Thin Films Structure And Morphology Volume 441

Author : Steven C. Moss
Publisher : Unknown
Page : 904 pages
File Size : 51,6 Mb
Release : 1997-07-29
Category : Technology & Engineering
ISBN : UOM:39015041286850

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Thin Films - Structure and Morphology: Volume 441 by Steven C. Moss Pdf

An interdisciplinary group of materials scientists, physicists, chemists and engineers come together in this book to discuss recent advances in the structure and morphology of thin films. Both scientific and technological issues are addressed. Work on thin films for a host of applications including microelectronics, optics, tribology, biomedical technologies and microelectromechanical systems (MEMS) are featured. Topics include: kinetics of growth; grain growth; instabilities, segregation and ordering; silicides; metallization; stresses in thin films; deposition and growth simulations; energetic growth processes; diamond films and carbide and nitride films.

Author : Frank Smith
Publisher : CRC Press
Page : 1026 pages
File Size : 45,8 Mb
Release : 1999-09-22
Category : Science
ISBN : 9780824719920

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Industrial Applications of X-Ray Diffraction by Frank Smith Pdf

By illustrating a wide range of specific applications in all major industries, this work broadens the coverage of X-ray diffraction beyond basic tenets, research and academic principles. The book serves as a guide to solving problems faced everyday in the laboratory, and offers a review of the current theory and practice of X-ray diffraction, major advances and potential uses.

Author : B. G. Demczyk
Publisher : Unknown
Page : 696 pages
File Size : 41,8 Mb
Release : 1995-07-18
Category : Technology & Engineering
ISBN : UOM:39015034420599

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Evolution of Thin-Film and Surface Structure and Morphology: Volume 355 by B. G. Demczyk Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Author : Anonim
Publisher : Unknown
Page : 516 pages
File Size : 44,7 Mb
Release : 1997
Category : Thin films
ISBN : UOM:39015040329081

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Polycrystalline Thin Films : Structure, Texture, Properties, and Applications by Anonim Pdf

Author : Anonim
Publisher : Unknown
Page : 448 pages
File Size : 45,7 Mb
Release : 1997
Category : Dielectrics
ISBN : UOM:39015040327275

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Epitaxial Oxide Thin Films by Anonim Pdf

Author : James Tobin
Publisher : Unknown
Page : 664 pages
File Size : 43,6 Mb
Release : 1997-11-24
Category : Science
ISBN : UOM:39015041534523

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Magnetic Ultrathin Films, Multilayers, and Surfaces-1997: Volume 475 by James Tobin Pdf

Proceedings of the March 1997 symposium, the central thrust being the relationship of magnetic properties and device performance to structure at the atomic, nanometer, and submicron length scales in these systems of reduced dimensionality. The 89 contributions cover the following topics: synthesis, processing, and characterization; novel applications and approaches for magnetism; nano-microstructure and magnetic properties; structure and properties--mixing, strain, and steps; nanoscale magnetic confinement, particles, and arrays; magnetization reversal and domain structure; synthesis and characterization; synchrotron radiation studies of magnetic materials; magneto-optical properties, effects, and measurements; magnetic phenomena; CMR and tunneling; and interlayer coupling and spin polarization. Annotation copyrighted by Book News, Inc., Portland, OR

Author : Wendi Zhang
Publisher : Forschungszentrum Jülich
Page : 215 pages
File Size : 48,8 Mb
Release : 2013
Category : Electronic
ISBN : 9783893368648

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Ion Beam Treatment of Functional Layers in Thin-film Silicon Solar Cells by Wendi Zhang Pdf

Author : George Michael Dougherty
Publisher : Unknown
Page : 668 pages
File Size : 51,8 Mb
Release : 2002
Category : Electronic
ISBN : UCAL:C3490040

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Ultrasonic Microdevices for Integrated On-chip Biological Sample Processing by George Michael Dougherty Pdf

Author : Robert M. Briber,Charles C. Han,Dennis G. Peiffer
Publisher : Unknown
Page : 264 pages
File Size : 51,9 Mb
Release : 1997-06-10
Category : Science
ISBN : UOM:39015041058507

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Morphological Control in Multiphase Polymer Mixtures: Volume 461 by Robert M. Briber,Charles C. Han,Dennis G. Peiffer Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Author : Carlye Case
Publisher : Unknown
Page : 320 pages
File Size : 50,5 Mb
Release : 1997
Category : Technology & Engineering
ISBN : UCSD:31822025890468

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Low-Dielectric Constant Materials III: Volume 476 by Carlye Case Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Author : Ron Fulks
Publisher : Unknown
Page : 360 pages
File Size : 54,8 Mb
Release : 1997-09-10
Category : Technology & Engineering
ISBN : UCSD:31822025648460

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Flat Panel Display Materials III: Volume 471 by Ron Fulks Pdf

Flat-panel displays are rapidly becoming the displays of choice for a variety of information-displaying applications ranging from laptop computers to automobile and cockpit read-out devices. Passive matrix liquid-crystal displays, and more recently, active matrix liquid-crystal displays (AMLCDs) have led the way in the display revolution. In addition, emissive displays based on field emission, electroluminescence, and plasma charge are attracting considerable interest. Ultimately, however, the advancement in flat-panel display applications will be driven by cost and performance advantages which are dependent on the advancement of materials and process technologies used to fabricate the displays. This book focuses on the materials and large-area processes used by the various display technologies, both emissive and nonemissive, including liquid-crystal, electroluminescent, plasma, field-emission, and micromechanical displays. Topics include: AMLCD materials and processes; thin-film transistors for AMLCDs; emissive displays and materials and phosphor materials.

