Industrial Ion Sources

Author : Viacheslav V. Zhurin
Publisher : John Wiley & Sons
Page : 458 pages
File Size : 50,5 Mb
Release : 2012-09-19
Category : Science
ISBN : 9783527635733

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Industrial Ion Sources by Viacheslav V. Zhurin Pdf

Due to the large number of uses of ion sources in academia and industry, those who utilize these sources need up to date and coherent information to keep themselves abreast of developments and options, and to chose ideal solutions for quality and cost-effectiveness. This book, written by an author with a strong industrial background and excellent standing, is the comprehensive guide users and developers of ion sources have been waiting for. Providing a thorough refresher on the physics involved, this resource systematically covers the source types, components, and the operational parameters.

Author : Viacheslav V. Zhurin
Publisher : John Wiley & Sons
Page : 326 pages
File Size : 49,8 Mb
Release : 2012-09-19
Category : Science
ISBN : 9783527635740

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Industrial Ion Sources by Viacheslav V. Zhurin Pdf

Due to the large number of uses of ion sources in academia and industry, those who utilize these sources need up to date and coherent information to keep themselves abreast of developments and options, and to chose ideal solutions for quality and cost-effectiveness. This book, written by an author with a strong industrial background and excellent standing, is the comprehensive guide users and developers of ion sources have been waiting for. Providing a thorough refresher on the physics involved, this resource systematically covers the source types, components, and the operational parameters.

Author : Ian G. Brown
Publisher : John Wiley & Sons
Page : 396 pages
File Size : 46,9 Mb
Release : 2006-03-06
Category : Science
ISBN : 9783527604548

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The Physics and Technology of Ion Sources by Ian G. Brown Pdf

The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.

Author : Bernhard Wolf
Publisher : CRC Press
Page : 725 pages
File Size : 53,8 Mb
Release : 2017-07-12
Category : Technology & Engineering
ISBN : 9781351829946

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Handbook of Ion Sources by Bernhard Wolf Pdf

The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.

Author : Harold R. Kaufman,Kaufman & Robinson
Publisher : Unknown
Page : 27 pages
File Size : 55,8 Mb
Release : 2011
Category : Ion bombardment
ISBN : OCLC:873816724

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Applications of Broad-Beam Ion Sources by Harold R. Kaufman,Kaufman & Robinson Pdf

Author : Huashun Zhang
Publisher : Springer
Page : 0 pages
File Size : 41,8 Mb
Release : 1999-11-08
Category : Science
ISBN : 3540657479

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Ion Sources by Huashun Zhang Pdf

While dealing with the design and operation of ion sources, this book additionally discusses the physics of ion formation of the various elements with different charge states and charge neutralization. Ion selection and beam diagnostics are equally included, and the presentation of the necessary equations and diagrams for the various parameters makes this a useful handbook for ion sources.

Author : R Geller
Publisher : Routledge
Page : 449 pages
File Size : 55,8 Mb
Release : 2018-12-13
Category : Science
ISBN : 9781351453233

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Electron Cyclotron Resonance Ion Sources and ECR Plasmas by R Geller Pdf

Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sour

Author : M.D. Gabovich,N.V. Pleshivtsev,N.N. Semashko
Publisher : Springer
Page : 0 pages
File Size : 43,5 Mb
Release : 2014-05-14
Category : Science
ISBN : 1468484079

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Ion and Atomic Beams for Controlled Fusion and Technology by M.D. Gabovich,N.V. Pleshivtsev,N.N. Semashko Pdf

A beam of ions in the fonn of "canal rays" was first observed in 1886 by E. Goldstein. The first ion source was invented by J. J. Thomson in 1910. This ion source became the basis for the first widespread application of ion sources in mass spectrographs and mass spectrometers. The second important application of ion sources is ion accelerators, which since the beginning of the 1930s have been employed in research on nuclear reactions and are now used in industry and medicine. A third application of ion sources is in systems for isotope separation and re search on the interaction of atomic particles with solids (1940s). The result of this research and development is the use of ion sources in semiconductor doping, decontamination of surfaces, and micromachining of surfaces (1960s and' 1970s), which is a fourth area of applications for ion sources. The heating of plasmas in magnetic confinement devices to thennonuclear temperatures (100-1000 MK) with the aid of megawatt beams of hydrogen and deuterium ions and atoms has become a fifth promising area of application for ion sources which can produce ion beams with steady-state currents of up to 100 A. Finally, experimental and industrial research are under way on the alloying of metals and the fabrication of coatings which greatly improve the physical and chemical properties of metals. These coatings can increase the hardness, high temperature corrosion resistance, and wear resistance of metals, and can enhance or reduce friction, etc.

Author : M.D. Gabovich,N.V. Pleshivtsev,N.N. Semashko
Publisher : Springer
Page : 242 pages
File Size : 40,6 Mb
Release : 2012-04-30
Category : Science
ISBN : 1468484095

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Ion and Atomic Beams for Controlled Fusion and Technology by M.D. Gabovich,N.V. Pleshivtsev,N.N. Semashko Pdf

A beam of ions in the fonn of "canal rays" was first observed in 1886 by E. Goldstein. The first ion source was invented by J. J. Thomson in 1910. This ion source became the basis for the first widespread application of ion sources in mass spectrographs and mass spectrometers. The second important application of ion sources is ion accelerators, which since the beginning of the 1930s have been employed in research on nuclear reactions and are now used in industry and medicine. A third application of ion sources is in systems for isotope separation and re search on the interaction of atomic particles with solids (1940s). The result of this research and development is the use of ion sources in semiconductor doping, decontamination of surfaces, and micromachining of surfaces (1960s and' 1970s), which is a fourth area of applications for ion sources. The heating of plasmas in magnetic confinement devices to thennonuclear temperatures (100-1000 MK) with the aid of megawatt beams of hydrogen and deuterium ions and atoms has become a fifth promising area of application for ion sources which can produce ion beams with steady-state currents of up to 100 A. Finally, experimental and industrial research are under way on the alloying of metals and the fabrication of coatings which greatly improve the physical and chemical properties of metals. These coatings can increase the hardness, high temperature corrosion resistance, and wear resistance of metals, and can enhance or reduce friction, etc.

Author : Huashun Zhang
Publisher : Science Press (NY)
Page : 476 pages
File Size : 52,9 Mb
Release : 1999-01-01
Category : Science
ISBN : 7030073517

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Ion Sources by Huashun Zhang Pdf

Ion implantation has become a basic technology in device manufacturing. For efficient use of this accelerator-based technique the choice of appropriate ion sources is important. This book deals with the design and operation of ion sources. Additionally the physics of ion formation of the various elements with different charge states and charge neutralization are discussed. Ion selection and beam diagnostics are part of the book too. The presentation of the necessary equations and diagrams for the various parameters makes this book useful as a handbook for ion sources.

Author : Vadim Dudnikov
Publisher : Springer Nature
Page : 346 pages
File Size : 46,7 Mb
Release : 2019-10-18
Category : Science
ISBN : 9783030284374

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Development and Applications of Negative Ion Sources by Vadim Dudnikov Pdf

This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.

Author : Jon Orloff,Lynwood Swanson,Mark Utlaut
Publisher : Springer Science & Business Media
Page : 304 pages
File Size : 42,9 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781461507659

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High Resolution Focused Ion Beams: FIB and its Applications by Jon Orloff,Lynwood Swanson,Mark Utlaut Pdf

In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.

Author : Vadim Dudnikov
Publisher : Unknown
Page : 0 pages
File Size : 49,5 Mb
Release : 2023
Category : Electronic
ISBN : 3031284100

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Development and Applications of Negative Ion Sources by Vadim Dudnikov Pdf

This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, plasma volume, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. Now in its second edition, the book has been substantially expanded and updated to address the many developments since it was first published, most importantly the development and investigation of cesiated surfaces with work function ~1.2-1.3 eV in conditions close to discharges in surface plasma sources. The book also includes a new chapter on development of conversion targets for high-energy neutral beam injectors, covering gas targets, plasma targets and photon targets for efficient conversion of high energy negative ion beams to neutral beams. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.

Author : H. Pulker,H. Schmidt,M.A. Aegerter
Publisher : Elsevier
Page : 483 pages
File Size : 49,7 Mb
Release : 1999-11-26
Category : Science
ISBN : 9780444502476

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Coatings on Glass 1998 by H. Pulker,H. Schmidt,M.A. Aegerter Pdf

This conference provided a forum where researchers and industrialists working with glass and thin films, could meet and discuss common, complex problems. Many apparently old fundamental procedures and processes are still under investigation, due to their complexity. In particular it is often so that experience dictates the operating conditions, e.g. a special glass treatment or a special coating process rather than the understanding of the treatment or the process itself. It was therefore the aim of this conference to discuss the various problems and to deepen the knowledge that is useful for industrial situations. Based on the fundamental steps of glass fabrication, modification and film deposition, and property studies and the search for possible applications, a wide range of glass and plastic treatments have been carefully considered in this book by experts working in the field.

Author : Carl E. Anderson
Publisher : Unknown
Page : 38 pages
File Size : 47,7 Mb
Release : 1955
Category : Ion sources
ISBN : UOM:39015086417154

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Ion Source for the Production of Multiply Charged Heavy Ions by Carl E. Anderson Pdf