits of semiconductor device fabrication into the nanoelectronics age. This will require improvement in plasma technology (plasma sources, chamber design, etc.), new chemistries (etch gases, flows, interactions with substrates, etc.) as well as a compatibility with new patterning techniques such as multiple patterning, EUV lithography, Direct Self Assembly, ebeam lithography or nanoimprint lithography. This book presents these etch challenges and associated solutions encountered throughout the years for transistor realization. Helps readers discover the master technology used to pattern complex structures involving various materials Explores the capabilities of cold plasmas to generate well controlled etched profiles and high etch selectivities between materials Teaches users how etch compensation helps to create devices that are smaller than 20 nm

Author : Sabu Thomas,Miran Mozetic,Uros Cvelbar,Petr Spatenka,K.M. Praveen
Publisher : Elsevier
Page : 494 pages
File Size : 43,6 Mb
Release : 2018-10-08
Category : Technology & Engineering
ISBN : 9780128131534

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Non-Thermal Plasma Technology for Polymeric Materials by Sabu Thomas,Miran Mozetic,Uros Cvelbar,Petr Spatenka,K.M. Praveen Pdf

Non-Thermal Plasma Technology for Polymeric Materials: Applications in Composites, Nanostructured Materials and Biomedical Fields provides both an introduction and practical guide to plasma synthesis, modification and processing of polymers, their composites, nancomposites, blends, IPNs and gels. It examines the current state-of-the-art and new challenges in the field, including the use of plasma treatment to enhance adhesion, characterization techniques, and the environmental aspects of the process. Particular attention is paid to the effects on the final properties of composites and the characterization of fiber/polymer surface interactions. This book helps demystify the process of plasma polymerization, providing a thorough grounding in the fundamentals of plasma technology as they relate to polymers. It is ideal for materials scientists, polymer chemists, and engineers, acting as a guide to further research into new applications of this technology in the real world. Enables materials scientists and engineers to deploy plasma technology for surface treatment, characterization and analysis of polymeric materials Reviews the state-of-the-art in plasma technology for polymer synthesis and processing Presents detailed coverage of the most advanced applications for plasma polymerization, particularly in medicine and biomedical engineering, areas such as implants, biosensors and tissue engineering

Author : H. L. Pécseli
Publisher : Unknown
Page : 150 pages
File Size : 49,5 Mb
Release : 1983
Category : Electronic
ISBN : 8755009735

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Lecture notes on plasma physics by H. L. Pécseli Pdf

Author : Rajiv Kohli,K.L. Mittal
Publisher : Elsevier
Page : 830 pages
File Size : 47,8 Mb
Release : 2018-11-27
Category : Technology & Engineering
ISBN : 9780128155783

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Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques by Rajiv Kohli,K.L. Mittal Pdf

Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries Serves as a guide to the selection of precision cleaning techniques for specific applications

Author : K. L. Mittal,Tanweer Ahsan
Publisher : John Wiley & Sons
Page : 357 pages
File Size : 54,7 Mb
Release : 2014-08-25
Category : Technology & Engineering
ISBN : 9781118831342

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Adhesion in Microelectronics by K. L. Mittal,Tanweer Ahsan Pdf

This comprehensive book will provide both fundamental and applied aspects of adhesion pertaining to microelectronics in a single and easily accessible source. Among the topics to be covered include; Various theories or mechanisms of adhesion Surface (physical or chemical) characterization of materials as it pertains to adhesion Surface cleaning as it pertains to adhesion Ways to improve adhesion Unraveling of interfacial interactions using an array of pertinent techniques Characterization of interfaces / interphases Polymer-polymer adhesion Metal-polymer adhesion (metallized polymers) Polymer adhesion to various substrates Adhesion of thin films Adhesion of underfills Adhesion of molding compounds Adhesion of different dielectric materials Delamination and reliability issues in packaged devices Interface mechanics and crack propagation Adhesion measurement of thin films and coatings

Author : Wendi Zhang
Publisher : Forschungszentrum Jülich
Page : 215 pages
File Size : 47,7 Mb
Release : 2013
Category : Electronic
ISBN : 9783893368648

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Ion Beam Treatment of Functional Layers in Thin-film Silicon Solar Cells by Wendi Zhang Pdf

Author : Haikel Jelassi,Djamel Benredjem
Publisher : BoD – Books on Demand
Page : 330 pages
File Size : 46,9 Mb
Release : 2019-02-27
Category : Science
ISBN : 9781789852394

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Plasma Science and Technology by Haikel Jelassi,Djamel Benredjem Pdf

Usually called the "fourth state of matter," plasmas make up more than 99% of known material. In usual terminology, this term generally refers to partially or totally ionized gas and covers a large number of topics with very different characteristics and behaviors. Over the last few decades, the physics and engineering of plasmas was experiencing a renewed interest, essentially born of a series of important applications such as thin-layer deposition, surface treatment, isotopic separation, integrated circuit etchings, medicine, etc. Plasma Science

Author : K. L. Mittal,Anil N. Netravali
Publisher : John Wiley & Sons
Page : 596 pages
File Size : 40,7 Mb
Release : 2024-04-02
Category : Technology & Engineering
ISBN : 9781394231003

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Polymer Surface Modification to Enhance Adhesion by K. L. Mittal,Anil N. Netravali Pdf

POLYMER SURFACE MODIFICATION TO ENHANCE ADHESION This unique, comprehensive and groundbreaking book is the first on this important subject. Polymer Surface Modification to Enhance Adhesion comprises 13 chapters and is divided into two parts: Part 1: Energetic Treatments; and Part 2: Chemical Treatments. Topics covered include atmospheric pressure plasma treatment of polymers to enhance adhesion; corona treatment of polymer surfaces to enhance adhesion; flame surface treatment of polymers to enhance adhesion; vacuum UV photo-oxidation of polymer surfaces to enhance adhesion; optimization of adhesion of polymers using photochemical surface modification UV/Ozone surface treatment of polymers to enhance adhesion; adhesion enhancement of polymer surfaces by ion beam treatment; polymer surface modification by charged particles; laser surface modification of polymeric materials; competition in adhesion between polysort and monosort functionalized polyolefinic surfaces; amine-terminated dendritic materials for polymer surface modification; arginine-glycine-aspartic acid (RGD) modification of polymer surfaces; and adhesion promoters for polymer surfaces. Audience The book will be of great interest to polymer scientists, surface scientists, adhesionists, materials scientists, plastics engineers, and to those involved in adhesive bonding, packaging, printing, painting, metallization, biological adhesion, biomedical devices, and polymer composites.