Laser Annealing Processes In Semiconductor Technology

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Laser Annealing Processes in Semiconductor Technology

Author : Fuccio Cristiano,Antonino La Magna
Publisher : Woodhead Publishing
Page : 426 pages
File Size : 47,9 Mb
Release : 2021-04-21
Category : Technology & Engineering
ISBN : 9780128202562

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Laser Annealing Processes in Semiconductor Technology by Fuccio Cristiano,Antonino La Magna Pdf

Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

Laser Annealing of Semiconductors

Author : J Poate
Publisher : Elsevier
Page : 576 pages
File Size : 53,7 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9780323145428

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Laser Annealing of Semiconductors by J Poate Pdf

Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.

Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9

Author : F. Roozeboom,P. J. Timans,K. Kakushima,E. Gusev,Z. Karim,D. Misra,Y. S. Obeng,S. De Gendt,H. Jagannathan
Publisher : The Electrochemical Society
Page : 176 pages
File Size : 47,7 Mb
Release : 2019-05-17
Category : Science
ISBN : 9781607688686

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Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9 by F. Roozeboom,P. J. Timans,K. Kakushima,E. Gusev,Z. Karim,D. Misra,Y. S. Obeng,S. De Gendt,H. Jagannathan Pdf

This issue of ECS Transactions includes papers based on presentations from the symposium "Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 9," originally held at the 235th ECS Meeting in Dallas, Texas, May 26-30, 2019.

Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 8

Author : F. Roozeboom,P.J. Timans,K. Kakushima,H. Jagannathan,Z. Karim,E. P. Gusev,S. De Gendt
Publisher : The Electrochemical Society
Page : 188 pages
File Size : 54,9 Mb
Release : 2018-05-04
Category : Science
ISBN : 9781607688341

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Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 8 by F. Roozeboom,P.J. Timans,K. Kakushima,H. Jagannathan,Z. Karim,E. P. Gusev,S. De Gendt Pdf

Thin Films

Author : Dongfang Yang,Katherine Gibson
Publisher : BoD – Books on Demand
Page : 224 pages
File Size : 51,5 Mb
Release : 2023-03-29
Category : Technology & Engineering
ISBN : 9781803564555

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Thin Films by Dongfang Yang,Katherine Gibson Pdf

A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, chemical, mechanical and thermal properties. Through ten chapters consisting of original research studies and literature reviews written by experts from the international scientific community, this book covers the deposition and application of thin films.

Semiconductor Technology (ISTC 2001)

Author : Ming Yang
Publisher : Unknown
Page : 688 pages
File Size : 53,8 Mb
Release : 2001
Category : Semiconductors
ISBN : UCAL:C3785029

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Semiconductor Technology (ISTC 2001) by Ming Yang Pdf

Advances in Laser Materials Processing

Author : J. R. Lawrence
Publisher : Woodhead Publishing
Page : 802 pages
File Size : 48,7 Mb
Release : 2017-09-20
Category : Technology & Engineering
ISBN : 9780081012536

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Advances in Laser Materials Processing by J. R. Lawrence Pdf

Advances in Laser Materials Processing: Technology, Research and Application, Second Edition, provides a revised, updated and expanded overview of the area, covering fundamental theory, technology and methods, traditional and emerging applications and potential future directions. The book begins with an overview of the technology and challenges to applying the technology in manufacturing. Parts Two thru Seven focus on essential techniques and process, including cutting, welding, annealing, hardening and peening, surface treatments, coating and materials deposition. The final part of the book considers the mathematical modeling and control of laser processes. Throughout, chapters review the scientific theory underpinning applications, offer full appraisals of the processes described and review potential future trends. A comprehensive practitioner guide and reference work explaining state-of-the-art laser processing technologies in manufacturing and other disciplines Explores challenges, potential, and future directions through the continuous development of new, application-specific lasers in materials processing Provides revised, expanded and updated coverage

Ion Implantation in Semiconductors 1976

Author : Fred Chernow
Publisher : Springer Science & Business Media
Page : 733 pages
File Size : 50,8 Mb
Release : 2012-12-06
Category : Science
ISBN : 9781461341963

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Ion Implantation in Semiconductors 1976 by Fred Chernow Pdf

The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976. Papers were delivered by scientists and engineers from 15 countries, and the attendees represented 19 countries. As has become the custom at these conferences, the sessions were intense with the coffee breaks and evenings given to informal meetings among the participants. It was a time to renew old friendships, begin new ones, exchange ideas, personally question authors of papers that appeared in the literature since the last conference and find out what was generally happening in Ion Implantation. In recent years it has beome more difficult to get funding to travel to such meetings. To assist the participating authors financial aid was solicited from industry and the Office of Naval Research. We are most grateful for their positive response to our requests. The success of the conference was in part due to their generous contributions. The Program Committee had the unhappy task of the reviewing of more than 170 abstracts. The result of their labors was well worth their effort. Much thanks goes to them for molding the conference into an accurate representation of activities in the field. Behind the scenes in Boulder, local arrangements were handled ably by Graeme Eldridge. The difficulty of this task cannot be overemphasized. Our thanks to him for a job well done.

