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Author : Richard H. Huddlestone,Stanley L. Leonard
Publisher : Unknown
Page : 650 pages
File Size : 46,5 Mb
Release : 1965
Category : Science
ISBN : UOM:39015004467992
Author : Kenneth J. H. Phillips,Uri Feldman,Enrico Landi
Publisher : Cambridge University Press
Page : 0 pages
File Size : 52,7 Mb
Release : 2008-06-26
Category : Science
ISBN : 9780521841603
This book explores features of the Sun's atmosphere, for graduate students/researchers in astrophysics and solar physics.
Author : I. H. Hutchinson
Publisher : Cambridge University Press
Page : 460 pages
File Size : 53,5 Mb
Release : 2005-07-14
Category : Science
ISBN : 052167574X
This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.
Author : Orlando Auciello,Daniel L. Flamm
Publisher : Academic Press
Page : 470 pages
File Size : 48,6 Mb
Release : 2013-10-22
Category : Science
ISBN : 9781483216249
Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well as Langmuir probes. The text also describes the mass spectroscopy of plasmas, microwave diagnostics, paramagnetic resonance diagnostics, and diagnostics in thermal plasma processing. Electrical engineers, nuclear engineers, microwave engineers, chemists, and technical personnel in universities, industry, and national laboratories will find the book invaluable.
Author : Vivek Bakshi
Publisher : SPIE Press
Page : 1104 pages
File Size : 51,5 Mb
Release : 2006
Category : Art
ISBN : 0819458457
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author : Hans-Jürgen Hartfuß,Thomas Geist
Publisher : John Wiley & Sons
Page : 429 pages
File Size : 52,5 Mb
Release : 2013-08-22
Category : Science
ISBN : 9783527676248
Filling a gap in the literature, this introduction to the topic covers the physics of the standard microwave diagnostics established on modern fusion experiments, and the necessary technological background from the field of microwave engineering. Written by well-known mm-wave diagnosticians in the field of fusion physics, the textbook includes such major diagnostic techniques as electron cyclotron emission, interferometry, reflectometry, polarimetry, and scattering.
Author : Evgeny V. Shun'ko
Publisher : Universal-Publishers
Page : 251 pages
File Size : 53,7 Mb
Release : 2009
Category : Science
ISBN : 9781599429359
From flat-panel televisions to thermonuclear fusion for energy production, plasmas currently have numerous and wide applications in sciences and industry. A diversity of plasma diagnostics is available to physicists and engineers to measure and control plasma parameters. Among them, the Langmuir probe is the most inexpensive and most popular instrument and method. The Langmuir probe is a small electrode which is submerged in plasma in order to measure the probe current-voltage characteristic. The same characteristic is processed further to derive the electron and ion concentration, the electron distribution function, and the plasma potential at the probe location. Langmuir probe diagnostics afford rapid measurements of the electron distribution function and plasma potential at a good time resolution, 10-8 seconds in a wide range of plasma densities 10+3 - 10+14 cm-3, and the electron energy from the room temperature to hundreds of electron-volts - qualities which are essential for researchers. In view of these facts, Langmuir probe diagnostics are applied very frequently to measuring plasma parameters. This book will be useful in teaching plasma diagnostics to undergraduate and graduate students in plasma physics courses. And it will also serve as a practical reference manual for physicists and engineers working in the growing area of plasma physics. The reader of this book will learn what kind of plasma parameters the Langmuir probe can measure, how to develop the probe diagnostics for specific cases, and how the probe data obtained should be processed to deduce reliable plasma parameters. In this book, the reader can find not only the basic physics information important to understanding the principles of probe operation, but also how the "real" probe disturbs plasma, and how it is possible to reconstruct undisturbed plasma parameters with available probe data.
