Lithography

Author : Harry J. Levinson
Publisher : SPIE Press
Page : 446 pages
File Size : 45,6 Mb
Release : 2005
Category : Technology & Engineering
ISBN : 0819456608

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Principles of Lithography by Harry J. Levinson Pdf

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Author : Harry J. Levinson
Publisher : SPIE Press
Page : 210 pages
File Size : 41,5 Mb
Release : 1999
Category : Photography
ISBN : 0819430528

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Lithography Process Control by Harry J. Levinson Pdf

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

Author : Wayne M. Moreau
Publisher : Springer Science & Business Media
Page : 937 pages
File Size : 47,6 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781461308850

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Semiconductor Lithography by Wayne M. Moreau Pdf

Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.

Author : Chris Mack
Publisher : John Wiley & Sons
Page : 503 pages
File Size : 46,9 Mb
Release : 2011-08-10
Category : Technology & Engineering
ISBN : 9781119965077

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Fundamental Principles of Optical Lithography by Chris Mack Pdf

The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

Author : W. D. Richmond
Publisher : Cambridge University Press
Page : 278 pages
File Size : 50,8 Mb
Release : 2010-03-04
Category : History
ISBN : 9781108009072

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The Grammar of Lithography by W. D. Richmond Pdf

A comprehensive practical guide to the many lithographic techniques current in the nineteenth century.

Author : Marjorie Devon,Bill Lagattuta,Rodney Hamon
Publisher : ABRAMS
Page : 328 pages
File Size : 47,5 Mb
Release : 2008
Category : Art
ISBN : UOM:39015078790634

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Tamarind Techniques for Fine Art Lithography by Marjorie Devon,Bill Lagattuta,Rodney Hamon Pdf

This comprehensive text covers all facets of fine art lithography, from setting up a workshop of any size to pulling a successful edition. It ofers complete, illustrated step-by-step instructions for all techniques in use.

Author : Chris Mack
Publisher : John Wiley & Sons
Page : 534 pages
File Size : 40,5 Mb
Release : 2008-03-11
Category : Technology & Engineering
ISBN : 0470723866

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Fundamental Principles of Optical Lithography by Chris Mack Pdf

The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

Author : John Ruthven and Company
Publisher : Unknown
Page : 36 pages
File Size : 45,5 Mb
Release : 1821
Category : Lithography
ISBN : UOM:39015033595979

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Concise Account of Lithography by John Ruthven and Company Pdf

Author : Vivek Bakshi
Publisher : SPIE Press
Page : 704 pages
File Size : 52,8 Mb
Release : 2009
Category : Art
ISBN : 9780819469649

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EUV Lithography by Vivek Bakshi Pdf

Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Author : Johann Nepomuk F. Alois Senefelder
Publisher : Unknown
Page : 410 pages
File Size : 40,5 Mb
Release : 1819
Category : Electronic
ISBN : OXFORD:590895879

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A complete course of lithography, tr. by A.S. by Johann Nepomuk F. Alois Senefelder Pdf

Author : Raucourt (colonel, Antoine)
Publisher : Unknown
Page : 174 pages
File Size : 48,9 Mb
Release : 1821
Category : Lithography
ISBN : HARVARD:32044034485383

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A Manual of Lithography; Or, Memoir on the Lithographical Experiments Made in Paris, at the Royal School of the Roads and Bridges by Raucourt (colonel, Antoine) Pdf

Author : Alois Senefelder
Publisher : Unknown
Page : 416 pages
File Size : 46,7 Mb
Release : 1819
Category : Lithography
ISBN : DMM:057002491219

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A Complete Course Of Lithography by Alois Senefelder Pdf

Author : Clivia M. Sotomayor Torres
Publisher : Springer Science & Business Media
Page : 343 pages
File Size : 55,7 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781441992048

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Alternative Lithography by Clivia M. Sotomayor Torres Pdf

Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.

Author : Alfred Kwok-Kit Wong
Publisher : SPIE Press
Page : 238 pages
File Size : 50,9 Mb
Release : 2001
Category : Science
ISBN : 0819439959

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Resolution Enhancement Techniques in Optical Lithography by Alfred Kwok-Kit Wong Pdf

Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers

Author : Jingsong Wei
Publisher : Springer Nature
Page : 215 pages
File Size : 46,6 Mb
Release : 2019-11-20
Category : Science
ISBN : 9789811509438

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Laser Heat-Mode Lithography by Jingsong Wei Pdf

This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.