Materials And Processes For Next Generation Lithography

Author : Anonim
Publisher : Elsevier
Page : 634 pages
File Size : 41,5 Mb
Release : 2016-11-08
Category : Technology & Engineering
ISBN : 9780081003589

Get Book

Materials and Processes for Next Generation Lithography by Anonim Pdf

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place

Author : Kaushik Kumar,Divya Zindani,Nisha Kumari,J. Paulo Davim
Publisher : Springer
Page : 150 pages
File Size : 45,6 Mb
Release : 2018-09-26
Category : Technology & Engineering
ISBN : 9783319999005

Get Book

Micro and Nano Machining of Engineering Materials by Kaushik Kumar,Divya Zindani,Nisha Kumari,J. Paulo Davim Pdf

This book covers the recent developments in the production of micro and nano size products, which cater to the needs of the industry. The processes to produce the miniature sized products with unique characteristics are addressed. Moreover, their application in areas such as micro-engines, micro-heat exchangers, micro-pumps, micro-channels, printing heads and medical implants are also highlighted. The book presents such microsystem-based products as important contributors to a sustainable economy. The recent research in this book focuses on the development of new micro and nano manufacturing platforms while integrating the different technologies to manufacture the micro and nano components in a high throughput and cost effective manner. The chapters contain original theoretical and applied research in the areas of micro- and nano-manufacturing that are related to process innovation, accuracy, and precision, throughput enhancement, material utilization, compact equipment development, environmental and life-cycle analysis, and predictive modeling of manufacturing processes with feature sizes less than one hundred micrometers.

Author : Michael Olorunfunmi Kolawole
Publisher : CRC Press
Page : 440 pages
File Size : 47,7 Mb
Release : 2020-06-15
Category : Technology & Engineering
ISBN : 9781000089066

Get Book

Electronics by Michael Olorunfunmi Kolawole Pdf

This book gives clear explanations of the technical aspects of electronics engineering from basic classical device formulations to the use of nanotechnology to develop efficient quantum electronic systems. As well as being up to date, this book provides a broader range of topics than found in many other electronics books. This book is written in a clear, accessible style and covers topics in a comprehensive manner. This book’s approach is strongly application-based with key mathematical techniques introduced, helpful examples used to illustrate the design procedures, and case studies provided where appropriate. By including the fundamentals as well as more advanced techniques, the author has produced an up-to-date reference that meets the requirements of electronics and communications students and professional engineers. Features Discusses formulation and classification of integrated circuits Develops a hierarchical structure of functional logic blocks to build more complex digital logic circuits Outlines the structure of transistors (bipolar, JFET, MOSFET or MOS, CMOS), their processing techniques, their arrangement forming logic gates and digital circuits, optimal pass transistor stages of buffered chain, sources and types of noise, and performance of designed circuits under noisy conditions Explains data conversion processes, choice of the converter types, and inherent errors Describes electronic properties of nanomaterials, the crystallites’ size reduction effect, and the principles of nanoscale structure fabrication Outlines the principles of quantum electronics leading to the development of lasers, masers, reversible quantum gates, and circuits and applications of quantum cells and fabrication methods, including self-assembly (quantum-dot cellular automata) and tunneling (superconducting circuits), and describes quantum error-correction techniques Problems are provided at the end of each chapter to challenge the reader’s understanding

Author : Eric Chappel
Publisher : Academic Press
Page : 680 pages
File Size : 53,8 Mb
Release : 2020-11-07
Category : Medical
ISBN : 9780128198391

Get Book

Drug Delivery Devices and Therapeutic Systems by Eric Chappel Pdf

Drug Delivery Devices and Therapeutic Systems examines the current technology and innovations moving drug delivery systems (DDS) forward. The book provides an overview on the therapeutic use of drug delivery devices, including design, applications, and a description of the design of each device. While other books focus on the therapy, the primary emphasis in this book is on current technologies for DDS applications, including microfluidics, nanotechnology, biodegradable hydrogel and microneedles, with a special emphasis on wearable DDS. As part of the Developments in Biomedical Engineering and Bioelectronics series, this book is written by experts in the field and informed with information directly from manufacturers. Pharmaceutical scientists, medical researchers, biomedical engineers and clinical professionals will find this an essential reference. Provides essential information on the most recent drug delivery systems available Explains current technology and its applications to drug delivery Contains contributions from biomedical engineers, pharmaceutical scientists and manufacturers

Author : Bruce W. Smith,Kazuaki Suzuki
Publisher : CRC Press
Page : 770 pages
File Size : 49,8 Mb
Release : 2020-05-01
Category : Technology & Engineering
ISBN : 9781351643443

Get Book

Microlithography by Bruce W. Smith,Kazuaki Suzuki Pdf

The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.

Author : Dhiraj Sud,Anil Kumar Singla,Munish Kumar Gupta
Publisher : CRC Press
Page : 308 pages
File Size : 51,8 Mb
Release : 2022-08-02
Category : Technology & Engineering
ISBN : 9781000630091

Get Book

Nanomaterials in Manufacturing Processes by Dhiraj Sud,Anil Kumar Singla,Munish Kumar Gupta Pdf

In the manufacturing sector, nanomaterials offer promising outcomes for cost reduction in production, quality improvement, and minimization of environmental hazards. This book focuses on the application of nanomaterials across a wide range of manufacturing areas, including in paint and coatings, petroleum refining, textile and leather industries, electronics, energy storage devices, electrochemical sensors, as well as in industrial waste treatment. This book: Examines nanofluids and nanocoatings in manufacturing and their characterization. Discusses nanomaterial applications in fabricating lightweight structural components, oil refining, smart leather processing and textile industries, and the construction industry. Highlights the role of 3D printing in realizing the full potential of nanotechnology. Considers synthetic strategies with a focus on greener protocols for the fabrication of nanostructured materials with enhanced properties and better control, including these materials' characterization and significant properties for ensuring smart outputs. Offers a unique perspective on applications in industrial waste recycling and treatment, along with challenges in terms of safety, economics, and sustainability in industrial processes. This work is written for researchers and industry professionals across a variety of engineering disciplines, including materials, manufacturing, process, and industrial engineering.

Author : J. Greer,A. Korkin,J. Labanowski
Publisher : Elsevier
Page : 264 pages
File Size : 48,5 Mb
Release : 2003-10-24
Category : Technology & Engineering
ISBN : 9780080537214

Get Book

Nano and Giga Challenges in Microelectronics by J. Greer,A. Korkin,J. Labanowski Pdf

The book is designed as an introduction for engineers and researchers wishing to obtain a fundamental knowledge and a snapshot in time of the cutting edge in technology research. As a natural consequence, Nano and Giga Challenges is also an essential reference for the "gurus" wishing to keep abreast of the latest directions and challenges in microelectronic technology development and future trends. The combination of viewpoints presented within the book can help to foster further research and cross-disciplinary interaction needed to surmount the barriers facing future generations of technology design. Key Features: • Quickly becoming the hottest topic of the new millennium (2.4 billion dollars funding in US alone • Current status and future trends of micro and nanoelectronics research • Written by leading experts in the corresponding research areas • Excellent tutorial for graduate students and reference for "gurus"

Author : Yoshio Nishi,Robert Doering
Publisher : CRC Press
Page : 1720 pages
File Size : 54,9 Mb
Release : 2017-12-19
Category : Technology & Engineering
ISBN : 9781420017663

Get Book

Handbook of Semiconductor Manufacturing Technology by Yoshio Nishi,Robert Doering Pdf

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Author : Alberto Pique,Douglas B. Chrisey
Publisher : Academic Press
Page : 756 pages
File Size : 54,9 Mb
Release : 2002
Category : Computers
ISBN : 0121742318

Get Book

Direct-Write Technologies for Rapid Prototyping Applications by Alberto Pique,Douglas B. Chrisey Pdf

Direct-Write Technologies covers applications, materials, and the techniques in using direct-write technologies. This book provides an overview of the different direct write techniques currently available, as well as a comparison between the strengths and special attributes for each of the techniques. The techniques described open the door for building prototypes and testing materials. The book also provides an overview of the state-of-the-art technology involved in this field. Basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. Others in this or related fields will want the book to read the introductory material summarizing isuses common to all approaches, in order to compare and contrast different techniques. Everyday applications include electronic components and sensors, especially chemical and biosensors. There is a wide range of research and development problems requiring state-of-the-art direct write tools. This book will appeal to basic researchers and development engineers in university engineering departments and at industrial and national research laboratories. This text should appeal equally well in the United States, Asia, and Europe. Both basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. An overview of the different direct write techniques currently available A comparison between the strengths and special attributes for each of the techniques An overview of the state-of-the-art technology involved in this field

Author : Bruce W. Smith,Kazuaki Suzuki
Publisher : CRC Press
Page : 864 pages
File Size : 50,8 Mb
Release : 2018-10-03
Category : Technology & Engineering
ISBN : 9781420051537

Get Book

Microlithography by Bruce W. Smith,Kazuaki Suzuki Pdf

This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Author : Wayne M. Moreau
Publisher : Springer Science & Business Media
Page : 937 pages
File Size : 43,5 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781461308850

Get Book

Semiconductor Lithography by Wayne M. Moreau Pdf

Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.

Author : Anonim
Publisher : The Electrochemical Society
Page : 636 pages
File Size : 45,7 Mb
Release : 2001
Category : Magnetic disks
ISBN : 1566772966

Get Book

Magnetic Materials, Processes, and Devices VI by Anonim Pdf

Author : Fred Roozeboom,Paul Timans,Evgeni Gusev,Vijay Narayanan,Kuniyuki Kakushima,Zia Karim,Stefan De Gendt
Publisher : The Electrochemical Society
Page : 356 pages
File Size : 48,6 Mb
Release : 2024-06-05
Category : Electronic
ISBN : 9781607687146

Get Book

Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6 by Fred Roozeboom,Paul Timans,Evgeni Gusev,Vijay Narayanan,Kuniyuki Kakushima,Zia Karim,Stefan De Gendt Pdf

Author : Nan Yao,Zhong Lin Wang
Publisher : Springer Science & Business Media
Page : 745 pages
File Size : 53,5 Mb
Release : 2006-07-12
Category : Technology & Engineering
ISBN : 9781402080067

Get Book

Handbook of Microscopy for Nanotechnology by Nan Yao,Zhong Lin Wang Pdf

Nanostructured materials take on an enormously rich variety of properties and promise exciting new advances in micromechanical, electronic, and magnetic devices as well as in molecular fabrications. The structure-composition-processing-property relationships for these sub 100 nm-sized materials can only be understood by employing an array of modern microscopy and microanalysis tools. Handbook of Microscopy for Nanotechnology aims to provide an overview of the basics and applications of various microscopy techniques for nanotechnology. This handbook highlights various key microcopic techniques and their applications in this fast-growing field. Topics to be covered include the following: scanning near field optical microscopy, confocal optical microscopy, atomic force microscopy, magnetic force microscopy, scanning turning microscopy, high-resolution scanning electron microscopy, orientational imaging microscopy, high-resolution transmission electron microscopy, scanning transmission electron microscopy, environmental transmission electron microscopy, quantitative electron diffraction, Lorentz microscopy, electron holography, 3-D transmission electron microscopy, high-spatial resolution quantitative microanalysis, electron-energy-loss spectroscopy and spectral imaging, focused ion beam, secondary ion microscopy, and field ion microscopy.

Author : Jagannathan Thirumalai
Publisher : BoD – Books on Demand
Page : 136 pages
File Size : 41,8 Mb
Release : 2018-05-02
Category : Technology & Engineering
ISBN : 9781789230307

Get Book

Micro/Nanolithography by Jagannathan Thirumalai Pdf

The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.