Low Dielectric Constant Materials Ii Volume 443

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Low-Dielectric Constant Materials II: Volume 443

Author : André Lagendijk
Publisher : Unknown
Page : 224 pages
File Size : 41,8 Mb
Release : 1997-08-19
Category : Technology & Engineering
ISBN : UCSD:31822025647280

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Low-Dielectric Constant Materials II: Volume 443 by André Lagendijk Pdf

Low-dielectric constant materials are needed to improve the performance and speed of future integrated circuits. In fact, the diversity of contributors to this book is testimony to the global significance of the topic to the future of semiconductor manufacturing. Presentations include those by semiconductor equipment manufacturers and chemical source suppliers, academia from six countries, four government laboratories and five major device manufacturers. Approaches to designing and implementing reduction in dielectric constant for intermetal dielectric materials are featured and range from the evolution of silicon dioxide to fluorinated silicate glass, to the use of inorganic/organic polymers and spin-on-material, to fluorinated diamond-like carbon and nanoporous silica. The book also addresses the practical aspects of the use of low-dielectric constant materials such as chemical mechanical polishing of these materials and optimization of wiring delays in devices utilizing low-k material.

Interlayer Dielectrics for Semiconductor Technologies

Author : Shyam P Muraka,Moshe Eizenberg,Ashok K Sinha
Publisher : Elsevier
Page : 464 pages
File Size : 53,7 Mb
Release : 2003-10-13
Category : Science
ISBN : 0080521959

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Interlayer Dielectrics for Semiconductor Technologies by Shyam P Muraka,Moshe Eizenberg,Ashok K Sinha Pdf

Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges. Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package. * Brings together for the FIRST time the science and technology of interlayer deilectrics materials, in one volume * written by renowned experts in the field * Provides an up-to-date starting point in this young research field.

Proceedings of the Symposia on Electrochemical Processing in ULSI Fabrication I

Author : Electrochemical Society. Dielectric Science and Technology Division,Electrochemical Society. Electrodeposition Division,Electrochemical Society. Meeting
Publisher : Unknown
Page : 290 pages
File Size : 46,6 Mb
Release : 1999
Category : Science
ISBN : UOM:39015057617741

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Proceedings of the Symposia on Electrochemical Processing in ULSI Fabrication I by Electrochemical Society. Dielectric Science and Technology Division,Electrochemical Society. Electrodeposition Division,Electrochemical Society. Meeting Pdf

Low-Dielectric Constant Materials III: Volume 476

Author : Carlye Case
Publisher : Unknown
Page : 320 pages
File Size : 40,8 Mb
Release : 1997
Category : Technology & Engineering
ISBN : UCSD:31822025890468

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Low-Dielectric Constant Materials III: Volume 476 by Carlye Case Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Low-dielectric Constant Materials

Author : Anonim
Publisher : Unknown
Page : 408 pages
File Size : 45,8 Mb
Release : 1998
Category : Electric insulators and insulation
ISBN : UOM:39015047335412

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Low-dielectric Constant Materials by Anonim Pdf

Gallium Nitride and Related Materials II: Volume 468

Author : C. R. Abernathy,H. Amano,J. C. Zolper
Publisher : Materials Research Society
Page : 534 pages
File Size : 44,7 Mb
Release : 1997-08-13
Category : Technology & Engineering
ISBN : 155899372X

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Gallium Nitride and Related Materials II: Volume 468 by C. R. Abernathy,H. Amano,J. C. Zolper Pdf

This book from MRS dedicated to III-Nitrides, focuses on developments in AlN, GaN, InN and their alloys that are now finding application in short-wavelength lasers (~400nm, cw at room temperature) and high-power electronics (2.8W/mm at GHz). Experts from fields including crystal growth, condensed matter theory, source chemistry, device processing and device design come together in the volume to address issues of both scientific and technological relevance. And while much of the book reports on advances in material preparation and the understanding of defect issues, similar advances in material and device processing are also reported. Topics include: growth and doping; substrates and substrate effects; characterization; processing and device performance and design.

Three-Dimensional Integrated Circuit Design

Author : Vasilis F. Pavlidis,Ioannis Savidis,Eby G. Friedman
Publisher : Newnes
Page : 768 pages
File Size : 42,5 Mb
Release : 2017-07-04
Category : Technology & Engineering
ISBN : 9780124104846

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Three-Dimensional Integrated Circuit Design by Vasilis F. Pavlidis,Ioannis Savidis,Eby G. Friedman Pdf

Three-Dimensional Integrated Circuit Design, Second Eition, expands the original with more than twice as much new content, adding the latest developments in circuit models, temperature considerations, power management, memory issues, and heterogeneous integration. 3-D IC experts Pavlidis, Savidis, and Friedman cover the full product development cycle throughout the book, emphasizing not only physical design, but also algorithms and system-level considerations to increase speed while conserving energy. A handy, comprehensive reference or a practical design guide, this book provides effective solutions to specific challenging problems concerning the design of three-dimensional integrated circuits. Expanded with new chapters and updates throughout based on the latest research in 3-D integration: Manufacturing techniques for 3-D ICs with TSVs Electrical modeling and closed-form expressions of through silicon vias Substrate noise coupling in heterogeneous 3-D ICs Design of 3-D ICs with inductive links Synchronization in 3-D ICs Variation effects on 3-D ICs Correlation of WID variations for intra-tier buffers and wires Offers practical guidance on designing 3-D heterogeneous systems Provides power delivery of 3-D ICs Demonstrates the use of 3-D ICs within heterogeneous systems that include a variety of materials, devices, processors, GPU-CPU integration, and more Provides experimental case studies in power delivery, synchronization, and thermal characterization

Materials for Optical Limiting II: Volume 479

Author : Richard Lee Sutherland,Richard Sutherland
Publisher : Unknown
Page : 358 pages
File Size : 44,6 Mb
Release : 1997-12-30
Category : Technology & Engineering
ISBN : UCSD:31822025780669

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Materials for Optical Limiting II: Volume 479 by Richard Lee Sutherland,Richard Sutherland Pdf

The proliferation of lasers and systems employing lasers has brought with it the potential for adverse effects from these bright, coherent light sources. This includes the possibility of damage from pulsed lasers, as well as temporary blinding by continuous-waver lasers. With nearly every wavelength possible being emitted by these sources, there exists a need to develop optical limiters and tunable filters which can suppress undesired radiation of any wavelength. This book addresses a number of materials and devices which have the potential for meeting the challenge. The proceedings is divided into five parts. Parts I and II cover research in organic and inorganic materials primarily based on nonlinear absorption or phase transitions for optical limiting of pulsed lasers. Part III includes photo-refractive materials and liquid crystals which find primary applications in dynamic filters. Part IV covers various aspects of device and material characterization, including nonlinear beam propagation effects. Theoretical modelling of materials properties is the subject of Part V.

Low and High Dielectric Constant Materials

Author : Rajendra Singh
Publisher : The Electrochemical Society
Page : 242 pages
File Size : 45,6 Mb
Release : 2000
Category : Technology & Engineering
ISBN : 156677229X

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Low and High Dielectric Constant Materials by Rajendra Singh Pdf

Advanced Interconnects and Contacts: Volume 564

Author : Daniel C. Edelstein
Publisher : Unknown
Page : 606 pages
File Size : 52,6 Mb
Release : 1999-10-07
Category : Technology & Engineering
ISBN : UOM:39015042090459

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Advanced Interconnects and Contacts: Volume 564 by Daniel C. Edelstein Pdf

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Flat Panel Display Materials III: Volume 471

Author : Ron Fulks
Publisher : Unknown
Page : 360 pages
File Size : 43,6 Mb
Release : 1997-09-10
Category : Technology & Engineering
ISBN : UCSD:31822025648460

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Flat Panel Display Materials III: Volume 471 by Ron Fulks Pdf

Flat-panel displays are rapidly becoming the displays of choice for a variety of information-displaying applications ranging from laptop computers to automobile and cockpit read-out devices. Passive matrix liquid-crystal displays, and more recently, active matrix liquid-crystal displays (AMLCDs) have led the way in the display revolution. In addition, emissive displays based on field emission, electroluminescence, and plasma charge are attracting considerable interest. Ultimately, however, the advancement in flat-panel display applications will be driven by cost and performance advantages which are dependent on the advancement of materials and process technologies used to fabricate the displays. This book focuses on the materials and large-area processes used by the various display technologies, both emissive and nonemissive, including liquid-crystal, electroluminescent, plasma, field-emission, and micromechanical displays. Topics include: AMLCD materials and processes; thin-film transistors for AMLCDs; emissive displays and materials and phosphor materials.

Materials Reliability in Microelectronics VII: Volume 473

Author : J. Joseph Clement
Publisher : Unknown
Page : 488 pages
File Size : 44,5 Mb
Release : 1997-10-20
Category : Technology & Engineering
ISBN : UCSD:31822025650011

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Materials Reliability in Microelectronics VII: Volume 473 by J. Joseph Clement Pdf

The inexorable drive for increased integrated circuit functionality and performance places growing demands on the metal and dielectric thin films used in fabricating these circuits, as well as spurring demand for new materials applications and processes. This book directly addresses issues of widespread concern in the microelectronics industry - smaller feature sizes, new materials and new applications that challenge the reliability of new technologies. While the book continues the focus on issues related to interconnect reliability, such as electromigration and stress, particular emphasis is placed on the effects of microstructure. An underlying theme is understanding the importance of interactions among different materials and associated interfaces comprising a single structure with dimensions near or below the micrometer scale. Topics include: adhesion and fracture; gate oxide growth and oxide interfaces; surface preparation and gate oxide reliability; oxide degradation and defects; micro-structure, texture and reliability; novel measurement techniques; interconnect performance and reliability modeling; electromigration and interconnect reliability and stress and stress relaxation.