Nanophase And Nanocomposite Materials Ii Volume 457

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Nanophase and Nanocomposite Materials II: Volume 457

Author : Sridhar Komarneni,John C. Parker,Heinrich J. Wollenberger
Publisher : Unknown
Page : 584 pages
File Size : 41,9 Mb
Release : 1997-04-22
Category : Science
ISBN : UCSD:31822023737174

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Nanophase and Nanocomposite Materials II: Volume 457 by Sridhar Komarneni,John C. Parker,Heinrich J. Wollenberger Pdf

This book provides an international and interdisciplinary forum for the discussion of advances in the research of nanophase and nanocomposites. The term 'nanophase' refers to nanoscale particles of one phase, whereas the term 'nanocomposite'refers to a composite of more than one Gibbsian solid phase where at least one dimension is in the nanometer range. The book, the second in a series, features reports showing that bulk materials with nanostructure (‹ 0.5µm) often have enhanced and unique properties when compared to their coarse-structured (›1µm) equivalents. A wide range of science and engineering disciplines are represented, with topics ranging from synthesis and processing, to properties and applications. Topics include: nanophase oxides; nanophase metals, alloys and non-oxides; nanophases - simulation studies; magnetic and metal nanocomposites; oxide, non-oxide and oxide-metal nanocomposites; organic-inorganic and sol-gel nanocomposites; and nanocomposites of layered and mesoporous materials.

Thermoset Nanocomposites for Engineering Applications

Author : Rumiana Kotsilkova
Publisher : iSmithers Rapra Publishing
Page : 352 pages
File Size : 52,5 Mb
Release : 2007
Category : Science
ISBN : 1847350631

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Thermoset Nanocomposites for Engineering Applications by Rumiana Kotsilkova Pdf

Thermoset nanocomposites represent a new technology solution. These new formulations benefit from improved dimensional/thermal stability, flame retardancy and chemical resistance; and have potential applications in marine, industrial and construction markets.This book helps to answer questions related to the design of nanocomposites by controlling the processing technology and structure. The book is addressed not only to researchers and engineers who actively work in the broad field of nanocomposite technology, but also to newcomers and students who have just started investigations in this mul.

Nanophase and Nanocomposite Materials

Author : Anonim
Publisher : Unknown
Page : 584 pages
File Size : 54,6 Mb
Release : 1997
Category : Composite materials
ISBN : UOM:39015040999099

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Nanophase and Nanocomposite Materials by Anonim Pdf

Gallium Nitride and Related Materials II: Volume 468

Author : C. R. Abernathy,H. Amano,J. C. Zolper
Publisher : Materials Research Society
Page : 534 pages
File Size : 51,9 Mb
Release : 1997-08-13
Category : Technology & Engineering
ISBN : 155899372X

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Gallium Nitride and Related Materials II: Volume 468 by C. R. Abernathy,H. Amano,J. C. Zolper Pdf

This book from MRS dedicated to III-Nitrides, focuses on developments in AlN, GaN, InN and their alloys that are now finding application in short-wavelength lasers (~400nm, cw at room temperature) and high-power electronics (2.8W/mm at GHz). Experts from fields including crystal growth, condensed matter theory, source chemistry, device processing and device design come together in the volume to address issues of both scientific and technological relevance. And while much of the book reports on advances in material preparation and the understanding of defect issues, similar advances in material and device processing are also reported. Topics include: growth and doping; substrates and substrate effects; characterization; processing and device performance and design.

Low-Dielectric Constant Materials II: Volume 443

Author : André Lagendijk
Publisher : Unknown
Page : 224 pages
File Size : 43,8 Mb
Release : 1997-08-19
Category : Technology & Engineering
ISBN : UCSD:31822025647280

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Low-Dielectric Constant Materials II: Volume 443 by André Lagendijk Pdf

Low-dielectric constant materials are needed to improve the performance and speed of future integrated circuits. In fact, the diversity of contributors to this book is testimony to the global significance of the topic to the future of semiconductor manufacturing. Presentations include those by semiconductor equipment manufacturers and chemical source suppliers, academia from six countries, four government laboratories and five major device manufacturers. Approaches to designing and implementing reduction in dielectric constant for intermetal dielectric materials are featured and range from the evolution of silicon dioxide to fluorinated silicate glass, to the use of inorganic/organic polymers and spin-on-material, to fluorinated diamond-like carbon and nanoporous silica. The book also addresses the practical aspects of the use of low-dielectric constant materials such as chemical mechanical polishing of these materials and optimization of wiring delays in devices utilizing low-k material.

