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Author : Hyun Kyung Chung
Publisher : Unknown
Page : 338 pages
File Size : 48,6 Mb
Release : 1998
Category : Electronic
ISBN : WISC:89066583618
Author : V. M. Lelevkin,D. K. Otorbaev,D. C. Schram
Publisher : Elsevier Science & Technology
Page : 444 pages
File Size : 51,9 Mb
Release : 1992
Category : Science
ISBN : UOM:39015029739490
This book deals with the physics of low temperature plasmas of atomic and molecular gases. Several diagnostic methods for nonequilibrium plasma are described. The relevant elementary processes governing the kinetics and transport of atomic and chemically active molecular plasmas are discussed and numerical models of plasmas aimed at systematically solving MHD-equations are also presented. Intended for use by scientists and engineers active in various fields of low-temperature plasma physics, this book is also suitable for teachers and students at pre- and postgraduate level. In chapter 1 general problems of the elementary physics of plasma are considered and the principal ideas relating to plasma properties are given. In chapter 2 the principles which form the basis of atomic and molecular spectra radiated by a plasma are briefly described. Chapter 3 reviews experimental material associated with the peculiarities of molecular excitation processes in nonequilibrium low-temperature plasma. In chapter 4 a number of problems related to the technique and methods of spectroscopy are considered. Chapter 5 presents experimental material gained from studying the peculiarities of molecular excitation spectra from low-pressure gas discharges and describes diagnostics for nonequilibrium chemically active plasma. In chapter 6 the problems of mathematical modeling of equilibrium plasma in arcs, microwave and optical discharges are analyzed. In chapter 7, a theoretical description of nonequilibrium plasma in electrical arcs, microwave and radio-frequency discharges based on two-temperature approximation of the plasma parameters is offered. Chapter 8 presents a detailed case-study on the transport and excitation of a magnetized plasma of intermediate electron density. Several diagnostic techniques and models introduced in earlier chapters are used to obtain information on plasma properties.
Author : A. Surjalal Sharma,P. Kaw
Publisher : Springer Science & Business Media
Page : 346 pages
File Size : 53,6 Mb
Release : 2006-05-24
Category : Science
ISBN : 9781402031090
This book presents studies of complexity in the context of nonequilibrium phenomena using theory, modeling, simulations, and experiments, both in the laboratory and in nature.
Author : Gordon W. F. Drake
Publisher : Springer Science & Business Media
Page : 1505 pages
File Size : 42,8 Mb
Release : 2007-02-05
Category : Science
ISBN : 9780387263083
Comprises a comprehensive reference source that unifies the entire fields of atomic molecular and optical (AMO) physics, assembling the principal ideas, techniques and results of the field. 92 chapters written by about 120 authors present the principal ideas, techniques and results of the field, together with a guide to the primary research literature (carefully edited to ensure a uniform coverage and style, with extensive cross-references). Along with a summary of key ideas, techniques, and results, many chapters offer diagrams of apparatus, graphs, and tables of data. From atomic spectroscopy to applications in comets, one finds contributions from over 100 authors, all leaders in their respective disciplines. Substantially updated and expanded since the original 1996 edition, it now contains several entirely new chapters covering current areas of great research interest that barely existed in 1996, such as Bose-Einstein condensation, quantum information, and cosmological variations of the fundamental constants. A fully-searchable CD- ROM version of the contents accompanies the handbook.
Author : Arnold F. Nikiforov,Vladimir G. Novikov,Vasili B. Uvarov
Publisher : Springer Science & Business Media
Page : 456 pages
File Size : 42,5 Mb
Release : 2005-02-17
Category : Law
ISBN : 3764321830
This book studies the widely used theoretical models for calculating properties of hot dense matter. Calculations are illustrated by plots and tables, and they are compared with experimental results. The purpose is to help understanding of atomic physics in hot plasma and to aid in developing efficient and robust computer codes for calculating opacity and equations of state for arbitrary material in a wide range of temperatures and densities.
Author : Anonim
Publisher : Unknown
Page : 104 pages
File Size : 50,7 Mb
Release : 1979
Category : Controlled fusion
ISBN : UOM:39015033685002
Author : K.H. Becker,U. Kogelschatz,K.H. Schoenbach,R.J. Barker
Publisher : CRC Press
Page : 704 pages
File Size : 43,8 Mb
Release : 2004-11-29
Category : Science
ISBN : 0750309628
Atmospheric-pressure plasmas continue to attract considerable research interest due to their diverse applications, including high power lasers, opening switches, novel plasma processing applications and sputtering, EM absorbers and reflectors, remediation of gaseous pollutants, excimer lamps, and other noncoherent light sources. Atmospheric-pressure plasmas in air are of particular importance as they can be generated and maintained without vacuum enclosure and without any additional feed gases. Non-Equilibrium Air Plasmas at Atmospheric Pressure reviews recent advances and applications in the generation and maintenance of atmospheric-pressure plasmas. With contributions from leading international researchers, the coverage includes advances in atmospheric-pressure plasma source development, diagnostics and characterization, air plasma chemistry, modeling and computational techniques, and an assessment of the status and prospects of atmospheric-pressure air plasma applications. The extensive application sections make this book attractive for practitioners in many fields where technologies based on atmospheric-pressure air plasmas are emerging.
