Physics And Technology Of High K Materials 8

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 621 pages
File Size : 54,8 Mb
Release : 2010-10
Category : Science
ISBN : 9781566778220

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Physics and Technology of High-k Materials 8 by Samares Kar Pdf

The issue of ECS Transactions will cover comprehensively all the aspects of high-k material physics and technology: Diverse High Mobility Substrates, High-k Materials, Metal Gate Electrode Materials, Deposition Techniques, Bulk Material Properties, Flat-Band Voltage Issues and Control, Interfaces, Gate Stack Reliability, Electrical, Chemical, and Physical Chatracterization, Novel Applications, High-k and Diverse Insulators for Photonics, High-k Processing/ Manufacturing.

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 565 pages
File Size : 43,8 Mb
Release : 2006
Category : Dielectrics
ISBN : 9781566775038

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Physics and Technology of High-k Gate Dielectrics 4 by Samares Kar Pdf

This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

Author : Anonim
Publisher : Unknown
Page : 605 pages
File Size : 52,8 Mb
Release : 2010
Category : Electronic
ISBN : 1607681722

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Physics and Technology of High-k Materials 8 by Anonim Pdf

Author : S. Kar
Publisher : The Electrochemical Society
Page : 550 pages
File Size : 51,7 Mb
Release : 2008-10
Category : Dielectrics
ISBN : 9781566776516

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Physics and Technology of High-k Gate Dielectrics 6 by S. Kar Pdf

The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

Author : S. Kar,M. Houssa,S. Van Elshocht,D. Misra,K. Kita
Publisher : The Electrochemical Society
Page : 504 pages
File Size : 50,8 Mb
Release : 2011
Category : Electronic
ISBN : 9781607682578

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Physics and Technology of High-k Materials 9 by S. Kar,M. Houssa,S. Van Elshocht,D. Misra,K. Kita Pdf

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 512 pages
File Size : 42,6 Mb
Release : 2004
Category : Science
ISBN : 1566774055

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Physics and Technology of High-k Gate Dielectrics II by Samares Kar Pdf

"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.

Author : S. Kar,M. Houssa,S. Van Elshocht,D. Misra,K. Kita,D. Landheer,S. Dayeh,H. Jagannathan
Publisher : The Electrochemical Society
Page : 203 pages
File Size : 43,5 Mb
Release : 2014
Category : Electronic
ISBN : 9781607685456

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Semiconductors, Dielectrics, and Metals for Nanoelectronics 12 by S. Kar,M. Houssa,S. Van Elshocht,D. Misra,K. Kita,D. Landheer,S. Dayeh,H. Jagannathan Pdf

Author : Samares Kar
Publisher : Unknown
Page : 330 pages
File Size : 52,8 Mb
Release : 2003
Category : Science
ISBN : UOM:39015061155555

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Physics and Technology of High-k Gate Dielectrics I by Samares Kar Pdf

Author : D. Misra,S. De Gendt,M. Houssa,K. Kita,D. Landheer
Publisher : The Electrochemical Society
Page : 411 pages
File Size : 46,5 Mb
Release : 2024-06-15
Category : Electronic
ISBN : 9781607688181

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Semiconductors, Dielectrics, and Metals for Nanoelectronics 15: In Memory of Samares Kar by D. Misra,S. De Gendt,M. Houssa,K. Kita,D. Landheer Pdf

Author : Samares Kar
Publisher : The Electrochemical Society
Page : 676 pages
File Size : 41,5 Mb
Release : 2007
Category : Dielectrics
ISBN : 9781566775700

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Physics and Technology of High-k Gate Dielectrics 5 by Samares Kar Pdf

This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

Author : Samares Kar
Publisher : Springer Science & Business Media
Page : 515 pages
File Size : 51,6 Mb
Release : 2013-06-25
Category : Technology & Engineering
ISBN : 9783642365355

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High Permittivity Gate Dielectric Materials by Samares Kar Pdf

"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .

Author : C. Claeys,H. Iwai,M. Tao,S. Deleonibus,J. Murota
Publisher : The Electrochemical Society
Page : 429 pages
File Size : 49,9 Mb
Release : 2011
Category : Electronic
ISBN : 9781607682615

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ULSI Process Integration 7 by C. Claeys,H. Iwai,M. Tao,S. Deleonibus,J. Murota Pdf

Author : Gang He,Zhaoqi Sun
Publisher : John Wiley & Sons
Page : 560 pages
File Size : 53,7 Mb
Release : 2012-08-10
Category : Technology & Engineering
ISBN : 9783527646364

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High-k Gate Dielectrics for CMOS Technology by Gang He,Zhaoqi Sun Pdf

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Author : Niladri Pratap Maity,Reshmi Maity,Srimanta Baishya
Publisher : CRC Press
Page : 248 pages
File Size : 42,8 Mb
Release : 2020-12-18
Category : Science
ISBN : 9781000527445

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High-k Gate Dielectric Materials by Niladri Pratap Maity,Reshmi Maity,Srimanta Baishya Pdf

This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.

Author : Shubham Tayal,Parveen Singla,J. Paulo Davim
Publisher : CRC Press
Page : 176 pages
File Size : 51,8 Mb
Release : 2021-09-16
Category : Technology & Engineering
ISBN : 9781000438789

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High-k Materials in Multi-Gate FET Devices by Shubham Tayal,Parveen Singla,J. Paulo Davim Pdf

High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. It covers the various way of utilizing high-k dielectrics in multi-gate FETs for enhancing their performance at the device as well as circuit level. Provides basic knowledge about FET devices Presents the motivation behind multi-gate FETs, including current and future trends in transistor technologies Discusses fabrication and characterization of high-k materials Contains a comprehensive analysis of the impact of high-k dielectrics utilized in the gate-oxide and the gate-sidewall spacers on the GIDL of emerging multi-gate FET architectures Offers detailed application of high-k materials for advanced FET devices Considers future research directions This book is of value to researchers in materials science, electronics engineering, semiconductor device modeling, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues.