Particles On Surfaces Detection Adhesion And Removal
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This work comprises the proceedings of the Fourth Symposium on Particles on Surfaces. Papers cover: adhesion-induced deformations of particles on surfaces; the use of atomic force microscopy in probing particle-particle adhesion; particle contamination in microelectronics, on spacecraft, and on optical surfaces; the role of air ionization in reducing surface contamination by particles in the cleanroom; abrasive blasting media for contamination-free deburring processes; and more.;The book is intended for physical, chemical, surface and colloid chemists, materials scientists; polymers, plastics, electrical and electronics, computer, chemical and mechanical engineers; and upper-level undergraduate and graduate students in these disciplines.
This volume chronicles the proceedings of the Symposium on Particles on Surfaces: Detection, Adhesion and Removal held under the auspices of the Fine Particle Society in San Francisco, July 28-August 2, 1986. The study of particles on surfaces is extremely important in many areas of human endeavor (ranging from microelectronics to optics to biomedical). A complete catalog of modern precision and sophisticated technologies where particles on surfaces are of cardinal importance will be prohibitively long, but the following eclectic examples should underscore the concern about particles on a variety of surfaces. In the semiconductor world of shrinking dimensions, particles which, a few years ago, were cosmetically undesirable but functionally innocuous can potentially be killer defects now. As the device sizes get smaller, there will be more and more concern about smaller and smaller particles. In the information storage technology, the gap between the head and the disk is very narrow, and if a particle is trapped in the gap that can have very grave consequences. The implications of particulate contamination on sensitive optical surfaces is all too manifest. So the particulate contamination on surfaces is undesirable from functional, yield and reliability points of view. This symposium was organized with the following objectives in mind: to bring together active practitioners in this field; to provide a forum for discussion of the latest research and development activities in this area; to provide opportunity for cross-pollination of ideas; and to highlight topics which needed intensified effort.
Particles on Surfaces: Detection, Adhesion and Removal, Volume 7 by Kash L. Mittal Pdf
This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Newark, NJ, June 19-21, 2000. The study of particles on surfaces is extremely important in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. This volume contains a total of 28 papers, which were all properly peer reviewed, revised and edited before inclusion. Therefore, this book is not merely a collection of unreviewed manuscripts, but rather represents information which has passed peer scrutiny. Furthermore, the authors were asked to update their manuscripts, so the information contained in this book should be current and fresh. This volume is divided into two parts: 1) Particle Analysis and General Cleaning-Related Topics; and 2) Particle Adhesion and Removal. The topics covered include: surface analysis techniques for particle identification; cleaning, rinsing and drying issues in post-CMP cleaning; fundamental forces involved in particle adhesion; factors affecting adhesion of small (nanosize) particles; factors important in particle detachment; particle adhesion measurement by AFM; various (wet and dry) techniques for particle removal, e.g., laser, ultrasonic, megasonic, use of surfactants; toner particles and pharmaceutical particles. This volume offers a wealth of information on the tremendously technologically important field of particles on surfaces and should provide a consolidated source of current R&D activity in this arena. Therefore, it will be of value and use to anyone interested in the topic of particles on surfaces.
Particles on Surfaces: Detection, Adhesion and Removal by Kash L. Mittal Pdf
This volume documents the proceedings of the 8th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Providence, Rhode Island, June 24a26, 2002. The study of particles on surfaces is extremely crucial in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. In a world o
Particles on Surfaces: Detection, Adhesion and Removal by Kash L. Mittal Pdf
This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004. The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space. This volume contains a total of 21 papers covering many ramifications of particles on surfaces, ranging from detection to removal. All manuscripts were rigorously peer-reviewed and revised, and properly edited before inclusion in this book. The topics covered include: imaging and analysis of macro and nanosize particles and surface features; determination of particles on surfaces; laser inactivation on surfaces; laser-assisted nanofabrication on surfaces; post-CMP cleaning process; pre-gate cleaning; solar panel obscuration in the Martian atmosphere; adhesion and friction of microsized particles; microroughness of textile fibers and capture of particles; factors affecting particle adhesion and removal; various techniques for cleaning or removal of particles from different substrates including laser, combination of laser-induced shockwave and explosive vaporization of liquid, attenuated total internal reflection of laser light, CO2 snow, use of dense phase fluids, use of surfactants and impinging air jet; and removal of sub-100-nm particles.
