Rapid Thermal And Other Short Time Processing Technologies Ii

Author : Dim-Lee Kwong,Electrochemical Society. Electronics Division,Electrochemical Society. Dielectric Science and Technology Division,Electrochemical Society. High Temperature Materials Divisions
Publisher : The Electrochemical Society
Page : 458 pages
File Size : 55,7 Mb
Release : 2001
Category : Technology & Engineering
ISBN : 1566773156

Get Book

Rapid Thermal and Other Short-time Processing Technologies II by Dim-Lee Kwong,Electrochemical Society. Electronics Division,Electrochemical Society. Dielectric Science and Technology Division,Electrochemical Society. High Temperature Materials Divisions Pdf

"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."

Author : Paul J. Timans
Publisher : The Electrochemical Society
Page : 500 pages
File Size : 51,7 Mb
Release : 2002
Category : Technology & Engineering
ISBN : 1566773342

Get Book

Rapid Thermal and Other Short-time Processing Technologies III by Paul J. Timans Pdf

Author : Fred Roozeboom
Publisher : The Electrochemical Society
Page : 482 pages
File Size : 53,9 Mb
Release : 2000
Category : Technology & Engineering
ISBN : 1566772745

Get Book

Rapid Thermal and Other Short-time Processing Technologies by Fred Roozeboom Pdf

The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.

Author : Mehmet C. Öztürk,Fred Roozeboom
Publisher : The Electrochemical Society
Page : 444 pages
File Size : 43,6 Mb
Release : 2004
Category : Technology & Engineering
ISBN : 1566774063

Get Book

Advanced Short-time Thermal Processing for Si-based CMOS Devices 2 by Mehmet C. Öztürk,Fred Roozeboom Pdf

Author : Yoshio Nishi,Robert Doering
Publisher : CRC Press
Page : 1720 pages
File Size : 50,6 Mb
Release : 2017-12-19
Category : Technology & Engineering
ISBN : 9781420017663

Get Book

Handbook of Semiconductor Manufacturing Technology by Yoshio Nishi,Robert Doering Pdf

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Author : David Louis Harame
Publisher : The Electrochemical Society
Page : 1242 pages
File Size : 49,8 Mb
Release : 2004
Category : Science
ISBN : 1566774209

Get Book

SiGe--materials, Processing, and Devices by David Louis Harame Pdf

Author : Fuccio Cristiano,Antonino La Magna
Publisher : Woodhead Publishing
Page : 426 pages
File Size : 51,7 Mb
Release : 2021-04-21
Category : Technology & Engineering
ISBN : 9780128202562

Get Book

Laser Annealing Processes in Semiconductor Technology by Fuccio Cristiano,Antonino La Magna Pdf

Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors

Author : Electrochemical Society. Meeting
Publisher : The Electrochemical Society
Page : 620 pages
File Size : 43,6 Mb
Release : 2003
Category : Technology & Engineering
ISBN : 1566773768

Get Book

ULSI Process Integration III by Electrochemical Society. Meeting Pdf

Author : Cor L. Claeys,Electrochemical Society. Meeting
Publisher : The Electrochemical Society
Page : 636 pages
File Size : 42,8 Mb
Release : 2001
Category : Technology & Engineering
ISBN : 1566773083

Get Book

ULSI Process Integration II by Cor L. Claeys,Electrochemical Society. Meeting Pdf

Author : G. S. Mathad
Publisher : Unknown
Page : 342 pages
File Size : 53,7 Mb
Release : 2002
Category : Technology & Engineering
ISBN : 1566773415

Get Book

Plasma Processing XIV by G. S. Mathad Pdf

Author : Bernd Schmidt,Klaus Wetzig
Publisher : Springer Science & Business Media
Page : 425 pages
File Size : 41,6 Mb
Release : 2012-12-13
Category : Technology & Engineering
ISBN : 9783211993569

Get Book

Ion Beams in Materials Processing and Analysis by Bernd Schmidt,Klaus Wetzig Pdf

A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

Author : H. Fukuda
Publisher : Elsevier
Page : 160 pages
File Size : 43,6 Mb
Release : 2003-04-02
Category : Science
ISBN : 0080540260

Get Book

Rapid Thermal Processing for Future Semiconductor Devices by H. Fukuda Pdf

This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices. This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.

Author : Electrochemical Society. Meeting
Publisher : Unknown
Page : 1172 pages
File Size : 53,6 Mb
Release : 1999
Category : Electrochemistry
ISBN : UCSD:31822023001506

Get Book

Meeting Abstracts by Electrochemical Society. Meeting Pdf

Author : Anonim
Publisher : Unknown
Page : 1238 pages
File Size : 40,9 Mb
Release : 2004
Category : Heat
ISBN : STANFORD:36105115216850

Get Book

Journal of Thermophysics and Heat Transfer by Anonim Pdf

This journal is devoted to the advancement of the science and technology of thermophysics and heat transfer through the dissemination of original research papers disclosing new technical knowledge and exploratory developments and applications based on new knowledge. It publishes papers that deal with the properties and mechanisms involved in thermal energy transfer and storage in gases, liquids, and solids or combinations thereof. These studies include conductive, convective, and radiative modes alone or in combination and the effects of the environment.

Author : Anonim
Publisher : Unknown
Page : 516 pages
File Size : 45,8 Mb
Release : 1991
Category : Semiconductor lasers
ISBN : STANFORD:36105030653567

Get Book

Laser Diode Technology and Applications by Anonim Pdf