Industrial Plasma Engineering

Author : J Reece Roth
Publisher : CRC Press
Page : 572 pages
File Size : 55,6 Mb
Release : 1995-01-01
Category : Science
ISBN : 1420050869

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Industrial Plasma Engineering by J Reece Roth Pdf

This book will provide the necessary theoretical background and a description of plasma-related devices and processes that are used industrially for physicists and engineers. It is a self-contained introduction to the principles of plasma engineering with comprehensive references. This volume also includes the terminology, jargon and acronyms used in the field of industrial plasma engineering - indexed when they first appear in the text - along with their definitions and a discussion of their meaning. It is aimed at assisting the student in learning key terminology and concepts, and providing the in-service engineer or scientist with a technical glossary. An extensive index and appendices enhance the value of this book as a key reference source. These incorporate a list of the nomenclature used in mathematical expressions in the text, physical constants, and often-used plasma formulae. SI units are used throughout. Intended for students from all engineering and physical science disciplines, and as a reference source by in-service engineers. Coverage: * basic information on plasma physics and the physical processes important in industrial plasmas * sources of ion and electron beams and ionizing radiation used in industrial applications * physics and technology of DC and RF electrical discharges.

Author : J Reece Roth
Publisher : CRC Press
Page : 658 pages
File Size : 43,9 Mb
Release : 2001-08-25
Category : Science
ISBN : 9781420034127

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Industrial Plasma Engineering by J Reece Roth Pdf

Written by a leading expert in the field, Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices tha

Author : J. Reece Roth
Publisher : Unknown
Page : 128 pages
File Size : 54,7 Mb
Release : 1995
Category : Electronic
ISBN : OCLC:876026592

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Industrial Plasma Engineering by J. Reece Roth Pdf

Author : Yoshinobu Kawai,Hideo Ikegami,Noriyoshi Sato,Akihisa Matsuda,Kiichiro Uchino,Masayuki Kuzuya,Akira Mizuno
Publisher : John Wiley & Sons
Page : 467 pages
File Size : 50,6 Mb
Release : 2010-04-26
Category : Technology & Engineering
ISBN : 9783527325443

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Industrial Plasma Technology by Yoshinobu Kawai,Hideo Ikegami,Noriyoshi Sato,Akihisa Matsuda,Kiichiro Uchino,Masayuki Kuzuya,Akira Mizuno Pdf

Clearly structured in five major sections on applications, this monograph covers such hot technologies as nanotechnology, solar cell technology, biomedical and clinical applications, and sustainability. Since the topic, applications and readers are highly interdisciplinary, the book bridges materials science, industrial chemistry, physics, and engineering -- making it a must-have for researchers in industry and academia, as well as those working in application-oriented plasma technology.

Author : J Reece Roth
Publisher : CRC Press
Page : 1320 pages
File Size : 51,5 Mb
Release : 2001-08-25
Category : Science
ISBN : 0750305444

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Industrial Plasma Engineering by J Reece Roth Pdf

Written by a leading expert in the field, Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.

Author : Alexander Fridman,Lawrence A. Kennedy
Publisher : CRC Press
Page : 888 pages
File Size : 44,7 Mb
Release : 2004-04-15
Category : Science
ISBN : 1560328487

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Plasma Physics and Engineering by Alexander Fridman,Lawrence A. Kennedy Pdf

Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear, fundamental introduction to virtually all aspects of modern plasma science and technology, including plasma chemistry and engineering, combustion, chemical physics, lasers, electronics, methods of material treatment, fuel conversion, and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and an array of problems and concept questions.

Author : Anonim
Publisher : Unknown
Page : 128 pages
File Size : 45,8 Mb
Release : 1997*
Category : Electronic
ISBN : OCLC:948166942

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Industrial Plasma Engineering by Anonim Pdf

Author : National Research Council,Division on Engineering and Physical Sciences,Commission on Physical Sciences, Mathematics, and Applications,Board on Physics and Astronomy,Plasma Science Committee,Panel on Plasma Processing of Materials
Publisher : National Academies Press
Page : 88 pages
File Size : 51,9 Mb
Release : 1991-02-01
Category : Technology & Engineering
ISBN : 9780309045971

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Plasma Processing of Materials by National Research Council,Division on Engineering and Physical Sciences,Commission on Physical Sciences, Mathematics, and Applications,Board on Physics and Astronomy,Plasma Science Committee,Panel on Plasma Processing of Materials Pdf

Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.

Author : Francis F. Chen,Jane P. Chang
Publisher : Springer Science & Business Media
Page : 213 pages
File Size : 47,6 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781461501817

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Lecture Notes on Principles of Plasma Processing by Francis F. Chen,Jane P. Chang Pdf

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Author : J Reece Roth
Publisher : CRC Press
Page : 500 pages
File Size : 50,6 Mb
Release : 2001-08-01
Category : Science
ISBN : 0750308257

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Industrial Plasma Engineering - 2 Volume Set by J Reece Roth Pdf

The first volume of Industrial Plasma Engineering is a major work of reference containing the theoretical background and a description of a wide range of plasma related devices and processes used in industry. It is intended as a textbook for students of physics and all engineering disciplines, and as a working reference for practicing engineers, particularly those working in materials processing and device fabrication. The second volume is intended to provide a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially, and also to provide a description of plasma-related processes and devices that are of commercial interest.

Author : R. Mohan Sankaran
Publisher : CRC Press
Page : 432 pages
File Size : 49,6 Mb
Release : 2017-12-19
Category : Science
ISBN : 9781439866771

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Plasma Processing of Nanomaterials by R. Mohan Sankaran Pdf

We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

Author : Zhong Xu,Frank F. Xiong
Publisher : Springer
Page : 269 pages
File Size : 44,9 Mb
Release : 2017-09-21
Category : Technology & Engineering
ISBN : 9789811057243

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Plasma Surface Metallurgy by Zhong Xu,Frank F. Xiong Pdf

This book provides a comprehensive introduction to and technical description of a unique patented surface-modification technology: plasma surface metallurgy with double-glow discharge plasma process, known as the Xu-Tec process. As such it promotes further attention and interest in scientific research and engineering development in this area, as well as industrial utilization and product commercialization. The Xu-Tec process has opened up a new material engineering field of “Plasma Surface Metallurgy”. This surface-modification process can transform many low-grade and low-cost industrial engineering materials into “gold” materials with a high value and high grade or special functions. This improved material can be widely used in industrial production to improve the surface performance and quality of mechanical parts and manufacturing products, and to conserve expensive alloying elements for the benefit of all mankind. “This book will be valuable to those in the general area of surface metallurgy. The substantial description of the Xu-Tec process is very important and should assist in expanding the use of this superior technique. The in-depth explanation of glow discharges and their use in general will also serve as a valuable reference in the field.” James E. Thompson, Prof. Fellow of the IEEE Dean of Engineering Emeritus University of Missouri, Columbia, Missouri, USA November, 2016 "A BREAKTHROUGH IN MAKING METAL TOUGHER". ---- SCIENCE & TECHNOLOGY Business Week, July 24, 1989 “NOVEL SURFACE ALLOYING PROCESS” --- THE LEADING EDGE TECHNOLOGY WORDWIDE Materials and Processing Report, Dec. 1987

Author : Michael A. Lieberman,Alan J. Lichtenberg
Publisher : John Wiley & Sons
Page : 795 pages
File Size : 49,7 Mb
Release : 2005-04-08
Category : Science
ISBN : 9780471724247

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Principles of Plasma Discharges and Materials Processing by Michael A. Lieberman,Alan J. Lichtenberg Pdf

A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

Author : Alexander Fridman
Publisher : Cambridge University Press
Page : 128 pages
File Size : 46,6 Mb
Release : 2008-05-05
Category : Technology & Engineering
ISBN : 9781139471732

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Plasma Chemistry by Alexander Fridman Pdf

Providing a fundamental introduction to all aspects of modern plasma chemistry, this book describes mechanisms and kinetics of chemical processes in plasma, plasma statistics, thermodynamics, fluid mechanics and electrodynamics, as well as all major electric discharges applied in plasma chemistry. Fridman considers most of the major applications of plasma chemistry, from electronics to thermal coatings, from treatment of polymers to fuel conversion and hydrogen production and from plasma metallurgy to plasma medicine. It is helpful to engineers, scientists and students interested in plasma physics, plasma chemistry, plasma engineering and combustion, as well as chemical physics, lasers, energy systems and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics and numerical formulas for practical calculations related to specific plasma-chemical processes and applications. Problems and concept questions are provided, helpful in courses related to plasma, lasers, combustion, chemical kinetics, statistics and thermodynamics, and high-temperature and high-energy fluid mechanics.

Author : Shahzad, Aamir,He, Maogang
Publisher : IGI Global
Page : 239 pages
File Size : 54,6 Mb
Release : 2021-12-17
Category : Science
ISBN : 9781799884002

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Emerging Developments and Applications of Low Temperature Plasma by Shahzad, Aamir,He, Maogang Pdf

Low temperature plasma in medicine is a new field that rose from the research in the application of cold plasmas in bioengineering. Plasma medicine is an innovative and promising multidisciplinary novel field of research covering plasma physics, life sciences, and clinical medicine to apply physical plasma for therapeutic applications. Emerging Developments and Applications of Low Temperature Plasma explores all areas of experimental, computational, and theoretical study of low temperature and atmospheric plasmas and provides a collection of exciting new research on the fundamental aspects of low temperature and pressure plasmas and their applications. Covering topics such as carbon nanotubes, foodborne pathogens, and plasma formation, this book is an essential resource for research groups, plasma-based industries, plasma aerodynamics industries, metal and cutlery industries, medical institutions, researchers, and academicians.