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Author : United States. Bureau of Naval Personnel
Publisher : Unknown
Page : 516 pages
File Size : 53,7 Mb
Release : 1963
Category : Lithography
ISBN : OSU:32435030286041
Author : United States. Naval Education and Training Command
Publisher : Unknown
Page : 668 pages
File Size : 40,9 Mb
Release : 1975
Category : Lithography
ISBN : UIUC:30112105163841
Author : United States. Bureau of Naval Personnel
Publisher : Unknown
Page : 520 pages
File Size : 54,6 Mb
Release : 1963
Category : Lithography
ISBN : UIUC:30112066323608
Author : Anonim
Publisher : Unknown
Page : 557 pages
File Size : 47,7 Mb
Release : 1975
Category : Lithography
ISBN : OCLC:8909564
Author : David A. Murray
Publisher : Unknown
Page : 420 pages
File Size : 45,6 Mb
Release : 1981
Category : Lithography
ISBN : MINN:20000003817794
Author : United States
Publisher : Unknown
Page : 1050 pages
File Size : 45,7 Mb
Release : 1938
Category : Budget
ISBN : UIUC:30112061419609
Author : Wayne M. Moreau
Publisher : Springer Science & Business Media
Page : 937 pages
File Size : 45,5 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781461308850
Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.
Author : United States. Naval Education and Training Command
Publisher : Unknown
Page : 659 pages
File Size : 53,6 Mb
Release : 1980
Category : Lithography
ISBN : OCLC:79951419
Author : Vivek Bakshi
Publisher : SPIE Press
Page : 1104 pages
File Size : 47,5 Mb
Release : 2006
Category : Art
ISBN : 0819458457
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author : Kamil A. Valiev
Publisher : Springer Science & Business Media
Page : 502 pages
File Size : 49,7 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781461533184
This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.
Author : Martin Maldovan,Edwin L. Thomas
Publisher : John Wiley & Sons
Page : 331 pages
File Size : 54,7 Mb
Release : 2009-08-04
Category : Technology & Engineering
ISBN : 9783527625406
Written by the department head of materials science and engineering at MIT, this concise and stringent introduction takes readers from the fundamental theory to in-depth knowledge. It sets out with a theoretical scheme for the design of desirable periodic structures, then presents the experimental techniques that allow for fabrication of the periodic structure and exemplary experimental data. Subsequently, theory and numerical data are used to demonstrate how these periodic structures control the photonic, acoustic, and mechanical properties of materials, concluding with examples from these three important fields of applications. The result is must-have knowledge for both beginners and veterans in the field.
Author : Jürgen Stampfl,Robert Liska,Aleksandr Ovsianikov
Publisher : John Wiley & Sons
Page : 408 pages
File Size : 44,7 Mb
Release : 2016-09-12
Category : Technology & Engineering
ISBN : 9783527682683
This first book on this fascinating, interdisciplinary topic meets the much-felt need for an up-to-date overview of the field. Written with both beginners and professionals in mind, this ready reference begins with an introductory section explaining the basics of the various multi-photon and photochemical processes together with a description of the equipment needed. A team of leading international experts provides the latest research results on such materials as new photoinitiators, hybrid photopolymers, and metallic carbon nanotube composites. They also cover promising applications and prospective trends, including photonic crystals, microfluidic devices, biological scaffolds, metamaterials, waveguides, and functionalized hydrogels. By bringing together the essentials for both industrial and academic researchers, this is an invaluable companion for materials scientists, polymer chemists, surface chemists, surface physicists, biophysicists, and medical scientists working with 3D micro- and nanostructures.
Author : Anonim
Publisher : Unknown
Page : 382 pages
File Size : 50,5 Mb
Release : 1953
Category : Naval education
ISBN : IND:30000098307345
Author : Bei Yu,David Z. Pan
Publisher : Springer
Page : 164 pages
File Size : 40,6 Mb
Release : 2015-10-28
Category : Technology & Engineering
ISBN : 9783319203850
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Author : Anonim
Publisher : Unknown
Page : 490 pages
File Size : 54,8 Mb
Release : 1952
Category : Electronic
ISBN : UCAL:C2582617