Author : Richard Lee Sutherland,Richard Sutherland
Publisher : Unknown
Page : 358 pages
File Size : 46,7 Mb
Release : 1997-12-30
Category : Technology & Engineering
ISBN : UCSD:31822025780669

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Materials for Optical Limiting II: Volume 479 by Richard Lee Sutherland,Richard Sutherland Pdf

The proliferation of lasers and systems employing lasers has brought with it the potential for adverse effects from these bright, coherent light sources. This includes the possibility of damage from pulsed lasers, as well as temporary blinding by continuous-waver lasers. With nearly every wavelength possible being emitted by these sources, there exists a need to develop optical limiters and tunable filters which can suppress undesired radiation of any wavelength. This book addresses a number of materials and devices which have the potential for meeting the challenge. The proceedings is divided into five parts. Parts I and II cover research in organic and inorganic materials primarily based on nonlinear absorption or phase transitions for optical limiting of pulsed lasers. Part III includes photo-refractive materials and liquid crystals which find primary applications in dynamic filters. Part IV covers various aspects of device and material characterization, including nonlinear beam propagation effects. Theoretical modelling of materials properties is the subject of Part V.

Author : J. Joseph Clement
Publisher : Unknown
Page : 488 pages
File Size : 50,6 Mb
Release : 1997-10-20
Category : Technology & Engineering
ISBN : UCSD:31822025650011

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Materials Reliability in Microelectronics VII: Volume 473 by J. Joseph Clement Pdf

The inexorable drive for increased integrated circuit functionality and performance places growing demands on the metal and dielectric thin films used in fabricating these circuits, as well as spurring demand for new materials applications and processes. This book directly addresses issues of widespread concern in the microelectronics industry - smaller feature sizes, new materials and new applications that challenge the reliability of new technologies. While the book continues the focus on issues related to interconnect reliability, such as electromigration and stress, particular emphasis is placed on the effects of microstructure. An underlying theme is understanding the importance of interactions among different materials and associated interfaces comprising a single structure with dimensions near or below the micrometer scale. Topics include: adhesion and fracture; gate oxide growth and oxide interfaces; surface preparation and gate oxide reliability; oxide degradation and defects; micro-structure, texture and reliability; novel measurement techniques; interconnect performance and reliability modeling; electromigration and interconnect reliability and stress and stress relaxation.

Author : C. R. Abernathy,H. Amano,J. C. Zolper
Publisher : Materials Research Society
Page : 534 pages
File Size : 40,7 Mb
Release : 1997-08-13
Category : Technology & Engineering
ISBN : 155899372X

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Gallium Nitride and Related Materials II: Volume 468 by C. R. Abernathy,H. Amano,J. C. Zolper Pdf

This book from MRS dedicated to III-Nitrides, focuses on developments in AlN, GaN, InN and their alloys that are now finding application in short-wavelength lasers (~400nm, cw at room temperature) and high-power electronics (2.8W/mm at GHz). Experts from fields including crystal growth, condensed matter theory, source chemistry, device processing and device design come together in the volume to address issues of both scientific and technological relevance. And while much of the book reports on advances in material preparation and the understanding of defect issues, similar advances in material and device processing are also reported. Topics include: growth and doping; substrates and substrate effects; characterization; processing and device performance and design.

Author : Gregg S. Hagashi
Publisher : Unknown
Page : 576 pages
File Size : 44,5 Mb
Release : 1997-09-30
Category : Technology & Engineering
ISBN : UOM:39015041542492

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Science and Technology of Semiconductor Surface Preparation: Volume 477 by Gregg S. Hagashi Pdf

The focus of semiconductor wafer processing is rapidly changing. Pure device performance is no longer sufficient to ensure a technology's success as IC chips approach 1GB. Yield, reliability, cost and manufacturability are principal drivers of the industry. Great strides have been made in understanding the science and impact of front-end (pre-metal) chemical surface preparations and are beginning to influence the 'real' technology and its evolution. Efforts in understanding particle and metals removal, along with Si surface etching and microroughness are prime examples of areas where work is beginning to pay off together with processes related to the back-end (post-metal). The focus of this book is to report new findings and to discuss surface preparation with an emphasis on gaining a mechanistic understanding of the underlying science upon which the technology is based. Topics include: megasonic cleaning; SC1 technology; surface preparation and gate oxide reliability; CMP/CMP cleaning; post-etch processing; surface microroughness; wet chemical cleaning and gate oxide integrity; analytical studies of surfaces; wet chemical cleaning/etching; dry wafer cleaning; and environmentally friendly processing.