Cohesive Properties of Semiconductors under Laser Irradiation

Author : L.D. Laude
Publisher : Springer Science & Business Media
Page : 631 pages
File Size : 50,5 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9789400968905

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Cohesive Properties of Semiconductors under Laser Irradiation by L.D. Laude Pdf

The impact of Materials Science in our environment has probably never been as massive and decisive as it is today. In every aspect of our lives, progress has never been so dependent on the techniques involved in producing ever more sophisticated materials in ever larger quantities, nor so demanding for technologists to imagine novel processes and circumvent difficulties, or take up new challenges. Every technique is based on a physical process which is put into practice and optimized. The better we know that process, the better the optimization, and more powerful the technique. Laser processing of materials is inscribed in that context. As soon as powerful coherent light sources were made available, it was realized that such intense sources of energy could be used to "heat, melt and crystallize" materials, i.e., to promote phase transitions in atomic systems. As early as 1964, attempts in that direction were made but received very little (if any) attention. Reasons for this lack of interest were several. For one thing, laser technology was not fully developed, so that the process offered poor reliability and no versatility. Also, improving the existing techniques was believed to be sufficient to meet the needs of the time, and there was no real motivation to explore new ways. Finally, and more important, the fundamentals of the physics behind the scenes were, and continue to be, way out of the runni~g stream.

Laser-Assisted Microtechnology

Author : Simeon M. Metev,Vadim P. Veiko
Publisher : Springer Science & Business Media
Page : 283 pages
File Size : 48,8 Mb
Release : 2013-03-09
Category : Technology & Engineering
ISBN : 9783642872716

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Laser-Assisted Microtechnology by Simeon M. Metev,Vadim P. Veiko Pdf

Laser-Assisted Microtechnology introduces the principles and techniques of laser-assisted microtechnology with emphasis on micromachining of thin films, microprocessing of materials, maskless laser micropatterning and laser-assisted synthesis of thin-film systems. The experimental and theoretical physico-chemical basis of every technological process is presented in detail. On the basis of some characteristic examples of applications, the capabilities of the technological methods as well as the optimum conditions for their realization are discussed. In this second edition, besides the actualization of the literature, a new chapter concerning the laser-assisted wet chemical micro etching, has been added. This is a new method for direct 3D-micro structuring of solids, with a number of potential applications.

ULSI Process Integration 5

Author : Cor L. Claeys
Publisher : The Electrochemical Society
Page : 509 pages
File Size : 48,8 Mb
Release : 2007
Category : Integrated circuits
ISBN : 9781566775724

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ULSI Process Integration 5 by Cor L. Claeys Pdf

The symposium provided a forum for reviewing and discussing all aspects of process integration, with special focus on nanoscaled technologies, 65 nm and beyond on DRAM, SRAM, flash memory, high density logic-low power, RF, mixed analog-digital, process integration yield, CMP chemistries, low-k processes, gate stacks, metal gates, rapid thermal processing, silicides, copper interconnects, carbon nanotubes, novel materials, high mobility substrates (SOI, sSi, SiGe, GeOI), strain engineering, and hybrid integration.

Laser and Electron Beam Processing of Materials

Author : C.W. White
Publisher : Elsevier
Page : 788 pages
File Size : 52,6 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9780323142533

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Laser and Electron Beam Processing of Materials by C.W. White Pdf

Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.

Rapid Thermal and Other Short-time Processing Technologies II

Author : Dim-Lee Kwong,Electrochemical Society. Electronics Division,Electrochemical Society. Dielectric Science and Technology Division,Electrochemical Society. High Temperature Materials Divisions
Publisher : The Electrochemical Society
Page : 458 pages
File Size : 40,9 Mb
Release : 2001
Category : Technology & Engineering
ISBN : 1566773156

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Rapid Thermal and Other Short-time Processing Technologies II by Dim-Lee Kwong,Electrochemical Society. Electronics Division,Electrochemical Society. Dielectric Science and Technology Division,Electrochemical Society. High Temperature Materials Divisions Pdf

"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."

Nanoelectronics

Author : Robert Puers,Livio Baldi,Marcel Van de Voorde,Sebastiaan E. van Nooten
Publisher : John Wiley & Sons
Page : 600 pages
File Size : 51,6 Mb
Release : 2017-04-11
Category : Technology & Engineering
ISBN : 9783527800711

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Nanoelectronics by Robert Puers,Livio Baldi,Marcel Van de Voorde,Sebastiaan E. van Nooten Pdf

Offering first-hand insights by top scientists and industry experts at the forefront of R&D into nanoelectronics, this book neatly links the underlying technological principles with present and future applications. A brief introduction is followed by an overview of present and emerging logic devices, memories and power technologies. Specific chapters are dedicated to the enabling factors, such as new materials, characterization techniques, smart manufacturing and advanced circuit design. The second part of the book provides detailed coverage of the current state and showcases real future applications in a wide range of fields: safety, transport, medicine, environment, manufacturing, and social life, including an analysis of emerging trends in the internet of things and cyber-physical systems. A survey of main economic factors and trends concludes the book. Highlighting the importance of nanoelectronics in the core fields of communication and information technology, this is essential reading for materials scientists, electronics and electrical engineers, as well as those working in the semiconductor and sensor industries.