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Author : G. S. Mathad
Publisher : Unknown
Page : 342 pages
File Size : 46,7 Mb
Release : 2002
Category : Technology & Engineering
ISBN : 1566773415
Author : G. S. Mathad
Publisher : Unknown
Page : 324 pages
File Size : 43,8 Mb
Release : 2002-01-01
Category : Plasma etching
ISBN : 1566773415
Author : J Reece Roth
Publisher : Routledge
Page : 770 pages
File Size : 45,5 Mb
Release : 2017-11-01
Category : Science
ISBN : 9781351438704
Written by a leading expert in the field, the paperback edition of Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.
Author : National Research Council,Division on Engineering and Physical Sciences,Commission on Physical Sciences, Mathematics, and Applications,Board on Physics and Astronomy,Plasma Science Committee,Panel on Plasma Processing of Materials
Publisher : National Academies Press
Page : 88 pages
File Size : 54,7 Mb
Release : 1991-02-01
Category : Technology & Engineering
ISBN : 9780309045971
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author : Anonim
Publisher : Unknown
Page : 840 pages
File Size : 53,5 Mb
Release : 1990
Category : Power resources
ISBN : MSU:31293010869141
Author : Anonim
Publisher : Unknown
Page : 848 pages
File Size : 49,9 Mb
Release : 1989
Category : Power resources
ISBN : UIUC:30112018073699
Author : Yue Kuo
Publisher : Springer Science & Business Media
Page : 538 pages
File Size : 49,5 Mb
Release : 2004
Category : Thin film transistors
ISBN : 1402075057
This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.
Author : Jun Wang
Publisher : Springer Science & Business Media
Page : 1429 pages
File Size : 52,5 Mb
Release : 2006-05-11
Category : Computers
ISBN : 9783540344827
This is Volume III of a three volume set constituting the refereed proceedings of the Third International Symposium on Neural Networks, ISNN 2006. 616 revised papers are organized in topical sections on neurobiological analysis, theoretical analysis, neurodynamic optimization, learning algorithms, model design, kernel methods, data preprocessing, pattern classification, computer vision, image and signal processing, system modeling, robotic systems, transportation systems, communication networks, information security, fault detection, financial analysis, bioinformatics, biomedical and industrial applications, and more.
Author : Anonim
Publisher : Unknown
Page : 778 pages
File Size : 51,8 Mb
Release : 1987
Category : Plasma engineering
ISBN : UCAL:B4398540
Author : E.R. Priest,Vinod Krishan
Publisher : Springer Science & Business Media
Page : 574 pages
File Size : 52,6 Mb
Release : 1990-09-30
Category : Science
ISBN : 0792308794
Much of the excitement in modern Solar Physics has come from the realisation that the Sun is a plasma and that this plasma is interacting with the magnetic field in a wide variety of subtle ways. As well as being of great interest in their own right the observed plasma phenomena on the Sun are of much wider importance, since they reveal to us details of basic phenomena that are expected to be occurring throughout the universe. It was with this in mind that 173 solar physicists from 17 countries gathered together in Bangalore with an air of anticipation. We were not disappointed as we received the warmest of welcomes from our graceful and charming host,Vinod Krishan. She and her colleagues worked tirelessly to make our stay a most memorable one and to ensure that the meeting ran with calm and efficiency. In addition to being stimulated by an excellent series of talks on the up-to-the minute advances in our subject, it was a pleasure to make new friendships from so many countries and to learn, in particular, of the Solar Physics being done in India which has a great tradition and is of a high standard. Furthermore, we enjoyed hearing about Indian culture and appreciating its beauty, especially on our day's tour into the countryside to visit some Hindu and Jain temples.
Author : G. Mathad
Publisher : The Electrochemical Society
Page : 89 pages
File Size : 44,8 Mb
Release : 2008-11
Category : Science
ISBN : 9781566776653
This issue of ECS Transactions contains papers presented at the International Symposium on Plasma Processing. The symposium, 17th in the series, cosponsored by the Dielectric Science & Technology, Electronics, and Photonics Divisions was held as part of the 213th Meeting of The Electrochemical Society, Inc., in Phoenix, AZ, USA, May 18 - 23, 2008. A total of 14 papers were presented from Belgium, Germany, Italy, Japan, Republic of Korea, Russia, and the USA on topics mainly focused on diagnostics & measurements and etching & deposition processes.
Author : Maher I. Boulos,Pierre L. Fauchais,Joachim V.R. Heberlein
Publisher : Springer Nature
Page : 1147 pages
File Size : 40,8 Mb
Release : 2021-10-19
Category : Technology & Engineering
ISBN : 9783030706722
This fully revised, industry-standard resource offers practical details on every aspect of the fundamentals necessary for understanding thermal spray technology, from powder all the way to the final part. The second edition is presented in a reader-friendly format that is split into four parts. Part I presents a review of thermal spray coating and its position in the broad field of surface modification technologies. Highlights of combustion and thermal plasmas are given with an expanded treatment of in-flight plasma-particle interactions. The second and third parts deal respectively with an updated presentation of thermal spray technologies and coating formation, including solution and suspension plasma spraying. The last part of the book includes a comparative analysis of different thermal spray processes, which is essential for the optimal selection of the appropriate thermal spray process in a given application. Coverage of system integration has been expanded with the addition of a detailed discussion of online instrumentation and process diagnostics and numerous examples of industrial scale spray booth designs. Attention is also given to coating finishing and health and safety issues. An extensive review is presented of thermal spray applications grouped in terms of process objectives and present use in different industrial sectors. This book will serve as an invaluable resource as a textbook for graduate courses in the field and as an exhaustive reference for professionals involved in the thermal spray field.
Author : Zhiyong Ma,David G. Seiler
Publisher : CRC Press
Page : 843 pages
File Size : 48,8 Mb
Release : 2017-03-27
Category : Science
ISBN : 9781351733946
Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.
Author : Anonim
Publisher : Unknown
Page : 128 pages
File Size : 42,7 Mb
Release : 2024-07-01
Category : Electronic
ISBN : OCLC:760725814
Author : Irving P. Herman
Publisher : Elsevier
Page : 815 pages
File Size : 49,6 Mb
Release : 1996-10-23
Category : Technology & Engineering
ISBN : 9780080538082
This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing Useful as an introduction to the subject or as a resource handbook Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing Examples emphasize applications in microelectronics and optoelectronics Introductory chapter serves as a guide to all optical diagnostics and their applications Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic