Rapid Thermal And Integrated Processing

Author : F. Roozeboom
Publisher : Springer Science & Business Media
Page : 568 pages
File Size : 47,6 Mb
Release : 2013-03-09
Category : Science
ISBN : 9789401587112

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Advances in Rapid Thermal and Integrated Processing by F. Roozeboom Pdf

Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.

Author : Anonim
Publisher : Unknown
Page : 460 pages
File Size : 53,7 Mb
Release : 1997
Category : Rapid thermal processing
ISBN : UOM:39015039846749

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Rapid Thermal and Integrated Processing by Anonim Pdf

Author : F. Roozeboom
Publisher : Unknown
Page : 580 pages
File Size : 40,6 Mb
Release : 2014-01-15
Category : Electronic
ISBN : 9401587124

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Advances in Rapid Thermal and Integrated Processing by F. Roozeboom Pdf

Author : J. C. Gelpey
Publisher : Unknown
Page : 416 pages
File Size : 52,7 Mb
Release : 1996-10-14
Category : Technology & Engineering
ISBN : UCSD:31822023702517

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Rapid Thermal and Integrated Processing V: Volume 429 by J. C. Gelpey Pdf

This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.

Author : Richard B. Fair
Publisher : Academic Press
Page : 441 pages
File Size : 52,7 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9780323139809

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Rapid Thermal Processing by Richard B. Fair Pdf

This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.

Author : Fred Roozeboom
Publisher : The Electrochemical Society
Page : 482 pages
File Size : 53,6 Mb
Release : 2000
Category : Technology & Engineering
ISBN : 1566772745

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Rapid Thermal and Other Short-time Processing Technologies by Fred Roozeboom Pdf

The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.

Author : Jimmie J. Wortman
Publisher : Unknown
Page : 472 pages
File Size : 43,7 Mb
Release : 1994-08-02
Category : Technology & Engineering
ISBN : UCSD:31822018696641

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Rapid Thermal and Integrated Processing III: Volume 342 by Jimmie J. Wortman Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Author : David Hodul
Publisher : Unknown
Page : 544 pages
File Size : 48,7 Mb
Release : 1989-11-03
Category : Technology & Engineering
ISBN : UCAL:$B214547

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Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 by David Hodul Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Author : Wielfried Lerch,Jürgen Niess
Publisher : Trans Tech Publications Ltd
Page : 448 pages
File Size : 40,6 Mb
Release : 2008-03-24
Category : Technology & Engineering
ISBN : 9783038131731

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Rapid Thermal Processing and beyond: Applications in Semiconductor Processing by Wielfried Lerch,Jürgen Niess Pdf

Heat-treatment and thermal annealing are very common processing steps which have been employed during semiconductor manufacturing right from the beginning of integrated circuit technology. In order to minimize undesired diffusion, and other thermal budget-dependent effects, the trend has been to reduce the annealing time sharply by switching from standard furnace batch-processing (involving several hours or even days), to rapid thermal processing involving soaking times of just a few seconds. This transition from thermal equilibrium, to highly non-equilibrium, processing was very challenging and is still a field ripe for further development.

Author : Fred Roozeboom
Publisher : The Electrochemical Society
Page : 470 pages
File Size : 54,7 Mb
Release : 1999
Category : Technology & Engineering
ISBN : 156677232X

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Advances in Rapid Thermal Processing by Fred Roozeboom Pdf

Author : Jeffrey C. Gelpey
Publisher : Mrs Proceedings
Page : 448 pages
File Size : 47,8 Mb
Release : 1993-07-28
Category : Technology & Engineering
ISBN : UCSD:31822015236615

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Rapid Thermal and Integrated Processing II: Volume 303 by Jeffrey C. Gelpey Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Author : Jeffrey C. Gelpey,Terrence J. Riley,Fred Roozeboom,Shuichi Saito
Publisher : Materials Research Society
Page : 0 pages
File Size : 43,8 Mb
Release : 1998-01-09
Category : Technology & Engineering
ISBN : 1558993746

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Rapid Thermal and Integrated Processing IV: Volume 470 by Jeffrey C. Gelpey,Terrence J. Riley,Fred Roozeboom,Shuichi Saito Pdf

The MRS proceedings series on rapid thermal processing (RTP) has become the predominant international forum for research in this exciting and fast-growing field. In particular, this book in the series clearly indicates that the science of RTP is increasingly better understood and that equipment simulation and engineering have matured. With the so-called 'second generation' equipment vendors are providing useful and production-worthy solutions to the most pertinent problems within RTP - temperature measurement and reproducability. For that reason, the issues of temperature calibration and metrology, along with the International Temperature Scale, are featured. The evaluation and modelling of furnace, mini-bath and single-wafer RTP furnaces as the thermal method of choice are also addressed. Interesting developments are reported in the processing of dielectrics. Applications outside the field of silicon semiconductors are also presented. Topics include: measurement; RTCVD; modelling and manufacturing; integrated processing; silicides; annealing and defects; dielectrics; and RTP of III-V materials and other novel applications.

Author : Materials Research Society
Publisher : Unknown
Page : 432 pages
File Size : 51,8 Mb
Release : 1998
Category : Chemical vapor deposition
ISBN : UCSD:31822026265090

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Rapid Thermal and Integrated Processing VII by Materials Research Society Pdf

Author : Victor E. Borisenko,Peter J. Hesketh
Publisher : Springer Science & Business Media
Page : 374 pages
File Size : 43,9 Mb
Release : 2013-11-22
Category : Technology & Engineering
ISBN : 9781489918048

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Rapid Thermal Processing of Semiconductors by Victor E. Borisenko,Peter J. Hesketh Pdf

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

Author : Mehrdad M. Moslehi,Rajendra Singh,Dim-Lee Kwong
Publisher : Unknown
Page : 226 pages
File Size : 48,9 Mb
Release : 1992
Category : Technology & Engineering
ISBN : UOM:39015025263479

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Rapid Thermal and Integrated Processing by Mehrdad M. Moslehi,Rajendra Singh,Dim-Lee Kwong Pdf