The Cmo S Periodic Table

Author : Drew Neisser
Publisher : New Riders
Page : 403 pages
File Size : 44,7 Mb
Release : 2015-11-17
Category : Business & Economics
ISBN : 9780134293820

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The CMO's Periodic Table by Drew Neisser Pdf

Imagine how much you would learn if you could converse with 64 of the brightest minds in marketing. Now imagine if those conversations were focused on all the essential elements that go into being a top-notch chief marketing officer and organized into seven logical, intuitive categories. Now you can stop imagining, and start reading The CMO’s Periodic Table, an essential resource for the modern marketer. Over the last five years, thanks in large part to his friends at The CMO Club, author Drew Neisser has interviewed over 100 marketing leaders at prominent companies such as American Express, Audi, Belkin, Black Duck Software, Converse, College Humor, D&B, Dow, and many more. These interviews, 64 of which are highlighted in this book, reflect the fundamental diversity of challenges and subsequent solution sets deployed by each. Though these interviews don’t yield a magic formula, they offer something a bit more profound and definitely more fundamental—a compendium of elements that every marketer has or will need to examine in the very near future. Organized into a CMO-worthy periodic table modeled on the classic organization of the chemical elements, the chapters progress from basic challenges like research and strategy, to internal issues like culture change and managing up, to advanced, highly volatile subjects like risk-taking and changing agencies.

Author : Harry J.M. Veendrick
Publisher : Springer
Page : 611 pages
File Size : 52,6 Mb
Release : 2017-04-28
Category : Technology & Engineering
ISBN : 9783319475974

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Nanometer CMOS ICs by Harry J.M. Veendrick Pdf

This textbook provides a comprehensive, fully-updated introduction to the essentials of nanometer CMOS integrated circuits. It includes aspects of scaling to even beyond 12nm CMOS technologies and designs. It clearly describes the fundamental CMOS operating principles and presents substantial insight into the various aspects of design implementation and application. Coverage includes all associated disciplines of nanometer CMOS ICs, including physics, lithography, technology, design, memories, VLSI, power consumption, variability, reliability and signal integrity, testing, yield, failure analysis, packaging, scaling trends and road blocks. The text is based upon in-house Philips, NXP Semiconductors, Applied Materials, ASML, IMEC, ST-Ericsson, TSMC, etc., courseware, which, to date, has been completed by more than 4500 engineers working in a large variety of related disciplines: architecture, design, test, fabrication process, packaging, failure analysis and software.

Author : J Pimbley
Publisher : Elsevier
Page : 304 pages
File Size : 54,6 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9780323156806

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Advanced CMOS Process Technology by J Pimbley Pdf

Advanced CMOS Process Technology is part of the VLSI Electronics Microstructure Science series. The main topic of this book is complementary metal-oxide semiconductor or CMOS technology, which plays a significant part in the electronics systems. The topics covered in this book range from metallization, isolation techniques, reliability, and yield. The volume begins with an introductory chapter that discusses the microelectronics revolution of the 20th century. Then Chapter 2 puts focus on the CMOS devices and circuit background, discussing CMOS capacitors and field effect transistors. Metallization topics and concepts are covered in Chapter 3, while isolation techniques are tackled in Chapter 4. Long-term reliability of CMOS is the topic covered in Chapter 5. Finally, the ability of semiconductor technology to yield circuits is discussed in Chapter 6. The book is particularly addressed to engineers, scientists, and technical managers.

Author : Gang He,Zhaoqi Sun
Publisher : John Wiley & Sons
Page : 560 pages
File Size : 51,7 Mb
Release : 2012-08-10
Category : Technology & Engineering
ISBN : 9783527646364

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High-k Gate Dielectrics for CMOS Technology by Gang He,Zhaoqi Sun Pdf

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Author : Carlos Manuel Ferreira Carvalho,Nuno Filipe Silva Veríssimo Paulino
Publisher : Springer
Page : 221 pages
File Size : 41,5 Mb
Release : 2015-07-30
Category : Technology & Engineering
ISBN : 9783319216171

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CMOS Indoor Light Energy Harvesting System for Wireless Sensing Applications by Carlos Manuel Ferreira Carvalho,Nuno Filipe Silva Veríssimo Paulino Pdf

This book discusses in detail the CMOS implementation of energy harvesting. The authors describe an integrated, indoor light energy harvesting system, based on a controller circuit that dynamically and automatically adjusts its operation to meet the actual light circumstances of the environment where the system is placed. The system is intended to power a sensor node, enabling an autonomous wireless sensor network (WSN). Although designed to cope with indoor light levels, the system is also able to work with higher levels, making it an all-round light energy harvesting system. The discussion includes experimental data obtained from an integrated manufactured prototype, which in conjunction with a photovoltaic (PV) cell, serves as a proof of concept of the desired energy harvesting system.

Author : Lau Wai Shing
Publisher : World Scientific
Page : 248 pages
File Size : 42,9 Mb
Release : 2017-08-23
Category : Technology & Engineering
ISBN : 9789813222175

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Ulsi Front-end Technology: Covering From The First Semiconductor Paper To Cmos Finfet Technology by Lau Wai Shing Pdf

The main focus of this book is ULSI front-end technology. It covers from the early history of semiconductor science & technology from 1874 to state-of-the-art FINFET technology in 2016. Some ULSI back-end technology is also covered, for example, the science and technology of MIM capacitors for analog CMOS has been included in this book. Contents: PrefaceAuthor BiographyIntroduction to the History of SemiconductorsHistory of MOS TechnologyCMOS Switching Speed Characterization and An Overview Regarding How to Speed Up CMOSLow Power CMOS EngineeringAnalog CMOS TechnologyIndex Readership: The book is useful for researchers in semiconductor technology especially practicing engineers. Keywords: Semiconductor;Integrated Circuits;CMOS;High Speed;Low Power;Digital;Analog;Mixed-Signal;Planar Technology;FINFET;MIM CapacitorReview: Key Features: The book is readable for beginnersThe book is useful for semiconductor technology historiansThe book is useful for practicing engineers

Author : Márcio Cherem Schneider,Carlos Galup-Montoro
Publisher : Cambridge University Press
Page : 128 pages
File Size : 51,8 Mb
Release : 2010-01-28
Category : Technology & Engineering
ISBN : 9781139483698

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CMOS Analog Design Using All-Region MOSFET Modeling by Márcio Cherem Schneider,Carlos Galup-Montoro Pdf

Covering the essentials of analog circuit design, this book takes a unique design approach based on a MOSFET model valid for all operating regions, rather than the standard square-law model. Opening chapters focus on device modeling, integrated circuit technology, and layout, whilst later chapters go on to cover noise and mismatch, and analysis and design of the basic building blocks of analog circuits, such as current mirrors, voltage references, voltage amplifiers, and operational amplifiers. An introduction to continuous-time filters is also provided, as are the basic principles of sampled-data circuits, especially switched-capacitor circuits. The final chapter then reviews MOSFET models and describes techniques to extract design parameters. With numerous design examples and exercises also included, this is ideal for students taking analog CMOS design courses and also for circuit designers who need to shorten the design cycle.

Author : Anonim
Publisher : Unknown
Page : 658 pages
File Size : 40,6 Mb
Release : 2005
Category : Technology & Engineering
ISBN : STANFORD:36105120928333

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Advanced Gate Stack, Source/drain and Channel Engineering for Si-based CMOS by Anonim Pdf

Author : Fred Roozeboom
Publisher : The Electrochemical Society
Page : 488 pages
File Size : 41,9 Mb
Release : 2003
Category : Computers
ISBN : 1566773962

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Advanced Short-time Thermal Processing for Si-based CMOS Devices by Fred Roozeboom Pdf

Author : Hei Wong
Publisher : CRC Press
Page : 248 pages
File Size : 53,9 Mb
Release : 2017-12-19
Category : Technology & Engineering
ISBN : 9781439849606

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Nano-CMOS Gate Dielectric Engineering by Hei Wong Pdf

