Technology Of Si Ge And Sic Technologie Von Si Ge Und Sic
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Technology of Si, Ge, and SiC / Technologie Von Si, Ge und SiC by W. Dietze,E. Doering,M. Schulz,P. Glasow,W. Langheinrich,A. Ludsteck,H. Mader,A. Mühlbauer,W.v. Münch,H. Runge,L. Schleicher,M. Schnöller,E. Sirtl,E. Uden,W. Zulehner Pdf
Physical Chemistry of Semiconductor Materials and Processes by Anonim Pdf
The development of solid state devices began a little more than a century ago, with the discovery of the electrical conductivity of ionic solids. Today, solid state technologies form the background of the society in which we live. The aim of this book is threefold: to present the background physical chemistry on which the technology of semiconductor devices is based; secondly, to describe specific issues such as the role of defects on the properties of solids, and the crucial influence of surface properties; and ultimately, to look at the physics and chemistry of semiconductor growth processes, both at the bulk and thin-film level, together with some issues relating to the properties of nano-devices. Divided into five chapters, it covers: Thermodynamics of solids, including phases and their properties and structural order Point defects in semiconductors Extended defects in semiconductors and their interactions with point defects and impurities Growth of semiconductor materials Physical chemistry of semiconductor materials processing With applications across all solid state technologies,the book is useful for advanced students and researchers in materials science, physics, chemistry, electrical and electronic engineering. It is also useful for those in the semiconductor industry.
Etching in Microsystem Technology by Michael Köhler Pdf
Microcomponents and microdevices are increasingly finding application in everyday life. The specific functions of all modern microdevices depend strongly on the selection and combination of the materials used in their construction, i.e., the chemical and physical solid-state properties of these materials, and their treatment. The precise patterning of various materials, which is normally performed by lithographic etching processes, is a prerequisite for the fabrication of microdevices. The microtechnical etching of functional patterns is a multidisciplinary area, the basis for the etching processes coming from chemistry, physics, and engineering. The book is divided into two sections: the wet and dry etching processes are presented in the first, general, section, which provides the scientific fundamentals, while a catalog of etching bath composition, etching instructions, and parameters can be found in the second section. This section will enhance the comprehension of the general section and also give an overview of data that are essential in practice.
Technology of Integrated Circuits by D. Widmann,H. Mader,H. Friedrich Pdf
This is the first book to comprehensively record the authors’ authoritative knowledge and practical experience of IC manufacturing, including the tremendous developments of recent years. With its strong application orientation, this is a must-have book for professionals in semiconductor industries.
Technology of Si, Ge, and SiC / Technologie von Si, Ge und SiC by M. Schulz,W. Dietze,E. Doering,P. Glasow,W. Langheinrich,A. Ludsteck,H. Mader,A. Mühlbauer,W.v. Münch,H. Runge,L. Schleicher,M. Schnöller,E. Sirtl,E. Uden,W. Zulehner Pdf
Apatites and their Synthetic Analogues by Petr Ptáček Pdf
Apatite-type minerals and their synthetic analogues are of interest of many industrial branches and scientific disciplines including material sciences, chemical industry, agriculture, geology, medicine and dentistry. This book provides a basic overview of general knowledges of this topic in order to provide the comprehensive survey from a scientific and technological perspective. The book is divided into 10 chapters, which are devoted to the structure and properties of minerals from the supergroup of apatite, experimental techniques of preparation and characterization of synthetic analogues of apatite minerals, substitution in the structure of apatite as well as utilization of these materials in wide range of common and special advanced applications in industry, material sciences and research. Additionally, the phosphate rocks, their classification, geological role, mining and beneficiation of phosphate ore, production of elemental phosphorus, phosphoric acid and fertilizers are also described. Although this book is meant for chemist, material scientist and research engineers, the individual chapters contain theoretical background, historical aspects as well as examples of synthetic and analytical methods which may be also interesting for students and non-expert readers as well.
Silicon-Based Millimeter-Wave Devices by Johann-Friedrich Luy,Peter Russer Pdf
A description of field-theoretical methods for the design and analysis of planar waveguide structures and antennas. The principles and limitations of transit-time devices with different injection mechanisms are covered, as are aspects of fabrication and characterization. The physical properties of silicon Schottky contacts and diodes are treated in a separate chapter, while two whole chapters are devoted to silicon/germanium devices. The integration of devices in monolithic circuits is explained together with advanced technologies, such as the self-mixing oscillator operation, before concluding with sensor and system applications.
Technology of Si, Ge, and SiC / Technologie von Si, Ge und SiC by M. Schulz,W. Dietze,E. Doering,P. Glasow,W. Langheinrich,A. Ludsteck,H. Mader,A. Mühlbauer,W.v. Münch,H. Runge,L. Schleicher,M. Schnöller,E. Sirtl,E. Uden,W. Zulehner Pdf
Silicon Carbide by Wolfgang J. Choyke,Hiroyuki Matsunami,Gerhard Pensl Pdf
Since the 1997 publication of "Silicon Carbide - A Review of Fundamental Questions and Applications to Current Device Technology" edited by Choyke, et al., there has been impressive progress in both the fundamental and developmental aspects of the SiC field. So there is a growing need to update the scientific community on the important events in research and development since then. The editors have again gathered an outstanding team of the world's leading SiC researchers and design engineers to write on the most recent developments in SiC.
Micro- and Nanoelectronics: Emerging Device Challenges and Solutions presents a comprehensive overview of the current state of the art of micro- and nanoelectronics, covering the field from fundamental science and material properties to novel ways of making nanodevices. Containing contributions from experts in both industry and academia, this cutting-edge text: Discusses emerging silicon devices for CMOS technologies, fully depleted device architectures, characteristics, and scaling Explains the specifics of silicon compound devices (SiGe, SiC) and their unique properties Explores various options for post-CMOS nanoelectronics, such as spintronic devices and nanoionic switches Describes the latest developments in carbon nanotubes, iii-v devices structures, and more Micro- and Nanoelectronics: Emerging Device Challenges and Solutions provides an excellent representation of a complex engineering field, examining emerging materials and device architecture alternatives with the potential to shape the future of nanotechnology.
Advancing Silicon Carbide Electronics Technology II by Konstantinos Zekentes,Konstantin Vasilevskiy Pdf
The book presents an in-depth review and analysis of Silicon Carbide device processing. The main topics are: (1) Silicon Carbide Discovery, Properties and Technology, (2) Processing and Application of Dielectrics in Silicon Carbide Devices, (3) Doping by Ion Implantation, (4) Plasma Etching and (5) Fabrication of Silicon Carbide Nanostructures and Related Devices. The book is also suited as supplementary textbook for graduate courses. Keywords: Silicon Carbide, SiC, Technology, Processing, Semiconductor Devices, Material Properties, Polytypism, Thermal Oxidation, Post Oxidation Annealing, Surface Passivation, Dielectric Deposition, Field Effect Mobility, Ion Implantation, Post Implantation Annealing, Channeling, Surface Roughness, Dry Etching, Plasma Etching, Ion Etching, Sputtering, Chemical Etching, Plasma Chemistry, Micromasking, Microtrenching, Nanocrystal, Nanowire, Nanotube, Nanopillar, Nanoelectromechanical Systems (NEMS).
Laser Surface Processing and Characterization by Ian W. Boyd Pdf
The contributions in this volume reflect not only the growing understanding of the underlying mechanisms controlling the various reactions in laser surface processing, but also the potential of several developing applications of direct processing. The most notable trend in the field currently is the technique of laser ablation, which is reported in almost a quarter of the papers in this volume. Whilst by no means a new phenomenon, attention has until recent years remained in the area of lithography and UV-sensitive materials. The growth in interest lies in the use of the technique to grow multi-component thin films and multi-layers. A number of papers on the topic of process diagnostics and in-situ measurements are also included. The theme of these annual meetings is centred around the physical and chemical modification of thin films and surfaces induced by the action of photon, ion, neutral, or electron beams in a variety of environments. Consequently these proceedings provide a comprehensive and unified presentation of the latest developments in this field.
