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Author : D Cox
Publisher : Myprint
Page : 84 pages
File Size : 48,8 Mb
Release : 2015-10-12
Category : Electronic
ISBN : 1681747936
Author : David C. Cox
Publisher : Morgan & Claypool Publishers
Page : 83 pages
File Size : 41,5 Mb
Release : 2015-10-01
Category : Technology & Engineering
ISBN : 9781681740843
This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.
Author : David Christopher Cox
Publisher : Unknown
Page : 128 pages
File Size : 46,6 Mb
Release : 2015
Category : TECHNOLOGY & ENGINEERING
ISBN : 1681742128
This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.
Author : Lucille A. Giannuzzi,North Carolina State University
Publisher : Springer Science & Business Media
Page : 362 pages
File Size : 46,5 Mb
Release : 2006-05-18
Category : Science
ISBN : 9780387233130
Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.
Author : Richard Leach
Publisher : Elsevier
Page : 384 pages
File Size : 54,6 Mb
Release : 2014-05-17
Category : Science
ISBN : 9781455777501
Working at the nano-scale demands an understanding of the high-precision measurement techniques that make nanotechnology and advanced manufacturing possible. Richard Leach introduces these techniques to a broad audience of engineers and scientists involved in nanotechnology and manufacturing applications and research. He also provides a routemap and toolkit for metrologists engaging with the rigor of measurement and data analysis at the nano-scale. Starting from the fundamentals of precision measurement, the author progresses into different measurement and characterization techniques. The focus on nanometrology in engineering contexts makes this book an essential guide for the emerging nanomanufacturing / nanofabrication sector, where measurement and standardization requirements are paramount both in product specification and quality assurance. This book provides engineers and scientists with the methods and understanding needed to design and produce high-performance, long-lived products while ensuring that compliance and public health requirements are met. Updated to cover new and emerging technologies, and recent developments in standards and regulatory frameworks, this second edition includes many new sections, e.g. new technologies in scanning probe and e-beam microscopy, recent developments in interferometry and advances in co-ordinate metrology. Demystifies nanometrology for a wide audience of engineers, scientists, and students involved in nanotech and advanced manufacturing applications and research Introduces metrologists to the specific techniques and equipment involved in measuring at the nano-scale or to nano-scale uncertainty Fully updated to cover the latest technological developments, standards, and regulations
Author : Ivo Utke,Stanislav Moshkalev,Phillip Russell
Publisher : OUP USA
Page : 830 pages
File Size : 43,6 Mb
Release : 2012-05
Category : Technology & Engineering
ISBN : 9780199734214
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Author : Nan Yao
Publisher : Unknown
Page : 395 pages
File Size : 55,8 Mb
Release : 2007
Category : Focused ion beams
ISBN : 1107316359
The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
Author : Jon Orloff,Lynwood Swanson,Mark Utlaut
Publisher : Springer Science & Business Media
Page : 304 pages
File Size : 54,6 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781461507659
In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.
Author : Nan Yao
Publisher : Unknown
Page : 395 pages
File Size : 52,5 Mb
Release : 2007
Category : Focused ion beams
ISBN : 1107316359
The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
Author : Vlad Stolojan
Publisher : Morgan & Claypool Publishers
Page : 69 pages
File Size : 43,6 Mb
Release : 2015-10-12
Category : Technology & Engineering
ISBN : 9781681741208
The Transmission Electron Microscope (TEM) is the ultimate tool to see and measure structures on the nanoscale and to probe their elemental composition and electronic structure with sub-nanometer spatial resolution. Recent technological breakthroughs have revolutionized our understanding of materials via use of the TEM, and it promises to become a significant tool in understanding biological and biomolecular systems such as viruses and DNA molecules. This book is a practical guide for scientists who need to use the TEM as a tool to answer questions about physical and chemical phenomena on the nanoscale.
Author : Yongqi Fu
Publisher : Bentham Science Publishers
Page : 214 pages
File Size : 43,9 Mb
Release : 2010-04-21
Category : Science
ISBN : 9781608050505
"From the beginning of this century, there has been a dramatic increase in interest in the study of surface plasmon polaritons-based metallic subwavelength structures and learning. This is a refreshing concise book on issues and considerations in designing"
Author : P. D. Prewett,G. L. R. Mair
Publisher : John Wiley & Sons
Page : 354 pages
File Size : 42,6 Mb
Release : 1991-10-02
Category : Science
ISBN : UOM:39015025256523
Provides an up-to-date review and analysis of liquid metal ion sources and their applications. The contents range from a discussion of the fundamental physics underlying operation of the liquid metal ion sources, through the technical details of their construction and manufacture to their performance characteristics. Their use in focused ion beam systems is covered in detail, including a discussion of the fundamentals of ion optical focusing column design and the various microengineering applications.
Author : David J. Whitehouse
Publisher : CRC Press
Page : 982 pages
File Size : 55,6 Mb
Release : 2002-12-01
Category : Science
ISBN : 9781420034196
The Handbook of Surface and Nanometrology explains and challenges current concepts in nanotechnology. It covers in great detail surface metrology and nanometrology and more importantly the areas where they overlap, thereby providing a quantitative means of controlling and predicting processes and performance. Trends and mechanisms are explained wit
Author : Anonim
Publisher : Elsevier
Page : 634 pages
File Size : 41,7 Mb
Release : 2016-11-08
Category : Technology & Engineering
ISBN : 9780081003589
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author : Christophe Gorecki,Anand Asundi
Publisher : SPIE-International Society for Optical Engineering
Page : 316 pages
File Size : 46,6 Mb
Release : 2004
Category : Technology & Engineering
ISBN : UOM:39015059127004
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