Defects in Electronic Materials II: Volume 442

Author : Jürgen Michel
Publisher : Unknown
Page : 744 pages
File Size : 49,5 Mb
Release : 1997-05-02
Category : Technology & Engineering
ISBN : UOM:39015040692652

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Defects in Electronic Materials II: Volume 442 by Jürgen Michel Pdf

The pervasive role of defects in determining the thermal, mechanical, electrical, optical and magnetic properties of materials is significant as is the knowledge and operation of generation and control of defects in electronic materials. Developing novel semiconductor materials, however, requires new insights into the role of defects to achieve new properties. New experimental techniques must be developed to study defects in small structures. Research groups come together in this book from MRS to provide a vivid picture of the current problems, progress and methods in defect studies in electronic materials. Topics include new techniques in defect studies; processing induced defects, plasma-induced point defects; processing induced defects -defects and gate-oxide integrity; point defects and reaction; point defects and interactions in Si; impurity diffusion and hydrogen in Si; dislocations in group IV semiconductors; point defects and defect interactions in SiGe; point defects in III-V compounds; compensation and structural defects in III-V compounds and layers and structures.

Materials for Optical Limiting II: Volume 479

Author : Richard Lee Sutherland,Richard Sutherland
Publisher : Unknown
Page : 358 pages
File Size : 47,6 Mb
Release : 1997-12-30
Category : Technology & Engineering
ISBN : UCSD:31822025780669

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Materials for Optical Limiting II: Volume 479 by Richard Lee Sutherland,Richard Sutherland Pdf

The proliferation of lasers and systems employing lasers has brought with it the potential for adverse effects from these bright, coherent light sources. This includes the possibility of damage from pulsed lasers, as well as temporary blinding by continuous-waver lasers. With nearly every wavelength possible being emitted by these sources, there exists a need to develop optical limiters and tunable filters which can suppress undesired radiation of any wavelength. This book addresses a number of materials and devices which have the potential for meeting the challenge. The proceedings is divided into five parts. Parts I and II cover research in organic and inorganic materials primarily based on nonlinear absorption or phase transitions for optical limiting of pulsed lasers. Part III includes photo-refractive materials and liquid crystals which find primary applications in dynamic filters. Part IV covers various aspects of device and material characterization, including nonlinear beam propagation effects. Theoretical modelling of materials properties is the subject of Part V.

Nanophase and Nanocomposite Materials IV: Volume 703

Author : Sridhar Komarneni
Publisher : Unknown
Page : 624 pages
File Size : 48,8 Mb
Release : 2002-04
Category : Technology & Engineering
ISBN : UCSD:31822031649379

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Nanophase and Nanocomposite Materials IV: Volume 703 by Sridhar Komarneni Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Low-Dielectric Constant Materials III: Volume 476

Author : Carlye Case
Publisher : Unknown
Page : 320 pages
File Size : 48,6 Mb
Release : 1997
Category : Technology & Engineering
ISBN : UCSD:31822025890468

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Low-Dielectric Constant Materials III: Volume 476 by Carlye Case Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Flat Panel Display Materials III: Volume 471

Author : Ron Fulks
Publisher : Unknown
Page : 360 pages
File Size : 48,7 Mb
Release : 1997-09-10
Category : Technology & Engineering
ISBN : UCSD:31822025648460

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Flat Panel Display Materials III: Volume 471 by Ron Fulks Pdf

Flat-panel displays are rapidly becoming the displays of choice for a variety of information-displaying applications ranging from laptop computers to automobile and cockpit read-out devices. Passive matrix liquid-crystal displays, and more recently, active matrix liquid-crystal displays (AMLCDs) have led the way in the display revolution. In addition, emissive displays based on field emission, electroluminescence, and plasma charge are attracting considerable interest. Ultimately, however, the advancement in flat-panel display applications will be driven by cost and performance advantages which are dependent on the advancement of materials and process technologies used to fabricate the displays. This book focuses on the materials and large-area processes used by the various display technologies, both emissive and nonemissive, including liquid-crystal, electroluminescent, plasma, field-emission, and micromechanical displays. Topics include: AMLCD materials and processes; thin-film transistors for AMLCDs; emissive displays and materials and phosphor materials.

Materials Reliability in Microelectronics VII: Volume 473

Author : J. Joseph Clement
Publisher : Unknown
Page : 488 pages
File Size : 52,8 Mb
Release : 1997-10-20
Category : Technology & Engineering
ISBN : UCSD:31822025650011

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Materials Reliability in Microelectronics VII: Volume 473 by J. Joseph Clement Pdf

The inexorable drive for increased integrated circuit functionality and performance places growing demands on the metal and dielectric thin films used in fabricating these circuits, as well as spurring demand for new materials applications and processes. This book directly addresses issues of widespread concern in the microelectronics industry - smaller feature sizes, new materials and new applications that challenge the reliability of new technologies. While the book continues the focus on issues related to interconnect reliability, such as electromigration and stress, particular emphasis is placed on the effects of microstructure. An underlying theme is understanding the importance of interactions among different materials and associated interfaces comprising a single structure with dimensions near or below the micrometer scale. Topics include: adhesion and fracture; gate oxide growth and oxide interfaces; surface preparation and gate oxide reliability; oxide degradation and defects; micro-structure, texture and reliability; novel measurement techniques; interconnect performance and reliability modeling; electromigration and interconnect reliability and stress and stress relaxation.

Thermoelectric Materials

Author : Anonim
Publisher : Unknown
Page : 374 pages
File Size : 48,7 Mb
Release : 1997
Category : Electric power production
ISBN : UOM:39015041368179

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Thermoelectric Materials by Anonim Pdf

Thermoelectric Materials

Author : Terry M. Tritt
Publisher : Unknown
Page : 376 pages
File Size : 55,6 Mb
Release : 1997
Category : Thermoelectric materials
ISBN : UCSD:31822025647637

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Thermoelectric Materials by Terry M. Tritt Pdf

Thermoelectric materials are utilized in a wide variety of applications related to solid-state refrigeration or small-scale power generation. More specifically, these applications range from beverage coolers to power generation for deep-space probes such as the Voyager missions. Over the past several years, however, research in the field of thermoelectric materials has been undergoing a rapid rebirth. The enhanced interest in better thermoelectric materials has been driven by the need for much higher performance and new temperature regimes in thermoelectric devices. The focus of this volume is embodied in the title, New Directions and Approaches. The volume emphasizes the multidisciplinary nature of the research needed to advance the science and technology. Theoretical studies in materials design, which provide guidance to the experimentalist, are reviewed. Experimental efforts are also featured and include new capabilities in solid-state synthesis, thin-film and superlattice development, and new developments in property measurement of which thermal conductivity will play a central role. New ideas in device design are also discussed.

Science and Technology of Semiconductor Surface Preparation: Volume 477

Author : Gregg S. Hagashi
Publisher : Unknown
Page : 576 pages
File Size : 45,7 Mb
Release : 1997-09-30
Category : Technology & Engineering
ISBN : UOM:39015041542492

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Science and Technology of Semiconductor Surface Preparation: Volume 477 by Gregg S. Hagashi Pdf

The focus of semiconductor wafer processing is rapidly changing. Pure device performance is no longer sufficient to ensure a technology's success as IC chips approach 1GB. Yield, reliability, cost and manufacturability are principal drivers of the industry. Great strides have been made in understanding the science and impact of front-end (pre-metal) chemical surface preparations and are beginning to influence the 'real' technology and its evolution. Efforts in understanding particle and metals removal, along with Si surface etching and microroughness are prime examples of areas where work is beginning to pay off together with processes related to the back-end (post-metal). The focus of this book is to report new findings and to discuss surface preparation with an emphasis on gaining a mechanistic understanding of the underlying science upon which the technology is based. Topics include: megasonic cleaning; SC1 technology; surface preparation and gate oxide reliability; CMP/CMP cleaning; post-etch processing; surface microroughness; wet chemical cleaning and gate oxide integrity; analytical studies of surfaces; wet chemical cleaning/etching; dry wafer cleaning; and environmentally friendly processing.

Magnetic Ultrathin Films, Multilayers, and Surfaces-1997: Volume 475

Author : James Tobin
Publisher : Unknown
Page : 664 pages
File Size : 45,5 Mb
Release : 1997-11-24
Category : Science
ISBN : UOM:39015041534523

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Magnetic Ultrathin Films, Multilayers, and Surfaces-1997: Volume 475 by James Tobin Pdf

Proceedings of the March 1997 symposium, the central thrust being the relationship of magnetic properties and device performance to structure at the atomic, nanometer, and submicron length scales in these systems of reduced dimensionality. The 89 contributions cover the following topics: synthesis, processing, and characterization; novel applications and approaches for magnetism; nano-microstructure and magnetic properties; structure and properties--mixing, strain, and steps; nanoscale magnetic confinement, particles, and arrays; magnetization reversal and domain structure; synthesis and characterization; synchrotron radiation studies of magnetic materials; magneto-optical properties, effects, and measurements; magnetic phenomena; CMR and tunneling; and interlayer coupling and spin polarization. Annotation copyrighted by Book News, Inc., Portland, OR