Principles Of Chemical Vapor Deposition

Author : Daniel Dobkin,M.K. Zuraw
Publisher : Springer Science & Business Media
Page : 298 pages
File Size : 42,9 Mb
Release : 2003-04-30
Category : Technology & Engineering
ISBN : 1402012489

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Principles of Chemical Vapor Deposition by Daniel Dobkin,M.K. Zuraw Pdf

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Author : D.M. Dobkin,M.K. Zuraw
Publisher : Springer Science & Business Media
Page : 277 pages
File Size : 51,7 Mb
Release : 2013-03-09
Category : Technology & Engineering
ISBN : 9789401703697

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Principles of Chemical Vapor Deposition by D.M. Dobkin,M.K. Zuraw Pdf

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Author : Hugh O. Pierson
Publisher : William Andrew
Page : 506 pages
File Size : 51,6 Mb
Release : 1999-09-01
Category : Technology & Engineering
ISBN : 9780815517436

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Handbook of Chemical Vapor Deposition by Hugh O. Pierson Pdf

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Author : M. L. Hitchman,K. F. Jensen
Publisher : Academic Press
Page : 692 pages
File Size : 42,5 Mb
Release : 1993-04-13
Category : Science
ISBN : UCAL:$B235277

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Chemical Vapor Deposition by M. L. Hitchman,K. F. Jensen Pdf

This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.

Author : Daniel Dobkin,M.K. Zuraw
Publisher : Springer
Page : 273 pages
File Size : 41,8 Mb
Release : 2014-03-14
Category : Technology & Engineering
ISBN : 9401703701

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Principles of Chemical Vapor Deposition by Daniel Dobkin,M.K. Zuraw Pdf

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Author : Arthur Sherman
Publisher : William Andrew
Page : 240 pages
File Size : 53,5 Mb
Release : 1987
Category : Computers
ISBN : UOM:39015012752427

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Chemical Vapor Deposition for Microelectronics by Arthur Sherman Pdf

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Author : Hugh O. Pierson
Publisher : William Andrew
Page : 458 pages
File Size : 44,6 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9781437744880

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Handbook of Chemical Vapor Deposition by Hugh O. Pierson Pdf

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

Author : Srinivasan Sivaram
Publisher : Springer Science & Business Media
Page : 302 pages
File Size : 44,9 Mb
Release : 2013-11-11
Category : Technology & Engineering
ISBN : 9781475747515

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Chemical Vapor Deposition by Srinivasan Sivaram Pdf

In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.

Author : Professor K.S. K.S Sree Harsha
Publisher : Elsevier
Page : 1176 pages
File Size : 42,9 Mb
Release : 2005-12-16
Category : Technology & Engineering
ISBN : 0080480314

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Principles of Vapor Deposition of Thin Films by Professor K.S. K.S Sree Harsha Pdf

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Author : Edited by Jong-Hee Park and T.S. Sudarshan
Publisher : ASM International
Page : 478 pages
File Size : 45,6 Mb
Release : 2000-05-01
Category : Technology & Engineering
ISBN : 8210379456XXX

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Surface Engineering Series Volume 2: Chemical Vapor Deposition by Edited by Jong-Hee Park and T.S. Sudarshan Pdf

This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical sta

Author : Xiu-Tian Yan,Yongdong Xu
Publisher : Springer Science & Business Media
Page : 352 pages
File Size : 50,5 Mb
Release : 2010-03-23
Category : Technology & Engineering
ISBN : 9781848828940

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Chemical Vapour Deposition by Xiu-Tian Yan,Yongdong Xu Pdf

"Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.

Author : J. Mazumder,Aravinda Kar
Publisher : Springer Science & Business Media
Page : 406 pages
File Size : 49,8 Mb
Release : 2013-06-29
Category : Technology & Engineering
ISBN : 9781489914309

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Theory and Application of Laser Chemical Vapor Deposition by J. Mazumder,Aravinda Kar Pdf

In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

Author : Donald L. Smith
Publisher : McGraw Hill Professional
Page : 648 pages
File Size : 50,8 Mb
Release : 1995-03-22
Category : Technology & Engineering
ISBN : 0070585024

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Thin-Film Deposition: Principles and Practice by Donald L. Smith Pdf

Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.

Author : Jong-Hee Park,T. S. Sudarshan
Publisher : ASM International
Page : 477 pages
File Size : 54,5 Mb
Release : 2001
Category : Technology & Engineering
ISBN : 9781615032242

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Chemical Vapor Deposition by Jong-Hee Park,T. S. Sudarshan Pdf

Author : Hirotsugu Yasuda
Publisher : CRC Press
Page : 840 pages
File Size : 50,7 Mb
Release : 2004-11-30
Category : Science
ISBN : 9781420030297

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Luminous Chemical Vapor Deposition and Interface Engineering by Hirotsugu Yasuda Pdf

Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science.