This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.
This volume chronicles the proceedings of the Third Symposium on Particles on Surfaces : Detection, Adhesion and Removal held as a part of the 21st Annual Meeting of the Fine Particle Society in San Diego , California, August 21 - 25 , 1990 . The first two symposia i n t h i s series were held in 1986 and 1988 , respectively, and have been properly l documented ,2. Li ke its antecedent s the Third symposium was very well received, and the continuing success of these symposia reinforced our earlier belief that regular symposia on the topic of particles on surfaces were very much needed. Concomitantly, the fourth symposium in this series is planned in Las Vegas , July 13-17 , 199 2 . l As pointed out in the Preface to the earlier two volumes ,2, the topic of particles on surfaces is of tremendous interest and concern in a wide spectrum of technological areas . The objectives of the Third symposium were es s ent i a l ly the same as those of the earlier two and our intent her e was to provide an update on the research and development activities in the world of particles on surfaces . Apropos , there has been a deliberate attempt every time to s eek out new people to present their research results and we have been very succes s f ul in this mission.
Particles on Surfaces Five and Six by Kashmiri Lal Mittal Pdf
This volume documents the Proceedings of the 5th and 6th Symposia on Particles on Surfaces: Detection, Adhesion and Removal, held under the aegis of the Fine Particle Society in Chicago (May 6--9, 1996) and Dallas (April 1--3, 1998), respectively. The technical programs clearly reflected an interest and need to ameliorate the existing methods and to devise new and more efficient ways to detect, analyze and characterize particles on surfaces. The removal of particles from a host of surfaces was especially highlighted; the need to remove smaller and smaller particles was particularly underscored. All manuscripts included in this volume were properly peer reviewed and all were revised before inclusion in this volume. Thus, this book is not a mere collection of unreviewed papers, but represents information that has passed peer scrutiny. Furthermore, the authors of the 5th Symposium were asked to update the information. So, the information presented in this book should be as fresh and up-to-date as possible. This volume is divided into two parts: Part 1. General Papers and Part 2. Particle Adhesion and Removal. The topics covered include: high-sensitivity rapid detection of particles; detection of particles using evanescent wave scattering; particles on the backside of wafers; particle shedding from fluid-handling components; dynamics of particle adhesion; particle dispersion/aggregation; precision cleaning; and particle removal by surfactants, supercritical fluids, hydrodynamic forces, high-speed droplet impinging, megasonic, CO2 blasting, CO2 snow, argon aerosol, lasers, microcluster beams, brush and chemical-mechanical methods. This volume offers bountiful information and represent a current commentary on the R&D activity taking place in the area of particles on surfaces, particularly particle removal from a variety of surfaces.
Particles on Surfaces: Detection, Adhesion and Removal, Volume 7 by Anonim Pdf
This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Newark, NJ, June 19-21, 2000. The study of particles on surfaces is extremely important in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. This volume contains a total of 28 papers, which were all properly peer reviewed, revised and edited before inclusion. Therefore, this book is not merely a collection of unreviewed manuscripts, but rather represents information which has passed peer scrutiny. Furthermore, the authors were asked to update their manuscripts, so the information contained in this book should be current and fresh. This volume is divided into two parts: 1) Particle Analysis and General Cleaning-Related Topics; and 2) Particle Adhesion and Removal. The topics covered include: surface analysis techniques for particle identification; cleaning, rinsing and drying issues in post-CMP cleaning; fundamental forces involved in particle adhesion; factors affecting adhesion of small (nanosize) particles; factors important in particle detachment; particle adhesion measurement by AFM; various (wet and dry) techniques for particle removal, e.g., laser, ultrasonic, megasonic, use of surfactants; toner particles and pharmaceutical particles. This volume offers a wealth of information on the tremendously technologically important field of particles on surfaces and should provide a consolidated source of current R&D activity in this arena. Therefore, it will be of value and use to anyone interested in the topic of particles on surfaces.
