Progress In Semiconductors Ii Electronic And Optoelectronic Applications Volume 744

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Progress in Semiconductors II - Electronic and Optoelectronic Applications: Volume 744

Author : B. D. Weaver
Publisher : Unknown
Page : 712 pages
File Size : 53,8 Mb
Release : 2003-04-16
Category : Technology & Engineering
ISBN : UOM:39015052645671

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Progress in Semiconductors II - Electronic and Optoelectronic Applications: Volume 744 by B. D. Weaver Pdf

Recent years have witnessed dramatic success in the development of semiconductor materials and related quantum structures for applications in electronics and optoelectronics. Progress has also been made in manufacturable (low cost, high volume) growth and processing of semiconductor materials for such device structures. Novel approaches have been proposed to integrate compound semiconductor devices with conventional silicon processing. This book provides a comprehensive overview of the progress on growth, properties and processing of semiconductor materials and quantum structures, as well to underscore the progress on devices such as transistors, light sources, detectors and modulators. Brought to maturity, these devices will likely see widespread application in infrared imaging, chemical and biological sensing, surveillance, short links, space-based applications, solar cells, high-bandwidth communications, and more. Topics include: electronic devices; Si/Ge devices and technology; zinc oxide and related compounds; emitters, lasers and photovoltaics; nanostructures; innovative materials and devices; detectors; and III-nitride materials and devices.

New Applications for Wide-Bandgap Semiconductors: Volume 764

Author : Materials Research Society. Meeting
Publisher : Unknown
Page : 456 pages
File Size : 54,7 Mb
Release : 2003-09-29
Category : Technology & Engineering
ISBN : UOM:39015056330536

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New Applications for Wide-Bandgap Semiconductors: Volume 764 by Materials Research Society. Meeting Pdf

Wide-bandgap semiconductors such as SiC, GaN and related alloys, BN and related alloys, ZnGeSiN2, ZnO, and others continue to find new applications in solid-state lighting, sensors, filters, high-power electronics, biological detection, and spintronics. Improved bulk and epitaxial growth, processing, device design, and understanding of the physics of transport in heterostructures are all necessary for realization of these new technologies. The papers in this book span a range of subjects from material growth and characterization to the processing and application of devices in the electronic, as well as the optoelectronic, fields. Topics include: special invited papers; growth, processing and devices; novel applications for wide-bandgap semiconductors; oxides, heterostructures and devices; processing and devices and emerging areas.

Surface Engineering 2002 - Synthesis, Characterization and Applications: Volume 750

Author : A. Kumar
Publisher : Unknown
Page : 648 pages
File Size : 49,6 Mb
Release : 2003-06-02
Category : Technology & Engineering
ISBN : UCSD:31822032314981

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Surface Engineering 2002 - Synthesis, Characterization and Applications: Volume 750 by A. Kumar Pdf

This book provides a forum for international and interdisciplinary discussion of phenomena where materials performance may be enhanced through engineered surfaces and interfaces. The materials science of hard and wear-resistant coatings, including nanostructured coatings, is a scientifically challenging problem with immediate technological applications in machine and machining tools, magnetic recording and other manufacturing industries. Hard coating systems designed for use in next-generation materials applications must achieve a combination of physical properties. The performance and reliability of MEMS devices strongly depend on the near-surface properties and many materials issues at the micro- and nanoscale remain to be resolved. This book reviews key aspects, discusses ongoing research and speculates on future trends. Topics include: nano- and micrometer-scale characterization and properties; synthesis and characterization of nanostructured materials; deposition, characterization and properties of films and coatings; industrial applications of surface engineering; atomistic and continuum modeling of materials properties; surface engineering issues for bio/microelectronics applications; and surface engineering issues in MEMS structures and devices.

Quantum Confined Semiconductor Nanostructures: Volume 737

Author : Victor I. Klimov
Publisher : Cambridge University Press
Page : 872 pages
File Size : 47,9 Mb
Release : 2003-04-16
Category : Science
ISBN : UOM:39015052645663

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Quantum Confined Semiconductor Nanostructures: Volume 737 by Victor I. Klimov Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book brings together a single comprehensive overview of recent progress and future directions in nanoscale semiconductor research. Fields ranging from materials science to physics, chemistry, electrical and microelectronic engineering, circuit design, and more, are represented.

Unconventional Approaches to Nanostructures with Applications in Electronics, Photonics, Information Storage and Sensing: Volume 776

Author : Materials Research Society. Meeting
Publisher : Unknown
Page : 312 pages
File Size : 44,8 Mb
Release : 2003-08-14
Category : Computers
ISBN : UOM:39015059971575

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Unconventional Approaches to Nanostructures with Applications in Electronics, Photonics, Information Storage and Sensing: Volume 776 by Materials Research Society. Meeting Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Compound Semiconductor Photovoltaics

Author : Materials Research Society. Meeting
Publisher : Unknown
Page : 512 pages
File Size : 42,6 Mb
Release : 2003
Category : Technology & Engineering
ISBN : UOM:39015056330676

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Compound Semiconductor Photovoltaics by Materials Research Society. Meeting Pdf

This volume focuses on basic and applied materials research related to compound semiconductors. Emphasis is on materials that are used, or have clear potential use, as thin films in solar cells and spin-off applications. Relevant materials include Cu(In, Ga, Al)(Se, S)2, MX (M = Zn and/or Cd; X = S, Se and/or Te), III-V photovoltaic materials, and transparent conducting oxides. Understanding fundamental materials limitations, real or perceived, are of particular interest. Highlights center on: materials-related prerequisites for high-efficiency thin-film solar cells; the dynamics of chemical treatment/etching of CdTe with emphasis on back contacting; high-resolution microanalysis of grain boundaries and surface chemistry and how they affect device performance; the role and significance of transparent conducting oxides in device performance; and the electronic structure of highly mismatched III-V alloy semiconductors.

Optoelectronics of Group-IV-based Materials

Author : Materials Research Society. Meeting
Publisher : Unknown
Page : 268 pages
File Size : 42,5 Mb
Release : 2003
Category : Technology & Engineering
ISBN : UOM:39015059971609

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Optoelectronics of Group-IV-based Materials by Materials Research Society. Meeting Pdf

Elemental semiconductors feature fundamental advantages when compared to II-VI and III-V compounds. This is best illustrated by the success of silicon technology and also by the superior purity of germanium and (MOCVD) diamond. However, in contrast to electronic, the optical properties of these materials are inferior, and therefore, their applications remain electronic rather than photonic. Nevertheless, an effort toward optoelectronics continues. In the case of silicon and silicon-based media, this is motivated by the almost unlimited possibilities offered by VLSI technology. Among other methods, quantum confinement in low-dimensional structures, optical doping, development of inhomogeneous media, and applications of microcavities are being vigorously explored as ways to improve emission. When brought to maturity, these approaches could lead to widespread applications ranging from telecommunications to chemical and biological sensing. For silicon, a full on-chip integration of electronic and photonic elements could be realized. This volume brings together researchers from academic, industry and government laboratories around the world to review progress in the field, identify the most promising targets, point out possible bottlenecks and assess future perspectives. A cross-fertilization of ideas from the fields of materials science, spectroscopy, solid-state physics and chemistry, as well as device physics, are presented.

Structure-Property Relationships of Oxide Surfaces and Interfaces II: Volume 751

Author : Materials Research Society. Meeting
Publisher : Unknown
Page : 248 pages
File Size : 43,9 Mb
Release : 2003-05-21
Category : Technology & Engineering
ISBN : UCSD:31822032315046

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Structure-Property Relationships of Oxide Surfaces and Interfaces II: Volume 751 by Materials Research Society. Meeting Pdf

Because surfaces and interfaces found in oxide systems are strikingly complex, they can only be fully understood when examined at an atomic level. Yet for the materials scientist, such understanding is of paramount importance since future technological advances require it. This book, the second in a new series from the Materials Research Society, addresses structure-property relationships in these systems. Compared to the first proceedings, here we see a shift towards less well-defined materials that often more closely resemble reality, and an increasing effort to study these phenomena using in situ techniques. Of particular interest are discussions on the dynamical evolution of surface structure and relationships between the structure of surfaces, their stoichiometry and the distribution of bulk dislocations, which in turn can control the growth and retraction of islands and pits. Modeling and characterization of thin intergranular films, with a focus on how these films influence the properties of so many ceramic materials, are also addressed.

Electronics on Unconventional Substrates - Electrotextiles and Giant-Area Flexible Circuits: Volume 736

Author : Michael S. Shur,Patricia M. Wilson,Dick Urban
Publisher : Unknown
Page : 334 pages
File Size : 41,9 Mb
Release : 2003-04-10
Category : Technology & Engineering
ISBN : UOM:39015052645630

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Electronics on Unconventional Substrates - Electrotextiles and Giant-Area Flexible Circuits: Volume 736 by Michael S. Shur,Patricia M. Wilson,Dick Urban Pdf

Progress in microelectronics has been associated with reducing the minimum feature size of integrated circuits. However, this trend seems to be ending. The minimum device feature size is now approaching dimensions comparable to molecular and atomic sizes, and the ability to scale down is rapidly reaching the point of diminishing returns. New frontiers of microelectronics lie in supplementing conventional silicon chips with new materials and approaches that allow for cheap microelectronic and nanoelectronic devices and circuits on unconventional flexible giant substrates. Giant electronics on flexible substrates will enable numerous applications from electrotextiles to flexible displays, from thin-film batteries to novel photovoltaic devices, and from 'sensitive skin' for robotics and medical applications to antiterrorist systems built into smart, safe and environmentally friendly buildings. This book deals with this new and potentially disruptive technology. Future concerns include the development of reliable low-temperature deposition technology for depositing semiconducting films on a variety of unconventional substrates and the development of flexible/stretchable metal and transparent metal films and the demonstration of semiconductor heterostructures on threads and cloth.

Nanomaterials for Structural Applications

Author : Christopher C. Berndt
Publisher : Unknown
Page : 510 pages
File Size : 50,6 Mb
Release : 2003
Category : Technology & Engineering
ISBN : UOM:39015052645622

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Nanomaterials for Structural Applications by Christopher C. Berndt Pdf

Chemical-Mechanical Planarization: Volume 767

Author : Duane S. Boning
Publisher : Unknown
Page : 376 pages
File Size : 43,5 Mb
Release : 2003-08-27
Category : Technology & Engineering
ISBN : UOM:39015059971484

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Chemical-Mechanical Planarization: Volume 767 by Duane S. Boning Pdf

Chemical-mechanical planarization (CMP) has emerged as a critical fabrication technology for advanced integrated circuits. Even as the applications of CMP have diversified and we have begun to understand aspects of the physics and chemistry of the process, a new generation of CMP innovations is unfolding. New slurries and consumables are under development. New applications to novel devices continue to appear. This book, the most recent in a successful series on CMP, offers a review of the advances to date and provides a comprehensive discussion of the future challenges that must be overcome. Presentations from academia, government labs and industry are featured. Topics include; CMP modeling; CMP science; CMP slurries and particles for planarization of copper, oxide, and other materials; planarization applications including shallow trench isolation (STI), copper damascene, and novel devices and CMP integration.

Nanostructuring Materials with Energetic Beams: Volume 777

Author : A. Meldrum,S. Roorda,H. Bernas
Publisher : Unknown
Page : 224 pages
File Size : 43,6 Mb
Release : 2003-06-05
Category : Technology & Engineering
ISBN : UOM:39015059971591

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Nanostructuring Materials with Energetic Beams: Volume 777 by A. Meldrum,S. Roorda,H. Bernas Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Amorphous and Nanocrystalline Silicon-Based Films - 2003: Volume 762

Author : Materials Research Society. Meeting
Publisher : Unknown
Page : 824 pages
File Size : 52,5 Mb
Release : 2003-11-12
Category : Science
ISBN : UOM:39015058106835

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Amorphous and Nanocrystalline Silicon-Based Films - 2003: Volume 762 by Materials Research Society. Meeting Pdf

Amorphous silicon technology has been the subject of symposia every year since 1984. This remarkable longevity is due to the continuous emergence of new scientific questions and new technological challenges for silicon thin films. Earlier there was a strong emphasis on methods to achieve high deposition rates using plasma or hot-wire chemical vapor deposition, and on the properties and applications of nanocrystalline silicon films, which for example have been incorporated into stacked a-Si:H/nc-Si:H solar cells. The papers appearing in this book are sorted under six chapter headings on the basis of subject matter. Chapter I is concerned with amorphous network structures, electronic metastability, defects, and photoluminescence. Chapter II focuses on thin-film transistors and imager arrays. Chapter III covers solar cells. Chapter IV addresses growth mechanisms, hot-filament CVD, and nc-Si:H growth. Chapter V contains all remaining topics in film growth, especially those related to devices. Finally, Chapter VI focuses on crystallized film.

CMOS Front-End Materials and Process Technology: Volume 765

Author : Materials Research Society. Meeting
Publisher : Unknown
Page : 336 pages
File Size : 43,7 Mb
Release : 2003-09-12
Category : Computers
ISBN : UOM:39015059971427

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CMOS Front-End Materials and Process Technology: Volume 765 by Materials Research Society. Meeting Pdf

In the future, because fundamental materials and process limits are being approached, continued transistor scaling will not be as straightforward. Future complementary metal-oxide semiconductor (MOS) transistors will require high-permittivity (high-k) gate dielectrics and metal gate electrodes, as well as low-resistance ultrashallow junctions, in order to meet the stringent specifications of the International Technology Roadmap for Semiconductors. Techniques to improve transconductance and drive current may also be required. Process integration issues must be solved, and reliability must be assured, before any new material or processing technique can be used in IC manufacture. A further complication is that the key challenges will differ according to application. This book reports research results from industry, government labs and academia covering a wide scope of front-end process issues for future CMOS technologies. Topics include: advanced materials and structures; high-k dielectrics; advanced gate stack materials; heterogeneous integration and strained Si technologies; ultrashallow junction technology; strained Si and source/drain technology; and laser annealing and silicide processes.