Characterization And Metrology For Ulsi Technology

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Characterization and Metrology for ULSI Technology 2005

Author : David G. Seiler
Publisher : American Institute of Physics
Page : 714 pages
File Size : 54,8 Mb
Release : 2005-09-29
Category : Science
ISBN : UOM:39015069190943

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Characterization and Metrology for ULSI Technology 2005 by David G. Seiler Pdf

The worldwide semiconductor community faces increasingly difficult challenges in the era of silicon nanotechnology and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continuing the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The book also covers emerging nano-devices and the corresponding metrology challenges that arise.

Characterization and Metrology for ULSI Technology 2000

Author : David G. Seiler,Alain C. Diebold,Thomas J. Shaffner,Robert McDonald,W. Murray Bullis,Patrick J. Smith,Erik M. Secula
Publisher : American Institute of Physics
Page : 708 pages
File Size : 45,9 Mb
Release : 2001-03-01
Category : Technology & Engineering
ISBN : 156396967X

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Characterization and Metrology for ULSI Technology 2000 by David G. Seiler,Alain C. Diebold,Thomas J. Shaffner,Robert McDonald,W. Murray Bullis,Patrick J. Smith,Erik M. Secula Pdf

The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm. Some of the challenges are materials-related, such as transistors with high-k dielectrics and on-chip interconnects made from copper and low-k dielectrics. The magnitude of these challenges demands special attention from those in the metrology and analytical measurements community. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of the process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. It provides a concise and effective portrayal of industry characterization needs and some of the problems that must be addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. It also provides a basis for stimulating practical perspectives and new ideas for research and development.

Characterization and Metrology for ULSI Technology: 1998 International Conference, 23-27 March 1998

Author : D.G. Seiler,A.C. Diebold,W.M. Bullis,T.J. Shaffner,R. McDonald,E.J. Walters
Publisher : American Institute of Physics
Page : 960 pages
File Size : 55,5 Mb
Release : 1998-11-01
Category : Technology & Engineering
ISBN : 1563968673

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Characterization and Metrology for ULSI Technology: 1998 International Conference, 23-27 March 1998 by D.G. Seiler,A.C. Diebold,W.M. Bullis,T.J. Shaffner,R. McDonald,E.J. Walters Pdf

The proceedings of the 1998 International Conference on Characterization and Metrology for ULSI Technology was dedicated to summarizing major issues and giving critical reviews of important semiconductor techniques that are crucial to continue the advances in semiconductor technology. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing. This is the only book that we know of that emphasizes the science and technology of semiconductor characterization in the factory environment. The increasing importance of monitoring and controlling semiconductor processes make it particularly timely.

Handbook of Semiconductor Manufacturing Technology

Author : Yoshio Nishi,Robert Doering
Publisher : CRC Press
Page : 1720 pages
File Size : 52,5 Mb
Release : 2017-12-19
Category : Technology & Engineering
ISBN : 9781420017663

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Handbook of Semiconductor Manufacturing Technology by Yoshio Nishi,Robert Doering Pdf

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

National Semiconductor Metrology Program

Author : National Institute of Standards and Technology (U.S.),National Semiconductor Metrology Program (U.S.)
Publisher : Unknown
Page : 160 pages
File Size : 50,8 Mb
Release : 2000
Category : Semiconductors
ISBN : UOM:39015048215175

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National Semiconductor Metrology Program by National Institute of Standards and Technology (U.S.),National Semiconductor Metrology Program (U.S.) Pdf

National Semiconductor Metrology Program

Author : National Semiconductor Metrology Program (U.S.)
Publisher : Unknown
Page : 160 pages
File Size : 46,8 Mb
Release : 2000
Category : Semiconductors
ISBN : IND:30000097563542

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National Semiconductor Metrology Program by National Semiconductor Metrology Program (U.S.) Pdf

Advanced Interconnects for ULSI Technology

Author : Mikhail Baklanov,Paul S. Ho,Ehrenfried Zschech
Publisher : John Wiley & Sons
Page : 616 pages
File Size : 49,7 Mb
Release : 2012-02-17
Category : Technology & Engineering
ISBN : 9781119966869

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Advanced Interconnects for ULSI Technology by Mikhail Baklanov,Paul S. Ho,Ehrenfried Zschech Pdf

Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.

NISTIR.

Author : Anonim
Publisher : Unknown
Page : 62 pages
File Size : 44,7 Mb
Release : 2001
Category : Electronic
ISBN : UOM:39015047798346

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NISTIR. by Anonim Pdf

Microscopy of Semiconducting Materials 2003

Author : Cullis
Publisher : CRC Press
Page : 704 pages
File Size : 43,7 Mb
Release : 2018-01-10
Category : Technology & Engineering
ISBN : 9781351091534

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Microscopy of Semiconducting Materials 2003 by Cullis Pdf

Modern electronic devices rely on ever-greater miniaturization of components, and semiconductor processing is approaching the domain of nanotechnology. Studies of devices in this regime can only be carried out with the most advanced forms of microscopy. Accordingly, Microscopy of Semiconducting Materials focuses on international developments in semiconductor studies carried out by all forms of microscopy. It provides an overview of the latest instrumentation, analysis techniques, and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and material scientists.

Istfa 2003

Author : ASM International
Publisher : ASM International
Page : 534 pages
File Size : 53,5 Mb
Release : 2003-01-01
Category : Technology & Engineering
ISBN : 9781615030866

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Istfa 2003 by ASM International Pdf