Sige Ge And Related Compounds 6 Materials Processing And Devices

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SiGe, Ge and Related Compounds 6

Author : David Louis Harame
Publisher : Unknown
Page : 1014 pages
File Size : 53,9 Mb
Release : 2014
Category : Electronic apparatus and appliances
ISBN : 1623321867

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SiGe, Ge and Related Compounds 6 by David Louis Harame Pdf

SiGe, Ge, and Related Compounds 4: Materials, Processing, and Devices

Author : D. Harame
Publisher : The Electrochemical Society
Page : 1066 pages
File Size : 40,5 Mb
Release : 2010-10
Category : Science
ISBN : 9781566778251

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SiGe, Ge, and Related Compounds 4: Materials, Processing, and Devices by D. Harame Pdf

Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds has become a key component in the arsenal in improving semiconductor performance. This symposium discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.

SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices

Author : David Harame
Publisher : The Electrochemical Society
Page : 1136 pages
File Size : 42,8 Mb
Release : 2008
Category : Electronic apparatus and appliances
ISBN : 9781566776561

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SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices by David Harame Pdf

Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds have become a key component of the arsenal in improving semiconductor performance. This issue of ECS Transactions discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.

SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 8

Author : Q. Liu,J.-M. Hartmann,A. Thean,S. Miyazaki,A. Ogura,X. Gong,M. Caymax,A. Schulze,G. Masini,A. Mai,M. Östling,G. Niu,D. Harame
Publisher : The Electrochemical Society
Page : 450 pages
File Size : 54,8 Mb
Release : 2018-09-21
Category : Science
ISBN : 9781607688532

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SiGe, Ge, and Related Compounds: Materials, Processing, and Devices 8 by Q. Liu,J.-M. Hartmann,A. Thean,S. Miyazaki,A. Ogura,X. Gong,M. Caymax,A. Schulze,G. Masini,A. Mai,M. Östling,G. Niu,D. Harame Pdf

SiGe, Ge, and Related Compounds 4

Author : Anonim
Publisher : Unknown
Page : 1034 pages
File Size : 49,7 Mb
Release : 2010
Category : Electronic
ISBN : 1607681757

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SiGe, Ge, and Related Compounds 4 by Anonim Pdf

SiGe, Ge, and Related Compounds 6: Materials, Processing, and Devices

Author : D. Harame,M. Caymax,M. Heyns,G. Masini,S. Miyazaki,G. Niu,A. Reznicek,K. Saraswat,B. Tillack,B. Vincent,Y. C. Yeo,A. Ogura,J. Murota
Publisher : The Electrochemical Society
Page : 1042 pages
File Size : 47,7 Mb
Release : 2024-06-30
Category : Electronic
ISBN : 9781607685432

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SiGe, Ge, and Related Compounds 6: Materials, Processing, and Devices by D. Harame,M. Caymax,M. Heyns,G. Masini,S. Miyazaki,G. Niu,A. Reznicek,K. Saraswat,B. Tillack,B. Vincent,Y. C. Yeo,A. Ogura,J. Murota Pdf

SiGe and Ge

Author : David Louis Harame
Publisher : The Electrochemical Society
Page : 1280 pages
File Size : 55,7 Mb
Release : 2006
Category : Electronic apparatus and appliances
ISBN : 9781566775076

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SiGe and Ge by David Louis Harame Pdf

The second International SiGe & Ge: Materials, Processing, and Devices Symposium was part of the 2006 ECS conference held in Cancun, Mexico from October 29-Nov 3, 2006. This meeting provided a forum for reviewing and discussing all materials and device related aspects of SiGe & Ge. The hardcover edition includes a bonus CD-ROM containing the PDF of the entire issue.

SiGe, Ge, and Related Materials

Author : Q. Liu
Publisher : Unknown
Page : 0 pages
File Size : 49,8 Mb
Release : 2022
Category : Electronic
ISBN : 1713863472

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SiGe, Ge, and Related Materials by Q. Liu Pdf

ULSI Process Integration 6

Author : C. Claeys
Publisher : The Electrochemical Society
Page : 547 pages
File Size : 53,7 Mb
Release : 2009-09
Category : Integrated circuits
ISBN : 9781566777445

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ULSI Process Integration 6 by C. Claeys Pdf

ULSI Process Integration 6 covers all aspects of process integration. Sections are devoted to 1) Device Technologies, 2) Front-end-of-line integration (gate stacks, shallow junctions, dry etching, etc.), 3) Back-end-of-line integration (CMP, low-k, Cu interconnect, air-gaps, 3D packaging, etc.), 4) Alternative channel technologies (Ge, III-V, hybrid integration), and 5) Emerging technologies (CNT, graphene, polymer electronics, nanotubes).

Nanoscaled Films and Layers

Author : Laszlo Nanai
Publisher : BoD – Books on Demand
Page : 300 pages
File Size : 43,6 Mb
Release : 2017-05-24
Category : Science
ISBN : 9789535131434

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Nanoscaled Films and Layers by Laszlo Nanai Pdf

In recent years, scientific investigations and technological developments have resulted in many new results. Direct applications of quantum mechanical laws to system with length scales lower than 100 nm (nano) had opened a way to construction of new equipment in the field f.e. of nano- and optoelectronics. This book fits into this trend summarizing the results related to discoveries and technological applications of nanolayer in different fields of material science and even life science. The chapters are organized into three subfields: 1) Preparation and fabrications of nanolayers with different methods. 2) Description of recent achievements related to very important III-V heterostructures. 3) Descriptions of mechanical, thermal, optoelectronic, photocatalytic, and tribological properties of nanolayered structures. Some environmentally friendly applications are also treated in this book. The presented book provides a description of specific and original results obtained by authors. We hope that the volume will be of interest for a wide range of readers working in the field of material science.

SiGe--materials, Processing, and Devices

Author : David Louis Harame
Publisher : The Electrochemical Society
Page : 1242 pages
File Size : 51,6 Mb
Release : 2004
Category : Science
ISBN : 1566774209

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SiGe--materials, Processing, and Devices by David Louis Harame Pdf

Sinep 2009. 1st International Workshop on Si Based Nano-Electronics and -Photonics

Author : Steafno Chiussi
Publisher : Netbiblo
Page : 162 pages
File Size : 44,6 Mb
Release : 2009-06
Category : Technology & Engineering
ISBN : 9788497454162

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Sinep 2009. 1st International Workshop on Si Based Nano-Electronics and -Photonics by Steafno Chiussi Pdf

The main objective of this International Workshop in Vigo is to target this major problem by bringing together scientists and engineers specialized on various different topics related to group IV semiconductors. In five consecutive sessions dedicated to - Group IV materials: CMOS and further extension of the roadmap - Group IV materials: Nano-photonics - Material aspects and characterization on nano-scale - Nanostructures and material processing on atomic scale

Journal of the Electrochemical Society

Author : Anonim
Publisher : Unknown
Page : 1020 pages
File Size : 41,8 Mb
Release : 2009
Category : Electrochemistry
ISBN : UCSD:31822036942399

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Journal of the Electrochemical Society by Anonim Pdf

Processing and Properties of Compound Semiconductors

Author : Anonim
Publisher : Elsevier
Page : 333 pages
File Size : 47,7 Mb
Release : 2001-10-20
Category : Science
ISBN : 9780080541013

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Processing and Properties of Compound Semiconductors by Anonim Pdf

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.