Author : NN Misra,Oliver Schlüter,PJ Cullen
Publisher : Academic Press
Page : 380 pages
File Size : 44,7 Mb
Release : 2016-07-15
Category : Technology & Engineering
ISBN : 9780128014899
Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications. Food scientists and food engineers interested in understanding the theory and application of nonthermal plasma for food will find this book valuable because it provides a roadmap for future developments in this emerging field. This reference is also useful for biologists, chemists, and physicists who wish to understand the fundamentals of plasma physics, chemistry, and technology and their biological interactions through applying novel plasma sources to food and other sensitive biomaterials. Examines the topic of cold plasma technology for food applications Demonstrates state-of-the-art developments in plasma technology and potential solutions to improve food safety and quality Presents a solid introduction for readers on the topics of plasma physics and chemistry that are required to understand biological applications for foods Serves as a roadmap for future developments for food scientists, food engineers, and biologists, chemists, and physicists working in this emerging field
Author : I. Podgornyi
Publisher : Springer Science & Business Media
Page : 225 pages
File Size : 40,5 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781468407242
The present volume is essentially a qualitative survey of modern trends in the diagnostics of high-temperature plasmas, with particular orientation toward laboratory plasmas of interest in connection with research in controlled thermonuclear fusion. Among the broad topics considered are probe diagnostics, optical methods (including the use of lasers and holography), microwave diagnostics, and diagnostics with particle beams. Having infor mation on these methods available in compact form and in one place, as is the case in the present volume, should make it pos sible to evaluate different diagnostic approaches to specific prob lems. The volume will be useful as an introduction for advanced students making their first contact with experimental plasma physics and for physicists and engineers who are entering the field and desire a rapid survey of principles and modern trends in the diagnostics of high-temperature plasmas. v Foreword to the American Edition The material in this book is based on lectures given at Mos cow State University. It is intended to acquaint the reader with the basic aspects of plasma diagnostics and contains information re quired for the experimental physicist who wishes to carry out straightforward measurements of laboratory plasmas. It will be evident that in choosing the material we have been guided pri marily by the scientific interests of the author, and the great bulk of the material is based on work carried out in the USSR.
Author : R.J. Shul,S.J. Pearton
Publisher : Springer Science & Business Media
Page : 664 pages
File Size : 44,7 Mb
Release : 2011-06-28
Category : Technology & Engineering
ISBN : 9783642569890
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author : Anton Nikiforov,Zhiqiang Chen
Publisher : BoD – Books on Demand
Page : 146 pages
File Size : 49,8 Mb
Release : 2019-04-24
Category : Science
ISBN : 9781838802493
Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.
Author : Hans-Joachim Kunze
Publisher : Springer Science & Business Media
Page : 242 pages
File Size : 48,9 Mb
Release : 2009-09-18
Category : Science
ISBN : 9783642022333
Although based on lectures given for graduate students and postgraduates starting in plasma physics, this concise introduction to the fundamental processes and tools is as well directed at established researchers who are newcomers to spectroscopy and seek quick access to the diagnostics of plasmas ranging from low- to high-density technical systems at low temperatures, as well as from low- to high-density hot plasmas. Basic ideas and fundamental concepts are introduced as well as typical instrumentation from the X-ray to the infrared spectral regions. Examples, techniques and methods illustrate the possibilities. This book directly addresses the experimentalist who actually has to carry out the experiments and their interpretation. For that reason about half of the book is devoted to experimental problems, the instrumentation, components, detectors and calibration.
Author : National Research Council,Division on Engineering and Physical Sciences,Commission on Physical Sciences, Mathematics, and Applications,Board on Physics and Astronomy,Plasma Science Committee,Panel on Plasma Processing of Materials
Publisher : National Academies Press
Page : 88 pages
File Size : 43,6 Mb
Release : 1991-02-01
Category : Technology & Engineering
ISBN : 9780309045971
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author : Takashi Fujimoto
Publisher : Clarendon Press
Page : 300 pages
File Size : 48,6 Mb
Release : 2004-06-17
Category : Science
ISBN : 9780191523892
This book focuses on the characteristics of optical radiation, or a spectrum, emitted by various plasmas. In plasma, the same atomic species can produce quite different spectra, or colours, depending on the nature of the plasma. This book gives a theoretical framework by which a particular spectrum can be interpreted correctly and coherently. The uniqueness of the book lies in its comprehensive treatment of the intensity distribution of spectral lines and the population density distribution among the atomic levels in plasmas. It is intended to provide beginners with a good perspective of the field, laying out the physics in an extremely clear manner and starting from an elementary level. A useful feature of the book is the asterisked sections and chapters which can be skipped by readers who only wish to gain a quick and basic introduction to plasma spectroscopy. It will also be useful to researchers working actively in the field, acting as a guide for carrying out experiments and interpreting experimental observations.
Author : Jurgen Meichsner,Martin Schmidt,Ralf Schneider,Hans-Erich Wagner
Publisher : CRC Press
Page : 554 pages
File Size : 43,9 Mb
Release : 2012-11-13
Category : Science
ISBN : 9781420059212
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant