Materials Fundamentals Of Gate Dielectrics

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Materials Fundamentals of Gate Dielectrics

Author : Alexander A. Demkov,Alexandra Navrotsky
Publisher : Springer Science & Business Media
Page : 477 pages
File Size : 42,5 Mb
Release : 2006-05-24
Category : Science
ISBN : 9781402030789

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Materials Fundamentals of Gate Dielectrics by Alexander A. Demkov,Alexandra Navrotsky Pdf

This book presents materials fundamentals of novel gate dielectrics that are being introduced into semiconductor manufacturing to ensure the continuous scalling of the CMOS devices. This is a very fast evolving field of research so we choose to focus on the basic understanding of the structure, thermodunamics, and electronic properties of these materials that determine their performance in device applications. Most of these materials are transition metal oxides. Ironically, the d-orbitals responsible for the high dielectric constant cause sever integration difficulties thus intrinsically limiting high-k dielectrics. Though new in the electronics industry many of these materials are wel known in the field of ceramics, and we describe this unique connection. The complexity of the structure-property relations in TM oxides makes the use of the state of the art first-principles calculations necessary. Several chapters give a detailed description of the modern theory of polarization, and heterojunction band discontinuity within the framework of the density functional theory. Experimental methods include oxide melt solution calorimetry and differential scanning calorimetry, Raman scattering and other optical characterization techniques, transmission electron microscopy, and x-ray photoelectron spectroscopy. Many of the problems encounterd in the world of CMOS are also relvant for other semiconductors such as GaAs. A comprehensive review of recent developments in this field is thus also given. The book should be of interest to those actively engaged in the gate dielectric research, and to graduate students in Materials Science, Materials Physics, Materials Chemistry, and Electrical Engineering.

High-k Gate Dielectric Materials

Author : Niladri Pratap Maity,Reshmi Maity,Srimanta Baishya
Publisher : CRC Press
Page : 248 pages
File Size : 51,5 Mb
Release : 2020-12-18
Category : Science
ISBN : 9781000527445

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High-k Gate Dielectric Materials by Niladri Pratap Maity,Reshmi Maity,Srimanta Baishya Pdf

This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

High Permittivity Gate Dielectric Materials

Author : Samares Kar
Publisher : Springer Science & Business Media
Page : 515 pages
File Size : 55,9 Mb
Release : 2013-06-25
Category : Technology & Engineering
ISBN : 9783642365355

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High Permittivity Gate Dielectric Materials by Samares Kar Pdf

"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .

Thin Film Metal-Oxides

Author : Shriram Ramanathan
Publisher : Springer Science & Business Media
Page : 337 pages
File Size : 50,7 Mb
Release : 2009-12-03
Category : Technology & Engineering
ISBN : 9781441906649

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Thin Film Metal-Oxides by Shriram Ramanathan Pdf

Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.

High-k Gate Dielectric Materials

Author : Niladri Pratap Maity,Reshmi Maity,Srimanta Baishya
Publisher : CRC Press
Page : 246 pages
File Size : 48,7 Mb
Release : 2020-12-18
Category : Science
ISBN : 9781000517767

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High-k Gate Dielectric Materials by Niladri Pratap Maity,Reshmi Maity,Srimanta Baishya Pdf

This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

High k Gate Dielectrics

Author : Michel Houssa
Publisher : CRC Press
Page : 460 pages
File Size : 45,6 Mb
Release : 2003-12-01
Category : Science
ISBN : 9781000687248

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High k Gate Dielectrics by Michel Houssa Pdf

The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ

Physics and Technology of High-k Gate Dielectrics 4

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 565 pages
File Size : 44,7 Mb
Release : 2006
Category : Dielectrics
ISBN : 9781566775038

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Physics and Technology of High-k Gate Dielectrics 4 by Samares Kar Pdf

This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

Physics and Technology of High-k Gate Dielectrics 6

Author : S. Kar
Publisher : The Electrochemical Society
Page : 550 pages
File Size : 42,7 Mb
Release : 2008-10
Category : Dielectrics
ISBN : 9781566776516

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Physics and Technology of High-k Gate Dielectrics 6 by S. Kar Pdf

The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

High-k Gate Dielectrics for CMOS Technology

Author : Gang He,Zhaoqi Sun
Publisher : John Wiley & Sons
Page : 0 pages
File Size : 49,9 Mb
Release : 2012-10-15
Category : Technology & Engineering
ISBN : 3527330321