This volume chronicles the proceedings of the Symposium on Particles on Surfaces: Detection, Adhesion and Removal held under the auspices of the Fine Particle Society in San Francisco, July 28-August 2, 1986. The study of particles on surfaces is extremely important in many areas of human endeavor (ranging from microelectronics to optics to biomedical). A complete catalog of modern precision and sophisticated technologies where particles on surfaces are of cardinal importance will be prohibitively long, but the following eclectic examples should underscore the concern about particles on a variety of surfaces. In the semiconductor world of shrinking dimensions, particles which, a few years ago, were cosmetically undesirable but functionally innocuous can potentially be killer defects now. As the device sizes get smaller, there will be more and more concern about smaller and smaller particles. In the information storage technology, the gap between the head and the disk is very narrow, and if a particle is trapped in the gap that can have very grave consequences. The implications of particulate contamination on sensitive optical surfaces is all too manifest. So the particulate contamination on surfaces is undesirable from functional, yield and reliability points of view. This symposium was organized with the following objectives in mind: to bring together active practitioners in this field; to provide a forum for discussion of the latest research and development activities in this area; to provide opportunity for cross-pollination of ideas; and to highlight topics which needed intensified effort.
Particles on Surfaces: Detection, Adhesion and Removal by Kash L. Mittal Pdf
This volume chronicles the proceedings of the 9th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Philadelphia, PA, June 2004. The study of particles on surfaces is crucially important in a legion of diverse technological areas, ranging from microelectronics to biomedical to space. This volume contains a total of 21 papers covering many ramifications of particles on surfaces, ranging from detection to removal. All manuscripts were rigorously peer-reviewed and revised, and properly edited before inclusion in this book. The topics covered include: imaging and analysis of macro and nanosize particles and surface features; determination of particles on surfaces; laser inactivation on surfaces; laser-assisted nanofabrication on surfaces; post-CMP cleaning process; pre-gate cleaning; solar panel obscuration in the Martian atmosphere; adhesion and friction of microsized particles; microroughness of textile fibers and capture of particles; factors affecting particle adhesion and removal; various techniques for cleaning or removal of particles from different substrates including laser, combination of laser-induced shockwave and explosive vaporization of liquid, attenuated total internal reflection of laser light, CO2 snow, use of dense phase fluids, use of surfactants and impinging air jet; and removal of sub-100-nm particles.
Particle Adhesion and Removal by K. L. Mittal,Ravi Jaiswal Pdf
The book provides a comprehensive and easily accessiblereference source covering all important aspects of particleadhesion and removal. The core objective is to cover bothfundamental and applied aspects of particle adhesion and removalwith emphasis on recent developments. Among the topics to be covered include: 1. Fundamentals of surface forces in particle adhesion andremoval. 2. Mechanisms of particle adhesion and removal. 3. Experimental methods (e.g. AFM, SFA,SFM,IFM, etc.) tounderstand particle-particle and particle-substrateinteractions. 4. Mechanics of adhesion of micro- and nanoscaleparticles. 5. Various factors affecting particle adhesion to a variety ofsubstrates. 6. Surface modification techniques to modulate particleadhesion. 7. Various cleaning methods (both wet & dry) for particleremoval. 8. Relevance of particle adhesion in a host of technologies rangingfrom simple to ultra-sophisticated.
Developments in Surface Contamination and Cleaning, Vol. 1 by Rajiv Kohli,Kashmiri L. Mittal Pdf
Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field
Developments in Surface Contamination and Cleaning - Fundamentals and Applied Aspects by Rajiv Kohli,Kashmiri L. Mittal Pdf
Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ôkiller defectsö today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated. • Excellent reference for a host of technologies and industries ranging from microelectronics to optics to automotive to biomedical. • A single source document addressing everything from the sources of contamination to their removal and prevention. • Amply referenced and profusely illustrated.
Developments in Surface Contamination and Cleaning - Vol 6 by Rajiv Kohli,Kashmiri L. Mittal Pdf
In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Comprehensive coverage of innovations in surface contamination and cleaning Written by established experts in the contamination and cleaning field Each chapter is a comprehensive review of the state of the art Case studies included
