Fundamental Electron Interactions With Plasma Processing Gases

Author : Loucas G. Christophorou,James K. Olthoff
Publisher : Springer Science & Business Media
Page : 791 pages
File Size : 45,5 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781441989710

Get Book

Fundamental Electron Interactions with Plasma Processing Gases by Loucas G. Christophorou,James K. Olthoff Pdf

This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

Author : Gorur Govinda Raju
Publisher : CRC Press
Page : 826 pages
File Size : 52,8 Mb
Release : 2018-09-03
Category : Science
ISBN : 9781351833325

Get Book

Gaseous Electronics by Gorur Govinda Raju Pdf

With the constant emergence of new research and application possibilities, gaseous electronics is more important than ever in disciplines including engineering (electrical, power, mechanical, electronics, and environmental), physics, and electronics. The first resource of its kind, Gaseous Electronics: Tables, Atoms, and Molecules fulfills the author’s vision of a stand-alone reference to condense 100 years of research on electron-neutral collision data into one easily searchable volume. It presents most—if not all—of the properly classified experimental results that scientists, researchers, and students require for a theoretical and practical understanding of collision properties and their impact. An unprecedented collection and analysis of electron neutral collision properties This book follows a new user-friendly format that enables readers to easily retrieve, analyze, and apply specific atomic/molecular information as needed. In his previous work, Gaseous Electronics: Theory and Practice, the author first explored electron–neutron interactions. To clarify the complex fundamental processes involved, he cited as much experimental data on atoms and molecules as limited space would allow. Completing that task, this handy reference more fully compiles essential revised data on more than 420 atoms and molecules, arranging it into easily digestible chapters, sections, and appendices. Analysis parameters include total scattering, ionization, excitation, attachment cross sections, ionization and attachment coefficients, attachment rates, and ion drift velocity. Some recent research areas in gaseous electronics include: Environmentally efficient and protective lighting devices Plasma research for power generation and space applications Medical applications (some involving skin treatment and healing) Written entirely in SI units, the book includes hundreds of tables, figures, and specially drawn charts, with data expressed in both tabular and graphical form. Each chapter stands independently and contains references for further research.

Author : K. N. Joshipura,Nigel Mason
Publisher : Cambridge University Press
Page : 286 pages
File Size : 48,8 Mb
Release : 2019-01-24
Category : Science
ISBN : 9781108498906

Get Book

Atomic-Molecular Ionization by Electron Scattering by K. N. Joshipura,Nigel Mason Pdf

Covers quantum scattering theories, experimental and theoretical calculations and applications in a comprehensive manner.

Author : Jörg Florian Friedrich,Jürgen Meichsner
Publisher : John Wiley & Sons
Page : 805 pages
File Size : 52,9 Mb
Release : 2022-07-15
Category : Science
ISBN : 9781119364764

Get Book

Nonthermal Plasmas for Materials Processing by Jörg Florian Friedrich,Jürgen Meichsner Pdf

NONTHERMAL PLASMAS FOR MATERIALS PROCESSING This unique book covers the physical and chemical aspects of plasma chemistry with polymers and gives new insights into the interaction of physics and chemistry of nonthermal plasmas and their applications in materials science for physicists and chemists. The properties and characteristics of plasmas, elementary (collision) processes in the gas phase, plasma surface interactions, gas discharge plasmas and technical plasma sources, atmospheric plasmas, plasma diagnostics, polymers and plasmas, plasma polymerization, post-plasma processes, plasma, and wet-chemical processing, plasma-induced generation of functional groups, and the chemical reactions on these groups along with a few exemplary applications are discussed in this comprehensive but condensed state-of-the-art book on plasma chemistry and its dependence on plasma physics. While plasma physics, plasma chemistry, and polymer science are often handled separately, the aim of the authors is to harmoniously join the physics and chemistry of low-pressure and atmospheric-pressure plasmas with polymer surface chemistry and polymerization and to compare such chemistry with classic chemistry. Readers will find in these chapters Interaction of plasma physics and chemistry in plasmas and at the surface of polymers; Explanation and interpretation of physical and chemical mechanisms on plasma polymerization and polymer surface modification; Introduction of modern techniques in plasma diagnostics, surface analysis of solids, and special behavior of polymers on exposure to plasmas; Discussion of the conflict of energy-rich plasma species with permanent energy supply and the much lower binding energies in polymers and alternatives to avoid random polymer decomposition Technical applications such as adhesion, cleaning, wettability, textile modification, coatings, films, etc. New perspectives are explained about how to use selective and mild processes to allow post-plasma chemistry on non-degraded polymer surfaces. Audience Physicists, polymer chemists, materials scientists, industrial engineers in biomedicine, coatings, printing, etc.

Author : Anonim
Publisher : Elsevier
Page : 634 pages
File Size : 46,7 Mb
Release : 2016-11-08
Category : Technology & Engineering
ISBN : 9780081003589

Get Book

Materials and Processes for Next Generation Lithography by Anonim Pdf

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place

Author : Jurgen Meichsner,Martin Schmidt,Ralf Schneider,Hans-Erich Wagner
Publisher : CRC Press
Page : 566 pages
File Size : 50,7 Mb
Release : 2012-11-13
Category : Science
ISBN : 9781420059168

Get Book

Nonthermal Plasma Chemistry and Physics by Jurgen Meichsner,Martin Schmidt,Ralf Schneider,Hans-Erich Wagner Pdf

In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.

Author : Loucas C. Christophorou,James K. Olthoff,Panayota Vassiliou
Publisher : Springer Science & Business Media
Page : 507 pages
File Size : 48,5 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781441989796

Get Book

Gaseous Dielectrics X by Loucas C. Christophorou,James K. Olthoff,Panayota Vassiliou Pdf

The book contains a broad and in depth review by leading world experts of the progress and the problems of current interest in gaseous dielectrics and their use, especially as insulators in high-voltage equipment and substations. Recent advances in superconductivity for power transmission and in plasma technology are also included. The fundamental, applied and industrial research described in the book allows the electric power industry to transmit and distribute electrical energy in more efficient, safe and environmentally acceptable ways.

Author : R.J. Shul,S.J. Pearton
Publisher : Springer Science & Business Media
Page : 664 pages
File Size : 53,5 Mb
Release : 2011-06-28
Category : Technology & Engineering
ISBN : 9783642569890

Get Book

Handbook of Advanced Plasma Processing Techniques by R.J. Shul,S.J. Pearton Pdf

Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Author : Yukikazu Itikawa
Publisher : Springer Science & Business Media
Page : 194 pages
File Size : 41,5 Mb
Release : 2007-07-19
Category : Science
ISBN : 9783540725800

Get Book

Molecular Processes in Plasmas by Yukikazu Itikawa Pdf

A variety of plasmas include molecules rather than only ions or atoms. Examples are ionospheres of the Earth and other planets, stellar atmospheres, gaseous discharges for use in various devices and processes, and fusion plasmas in the edge region. This book describes the role of molecules in those plasmas by showing elementary collision processes involving those molecules.

Author : Anonim
Publisher : Academic Press
Page : 690 pages
File Size : 43,6 Mb
Release : 2017-06-07
Category : Science
ISBN : 9780128121849

Get Book

Advances in Atomic, Molecular, and Optical Physics by Anonim Pdf

Advances in Atomic, Molecular, and Optical Physics, Volume 66, provides a comprehensive compilation of recent developments in a field that is in a state of rapid growth as new experimental and theoretical techniques are used on many problems, both old and new. Topics covered include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics, with timely articles written by distinguished experts that contain relevant review materials and detailed descriptions of important developments in the field. Presents the work of international experts in the field Contains comprehensive articles that compile recent developments in a field that is experiencing rapid growth, with new experimental and theoretical techniques emerging Ideal for users interested in optics, excitons, plasmas, and thermodynamics Topics covered include atmospheric science, astrophysics, surface physics, and laser physics, amongst others

Author : J. Leon Shohet
Publisher : CRC Press
Page : 3082 pages
File Size : 45,9 Mb
Release : 2016-12-12
Category : Technology & Engineering
ISBN : 9781351204934

Get Book

Encyclopedia of Plasma Technology - Two Volume Set by J. Leon Shohet Pdf

Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]

Author : National Research Council,Division on Engineering and Physical Sciences,Commission on Physical Sciences, Mathematics, and Applications,Board on Physics and Astronomy,Plasma Science Committee,Panel on Plasma Processing of Materials
Publisher : National Academies Press
Page : 88 pages
File Size : 52,9 Mb
Release : 1991-02-01
Category : Technology & Engineering
ISBN : 9780309045971

Get Book

Plasma Processing of Materials by National Research Council,Division on Engineering and Physical Sciences,Commission on Physical Sciences, Mathematics, and Applications,Board on Physics and Astronomy,Plasma Science Committee,Panel on Plasma Processing of Materials Pdf

Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.

Author : Essam Nasser
Publisher : John Wiley & Sons
Page : 488 pages
File Size : 45,5 Mb
Release : 1971
Category : Ionization of gases
ISBN : UCAL:B4537544

Get Book

Fundamentals of Gaseous Ionization and Plasma Electronics by Essam Nasser Pdf

Author : Loucas G. Christophorou
Publisher : Springer
Page : 219 pages
File Size : 51,8 Mb
Release : 2018-06-08
Category : Science
ISBN : 9783319907130

Get Book

Emerging Dynamics: Science, Energy, Society and Values by Loucas G. Christophorou Pdf

Emerging Dynamics: Science, Energy, Society and Values focuses on the impact of science, science-based technology and scientific values on present-day humanity and its future. The book advocates for a science willing to accommodate both human values and scientific facts. The four main subjects focused on throughout the text are: The overwhelming impact of modern science and science-based technology on virtually every aspect of human life Human values and their significance for science and society The need for mutual accommodation between scientific values and the traditional values of society The fundamental role of energy for civilization and society. The book cuts across scientific disciplines and looks at modern civilization through the knowledge provided by the physical, chemical, biomedical and other branches of natural science. The book is unique in its holistic approach, combining knowledge acquired by deduction, reduction-induction, and experimental scientific methods with knowledge acquired through history, philosophy, the arts, faith and cultural traditions. Modern civilization’s most distinct characteristics are due to science, science-based technology and energy. The role of energy in the sustainability of civilization and the impact of biomedical science on man are especially emphasized throughout this timely book, making a case for a hopeful future based on both science and values. A science guided in its applications by human values and a value system cognizant of the facts of science and willing to accommodate them

Author : Tanmoy Chakraborty,Lalita Ledwani
Publisher : CRC Press
Page : 298 pages
File Size : 46,8 Mb
Release : 2017-03-03
Category : Science
ISBN : 9781315353227

Get Book

Research Methodology in Chemical Sciences by Tanmoy Chakraborty,Lalita Ledwani Pdf

Recent Methodology in Chemical Sciences provides an eclectic survey of contemporary problems in experimental, theoretical, and applied chemistry. This book covers recent trends in research with the different domain of the chemical sciences. The chapters, written by knowledgeable researchers, provide different insights to the modern-day research in the domain of spectroscopy, plasma modification, and theoretical and computational analysis of chemical problems. It covers descriptions of experimental techniques, discussions on theoretical modeling, and much more.