According to Moore’s Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the gate dielectric thickness will be shrunk to less than half-nanometer oxide equivalent thickness (EOT) to maintain proper operation of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. This comprehensive, up-to-date text covering the physics, materials, devices, and fabrication processes for high-k gate dielectric materials, Nano-CMOS Gate Dielectric Engineering systematically describes how the fundamental electronic structures and other material properties of the transition metals and rare earth metals affect the electrical properties of the dielectric films, the dielectric/silicon and the dielectric/metal gate interfaces, and the resulting device properties. Specific topics include the problems and solutions encountered with high-k material thermal stability, defect density, and poor initial interface with silicon substrate. The text also addresses the essence of thin film deposition, etching, and process integration of high-k materials in an actual CMOS process. Fascinating in both content and approach, Nano-CMOS Gate Dielectric Engineering explains all of the necessary physics in a highly readable manner and supplements this with numerous intuitive illustrations and tables. Covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, this is a perfect reference book for graduate students needing a better understanding of developing technology as well as researchers and engineers needing to get ahead in microelectronic engineering and materials science.

Author : Francis Balestra
Publisher : John Wiley & Sons
Page : 518 pages
File Size : 50,7 Mb
Release : 2013-03-01
Category : Technology & Engineering
ISBN : 9781118622476

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Nanoscale CMOS by Francis Balestra Pdf

This book provides a comprehensive review of the state-of-the-art in the development of new and innovative materials, and of advanced modeling and characterization methods for nanoscale CMOS devices. Leading global industry bodies including the International Technology Roadmap for Semiconductors (ITRS) have created a forecast of performance improvements that will be delivered in the foreseeable future – in the form of a roadmap that will lead to a substantial enlargement in the number of materials, technologies and device architectures used in CMOS devices. This book addresses the field of materials development, which has been the subject of a major research drive aimed at finding new ways to enhance the performance of semiconductor technologies. It covers three areas that will each have a dramatic impact on the development of future CMOS devices: global and local strained and alternative materials for high speed channels on bulk substrate and insulator; very low access resistance; and various high dielectric constant gate stacks for power scaling. The book also provides information on the most appropriate modeling and simulation methods for electrical properties of advanced MOSFETs, including ballistic transport, gate leakage, atomistic simulation, and compact models for single and multi-gate devices, nanowire and carbon-based FETs. Finally, the book presents an in-depth investigation of the main nanocharacterization techniques that can be used for an accurate determination of transport parameters, interface defects, channel strain as well as RF properties, including capacitance-conductance, improved split C-V, magnetoresistance, charge pumping, low frequency noise, and Raman spectroscopy.

Author : Fred Roozeboom
Publisher : The Electrochemical Society
Page : 472 pages
File Size : 48,6 Mb
Release : 2006
Category : Gate array circuits
ISBN : 9781566775021

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Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2 by Fred Roozeboom Pdf

These proceedings describe processing, materials, and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.

Author : Ban P. Wong,Anurag Mittal,Greg W. Starr,Franz Zach,Victor Moroz,Andrew Kahng
Publisher : John Wiley & Sons
Page : 408 pages
File Size : 40,6 Mb
Release : 2008-12-29
Category : Technology & Engineering
ISBN : 9780470382813

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Nano-CMOS Design for Manufacturability by Ban P. Wong,Anurag Mittal,Greg W. Starr,Franz Zach,Victor Moroz,Andrew Kahng Pdf

Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.

Author : Anonim
Publisher : Unknown
Page : 668 pages
File Size : 51,5 Mb
Release : 1991
Category : Patents
ISBN : PSU:000066179634

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Official Gazette of the United States Patent and Trademark Office by Anonim Pdf

Author : Tsu-Jae King Liu,Kelin Kuhn
Publisher : Cambridge University Press
Page : 439 pages
File Size : 52,9 Mb
Release : 2015-02-05
Category : Computers
ISBN : 9781107043183

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CMOS and Beyond by Tsu-Jae King Liu,Kelin Kuhn Pdf

Get up to speed with the future of logic switch design with this indispensable introduction to post-CMOS technologies.