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High-k Gate Dielectrics for CMOS Technology by Gang He,Zhaoqi Sun Pdf

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Physics and Technology of High-k Gate Dielectrics 5

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 676 pages
File Size : 41,5 Mb
Release : 2007
Category : Dielectrics
ISBN : 9781566775700

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Physics and Technology of High-k Gate Dielectrics 5 by Samares Kar Pdf

This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

High Dielectric Constant Materials

Author : Howard Huff
Publisher : Springer Science & Business Media
Page : 740 pages
File Size : 52,8 Mb
Release : 2005
Category : Science
ISBN : 3540210814

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High Dielectric Constant Materials by Howard Huff Pdf

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.

Reliability of high-k / metal gate field-effect transistors considering circuit operational constraints

Author : Steve Kupke
Publisher : BoD – Books on Demand
Page : 125 pages
File Size : 46,5 Mb
Release : 2016-06-06
Category : Technology & Engineering
ISBN : 9783741208690

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Reliability of high-k / metal gate field-effect transistors considering circuit operational constraints by Steve Kupke Pdf

After many decades, the scaling of silicon dioxide based field-effect transistors has reached insurmountable physical limits due unintentional high gate leakage currents for gate oxide thicknesses below 2 nm. The introduction of high-k metal gate stacks guaranteed the trend towards smaller transistor dimensions. The implementation of HfO2, as high-k dielectric, also lead to a substantial number of manufacturing and reliability challenges. The deterioration of the gate oxide properties under thermal and electric stress jeopardizes the circuit operation and hence needs to be comprehensively understood. As a starting point, 6T static random access memory cells were used to identify the different single device operating conditions. The strongest deterioration of the gate stack was found for nMOS devices under positive bias temperature instability (PBTI) stress, resulting in a severe threshold voltage shift and increased gate leakage current. A detailed investigation of physical origin and temperature and voltage dependency was done. The reliability issues were caused by the electron trapping into already existing HfO2 oxygen vacancies. The oxygen vacancies reside in different charge states depending on applied stress voltages. This in return also resulted in a strong threshold voltage and gate current relaxation after stress was cut off. The reliability assessment using constant voltage stress does not reflect realistic circuit operation which can result in a changed degradation behaviour. Therefore, the constant voltage stress measurement were extended by considering CMOS operational constraints, where it was found that the supply voltage frequently switches between the gate and drain terminal. The additional drain (off-state) bias lead to an increased Vt relaxation in comparison to zero bias voltage. The off-state influence strongly depended on the gate length and became significant for short channel devices. The influence of the off-state bias on the dielectric breakdown was studied and compared to the standard assessment methods. Different wear-out mechanisms for drain-only and alternating gate and drain stress were verified. Under drain-only stress, the dielectric breakdown was caused by hot carrier degradation. The lifetime was correlated with the device length and amount of subthreshold leakage. The gate oxide breakdown under alternating gate and o-state stress was caused by the continuous trapping and detrapping behaviour of high-k metal gate devices.

Dielectric Polymer Nanocomposites

Author : J. Keith Nelson
Publisher : Springer Science & Business Media
Page : 374 pages
File Size : 55,9 Mb
Release : 2009-12-17
Category : Technology & Engineering
ISBN : 9781441915917

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Dielectric Polymer Nanocomposites by J. Keith Nelson Pdf

Dielectric Polymer Nanocomposites provides the first in-depth discussion of nano-dielectrics, an emerging and fast moving topic in electrical insulation. The text begins with an overview of the background, principles and promise of nanodielectrics, followed by a discussion of the processing of nanocomposites and then proceeds with special considerations of clay based processes, mechanical, thermal and electric properties and surface properties as well as erosion resistance. Carbon nanotubes are discussed as a means of creation of non linear conductivity, the text concludes with a industrial applications perspective.

In Situ Characterization of Thin Film Growth

Author : Gertjan Koster,Guus Rijnders
Publisher : Elsevier
Page : 296 pages
File Size : 45,5 Mb
Release : 2011-10-05
Category : Technology & Engineering
ISBN : 9780857094957

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In Situ Characterization of Thin Film Growth by Gertjan Koster,Guus Rijnders Pdf

Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques