High Permittivity Gate Dielectric Materials

Author : Samares Kar
Publisher : Springer Science & Business Media
Page : 515 pages
File Size : 45,5 Mb
Release : 2013-06-25
Category : Technology & Engineering
ISBN : 9783642365355

Get Book

High Permittivity Gate Dielectric Materials by Samares Kar Pdf

"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .

Author : S. Kar
Publisher : The Electrochemical Society
Page : 550 pages
File Size : 41,7 Mb
Release : 2008-10
Category : Dielectrics
ISBN : 9781566776516

Get Book

Physics and Technology of High-k Gate Dielectrics 6 by S. Kar Pdf

The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 676 pages
File Size : 54,6 Mb
Release : 2007
Category : Dielectrics
ISBN : 9781566775700

Get Book

Physics and Technology of High-k Gate Dielectrics 5 by Samares Kar Pdf

This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

Author : Michel Houssa
Publisher : CRC Press
Page : 614 pages
File Size : 42,6 Mb
Release : 2003-12-01
Category : Science
ISBN : 9781420034141

Get Book

High k Gate Dielectrics by Michel Houssa Pdf

The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ

Author : Niladri Pratap Maity,Reshmi Maity,Srimanta Baishya
Publisher : CRC Press
Page : 248 pages
File Size : 44,6 Mb
Release : 2020-12-18
Category : Science
ISBN : 9781000527445

Get Book

High-k Gate Dielectric Materials by Niladri Pratap Maity,Reshmi Maity,Srimanta Baishya Pdf

This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 565 pages
File Size : 40,5 Mb
Release : 2006
Category : Dielectrics
ISBN : 9781566775038

Get Book

Physics and Technology of High-k Gate Dielectrics 4 by Samares Kar Pdf

This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

Author : Gang He,Zhaoqi Sun
Publisher : John Wiley & Sons
Page : 560 pages
File Size : 53,5 Mb
Release : 2012-08-10
Category : Technology & Engineering
ISBN : 9783527646364

Get Book

High-k Gate Dielectrics for CMOS Technology by Gang He,Zhaoqi Sun Pdf

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Author : Mikhail Baklanov,Karen Maex,Martin Green
Publisher : John Wiley & Sons
Page : 508 pages
File Size : 54,5 Mb
Release : 2007-04-04
Category : Technology & Engineering
ISBN : 9780470065419

Get Book

Dielectric Films for Advanced Microelectronics by Mikhail Baklanov,Karen Maex,Martin Green Pdf

The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.

Author : Samares Kar
Publisher : Unknown
Page : 330 pages
File Size : 55,5 Mb
Release : 2003
Category : Science
ISBN : UOM:39015061155555

Get Book

Physics and Technology of High-k Gate Dielectrics I by Samares Kar Pdf

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 0 pages
File Size : 52,5 Mb
Release : 2009-09
Category : Dielectrics
ISBN : 1566777437

Get Book

Physics and Technology of High-k Gate Dielectrics 7 by Samares Kar Pdf

This issue of ECS Transactions covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility channels, work function and flat-band voltage control, novel and higher permittivity dielectric materials, interface issues, gate stack reliability, DRAM, non-volatile memories, and exploratory applications.

Author : Howard Huff,David Gilmer
Publisher : Springer Science & Business Media
Page : 710 pages
File Size : 55,7 Mb
Release : 2006-03-30
Category : Technology & Engineering
ISBN : 9783540264620

Get Book

High Dielectric Constant Materials by Howard Huff,David Gilmer Pdf

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.

Author : Alexander A. Demkov,Alexandra Navrotsky
Publisher : Springer Science & Business Media
Page : 477 pages
File Size : 47,9 Mb
Release : 2006-05-24
Category : Science
ISBN : 9781402030789

Get Book

Materials Fundamentals of Gate Dielectrics by Alexander A. Demkov,Alexandra Navrotsky Pdf

This book presents materials fundamentals of novel gate dielectrics that are being introduced into semiconductor manufacturing to ensure the continuous scalling of the CMOS devices. This is a very fast evolving field of research so we choose to focus on the basic understanding of the structure, thermodunamics, and electronic properties of these materials that determine their performance in device applications. Most of these materials are transition metal oxides. Ironically, the d-orbitals responsible for the high dielectric constant cause sever integration difficulties thus intrinsically limiting high-k dielectrics. Though new in the electronics industry many of these materials are wel known in the field of ceramics, and we describe this unique connection. The complexity of the structure-property relations in TM oxides makes the use of the state of the art first-principles calculations necessary. Several chapters give a detailed description of the modern theory of polarization, and heterojunction band discontinuity within the framework of the density functional theory. Experimental methods include oxide melt solution calorimetry and differential scanning calorimetry, Raman scattering and other optical characterization techniques, transmission electron microscopy, and x-ray photoelectron spectroscopy. Many of the problems encounterd in the world of CMOS are also relvant for other semiconductors such as GaAs. A comprehensive review of recent developments in this field is thus also given. The book should be of interest to those actively engaged in the gate dielectric research, and to graduate students in Materials Science, Materials Physics, Materials Chemistry, and Electrical Engineering.

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 512 pages
File Size : 51,9 Mb
Release : 2004
Category : Dielectrics
ISBN : 1566774055

Get Book

Physics and Technology of High-k Gate Dielectrics II by Samares Kar Pdf

"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.

Author : Mark J. Lododa
Publisher : The Electrochemical Society
Page : 262 pages
File Size : 44,6 Mb
Release : 2000
Category : Dielectric devices
ISBN : 1566772702

Get Book

Low and High Dielectric Constant Materials by Mark J. Lododa Pdf

Contains papers from a May 2000 symposium, representing the state of the art in areas of dielectric materials science and process integration. Papers are arranged in sections on low and high dielectric constant materials, covering topics such as ammonia plasma passivation effects on properties of post-CMP low-k HSQ, characterization of ashing effects on low-k dielectric films, and electron beam curing of thin film polymer dielectrics. Other subjects include characterization of high-k dielectrics using the non-contact surface charge profiler method, and processing effects and electrical evaluation of ZrO2 formed by RTP oxidation of Zr. Loboda is affiliated with Dow Corning Corporation. c. Book News Inc.

Author : Rajendra Singh
Publisher : The Electrochemical Society
Page : 242 pages
File Size : 40,6 Mb
Release : 2000
Category : Dielectric devices
ISBN : 156677229X

Get Book

Low and High Dielectric Constant Materials by Rajendra Singh Pdf