Author : Yuri Ralchenko
Publisher : Springer
Page : 212 pages
File Size : 43,8 Mb
Release : 2016-02-25
Category : Science
ISBN : 9783319275147
This book provides a compact yet comprehensive overview of recent developments in collisional-radiative (CR) modeling of laboratory and astrophysical plasmas. It describes advances across the entire field, from basic considerations of model completeness to validation and verification of CR models to calculation of plasma kinetic characteristics and spectra in diverse plasmas. Various approaches to CR modeling are presented, together with numerous examples of applications. A number of important topics, such as atomic models for CR modeling, atomic data and its availability and quality, radiation transport, non-Maxwellian effects on plasma emission, ionization potential lowering, and verification and validation of CR models, are thoroughly addressed. Strong emphasis is placed on the most recent developments in the field, such as XFEL spectroscopy. Written by leading international research scientists from a number of key laboratories, the book offers a timely summary of the most recent progress in this area. It will be a useful and practical guide for students and experienced researchers working in plasma spectroscopy, spectra simulations, and related fields.
Author : Frank B. Rosmej,Valery A. Astapenko,Valery S. Lisitsa
Publisher : Springer Nature
Page : 668 pages
File Size : 49,9 Mb
Release : 2021-09-06
Category : Science
ISBN : 9783030059682
Plasma Atomic Physics provides an overview of the elementary processes within atoms and ions in plasmas, and introduces readers to the language of atomic spectra and light emission, allowing them to explore the various and fascinating radiative properties of matter. The book familiarizes readers with the complex quantum-mechanical descriptions of electromagnetic and collisional processes, while also developing a number of effective qualitative models that will allow them to obtain adequately comprehensive descriptions of collisional-radiative processes in dense plasmas, dielectronic satellite emissions and autoionizing states, hollow ion X-ray emissions, polarized atoms and ions, hot electrons, charge exchange, atomic population kinetics, and radiation transport. Numerous applications to plasma spectroscopy and experimental data are presented, which concern magnetic confinement fusion, inertial fusion, laser-produced plasmas, and X-ray free-electron lasers’ interaction with matter. Particular highlights include the development of quantum kinetics to a level surpassing the almost exclusively used quasi-classical approach in atomic population kinetics, the introduction of the recently developed Quantum-F-Matrix-Theory (QFMT) to study the impact of plasma microfields on atomic populations, and the Enrico Fermi equivalent photon method to develop the “Plasma Atom”, where the response properties and oscillator strength distribution are represented with the help of a local plasma frequency of the atomic electron density. Based on courses held by the authors, this material will assist students and scientists studying the complex processes within atoms and ions in different kinds of plasmas by developing relatively simple but highly effective models. Considerable attention is paid to a number of qualitative models that deliver physical transparency, while extensive tables and formulas promote the practical and useful application of complex theories and provide effective tools for non-specialist readers.
Author : Albert L. Osterheld,W. Goldstein,W.H. Goldstein
Publisher : American Institute of Physics
Page : 328 pages
File Size : 43,8 Mb
Release : 1996
Category : Science
ISBN : STANFORD:36105019796908
Contains papers based on 30 talks presented at the Tenth American Physical Society Topical Conference on Atomic Processes in Plasmas, held in San Francisco in January 1996. The volume begins with a section on atomic physics in tokamak plasmas, followed by sections covering atomic physics in astrophy
Author : Jacques Bauche,Claire Bauche-Arnoult,Olivier Peyrusse
Publisher : Springer
Page : 379 pages
File Size : 40,6 Mb
Release : 2015-08-03
Category : Science
ISBN : 9783319181479
This book is devoted to the calculation of hot-plasma properties which generally requires a huge number of atomic data. It is the first book that combines information on the details of the basic atomic physics and its application to atomic spectroscopy with the use of the relevant statistical approaches. Information like energy levels, radiative rates, collisional and radiative cross-sections, etc., must be included in equilibrium or non-equilibrium models in order to describe both the atomic-population kinetics and the radiative properties. From the very large number of levels and transitions involved in complex ions, some statistical (global) properties emerge. The book presents a coherent set of concepts and compact formulas suitable for tractable and accurate calculations. The topics addressed are: radiative emission and absorption, and a dozen of other collisional and radiative processes; transition arrays between level ensembles (configurations, superconfigurations); effective temperatures of configurations, superconfigurations, and ions; charge-state distributions; radiative power losses and opacity. There are many numerical examples and comparisons with experiment presented throughout the book. The plasma properties described in this book are especially relevant to large nuclear fusion facilities such as the NIF (California) and the ITER (France), and to astrophysics. Methods relevant to the central-field configurational model are described in detail in the appendices: tensor-operator techniques, second-quantization formalism, statistical distribution moments, and the algebra of partition functions. Some extra tools are propensity laws, correlations, and fractals. These methods are applied to the analytical derivation of many properties, specially the global ones, through which the complexity is much reduced. The book is intended for graduate-level students, and for physicists working in the field.
Author : Hideaki Takabe
Publisher : Springer Nature
Page : 467 pages
File Size : 46,7 Mb
Release : 2024-06-30
Category : Electronic
ISBN : 9783031454738
Author : Anonim
Publisher : Unknown
Page : 592 pages
File Size : 45,5 Mb
Release : 2024-06-30
Category : Military research
ISBN : STANFORD:36105211293381
Author : M. Capitelli,C. Gorse
Publisher : Springer Science & Business Media
Page : 226 pages
File Size : 50,9 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781461534006
The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A
Author : Michael Wang
Publisher : BoD – Books on Demand
Page : 680 pages
File Size : 50,9 Mb
Release : 2010-02-01
Category : Science
ISBN : 9789533070643
Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
