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Author : K. L. Choy
Publisher : Unknown
Page : 126 pages
File Size : 47,6 Mb
Release : 2003
Category : Chemical vapor deposition
ISBN : UOM:39015056686093
Author : Jong-Hee Park,T. S. Sudarshan
Publisher : ASM International
Page : 477 pages
File Size : 49,6 Mb
Release : 2001
Category : Technology & Engineering
ISBN : 9781615032242
Author : Kwang-Leong Choy
Publisher : CRC Press
Page : 492 pages
File Size : 47,5 Mb
Release : 2019-06-07
Category : Science
ISBN : 9781000691078
This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films. Features Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges Covers thin and thick films and composites Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.
Author : Xiu-Tian Yan,Yongdong Xu
Publisher : Springer Science & Business Media
Page : 352 pages
File Size : 53,8 Mb
Release : 2010-03-23
Category : Technology & Engineering
ISBN : 9781848828940
"Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.
Author : S Neralla
Publisher : BoD – Books on Demand
Page : 292 pages
File Size : 54,6 Mb
Release : 2016-08-31
Category : Science
ISBN : 9789535125723
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Author : Kwang-Leong Choy
Publisher : CRC Press
Page : 417 pages
File Size : 46,8 Mb
Release : 2019-06-07
Category : Science
ISBN : 9781000690736
This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films. Features Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges Covers thin and thick films and composites Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.
Author : Dimitra Vernardou
Publisher : MDPI
Page : 94 pages
File Size : 44,6 Mb
Release : 2021-01-15
Category : Science
ISBN : 9783039439232
Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.
Author : Anthony C. Jones,Michael L. Hitchman
Publisher : Royal Society of Chemistry
Page : 600 pages
File Size : 41,7 Mb
Release : 2009
Category : Science
ISBN : 9780854044658
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Author : Karen K. Gleason
Publisher : John Wiley & Sons
Page : 488 pages
File Size : 49,8 Mb
Release : 2015-04-01
Category : Technology & Engineering
ISBN : 9783527690282
The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method of choice in many applications to process polymers as well. This highly scalable technique allows for synthesizing high-purity, defect-free films and for systematically tuning their chemical, mechanical and physical properties. In addition, vapor phase processing is critical for the deposition of insoluble materials including fluoropolymers, electrically conductive polymers, and highly crosslinked organic networks. Furthermore, CVD enables the coating of substrates which would otherwise dissolve or swell upon exposure to solvents. The scope of the book encompasses CVD polymerization processes which directly translate the chemical mechanisms of traditional polymer synthesis and organic synthesis in homogeneous liquids into heterogeneous processes for the modification of solid surfaces. The book is structured into four parts, complemented by an introductory overview of the diverse process strategies for CVD of polymeric materials. The first part on the fundamentals of CVD polymers is followed by a detailed coverage of the materials chemistry of CVD polymers, including the main synthesis mechanisms and the resultant classes of materials. The third part focuses on the applications of these materials such as membrane modification and device fabrication. The final part discusses the potential for scale-up and commercialization of CVD polymers.
Author : Daniel Dobkin,M.K. Zuraw
Publisher : Springer Science & Business Media
Page : 298 pages
File Size : 44,8 Mb
Release : 2003-04-30
Category : Technology & Engineering
ISBN : 1402012489
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author : Rointan Framroze Bunshah
Publisher : William Andrew
Page : 620 pages
File Size : 40,9 Mb
Release : 1982
Category : Technology & Engineering
ISBN : UOM:39015000997372
Author : Hugh O. Pierson
Publisher : William Andrew
Page : 458 pages
File Size : 41,6 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9781437744880
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Author : K. Holmberg,A. Matthews
Publisher : Elsevier
Page : 441 pages
File Size : 48,9 Mb
Release : 1994-07-15
Category : Science
ISBN : 0080875920
This book presents a general view on thin surface coatings used for tribological applications and it is based on the current state of understanding. The mechanisms of friction and wear in sliding and rolling contacts of coated surfaces are described. Basic information on coating techniques, tribology and surface mechanisms is given. Based on collected experimental works information is given on the properties of thin soft coatings, such as polymer, lamellar solid and soft metal coatings; thin hard coatings, such as nitride, carbide, oxide, boride and diamond and diamond-like coatings; and multi-component and multi-layer coatings. The influence of interface layers and lubricants is highlighted. The methods available for characterization of coated surfaces and for mechanical and chemical evaluation of their tribological properties are described. Tribological evaluation methods for accelerated and field testing and the need for standardization of quality assurance procedures are discussed. A methodology for the selection of thin coatings for tribological applications is presented and knowledge based expert system approaches for coating selection are reviewed. For different application examples, the basic tribological contact mechanisms are described and the possibilities for improving their tribological properties by using surface coatings are discussed. The application examples include sliding and rolling bearings, gears, tools for cutting and forming, erosion resistant applications, magnetic recording systems and bio-medical implants.
Author : M. L. Hitchman,K. F. Jensen
Publisher : Academic Press
Page : 692 pages
File Size : 47,5 Mb
Release : 1993-04-13
Category : Science
ISBN : UCAL:$B235277
This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Author : Srinivasan Sivaram
Publisher : Springer Science & Business Media
Page : 302 pages
File Size : 43,7 Mb
Release : 2013-11-11
Category : Technology & Engineering
ISBN : 9781475747515
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
