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Proceedings Of The Symposia On Interconnects Contact Metallization And Multilevel Metallization And Reliability For Semiconductor Devices Interconnects And Thin Insulator Materials Book in PDF, ePub and Kindle version is available to download in english. Read online anytime anywhere directly from your device. Click on the download button below to get a free pdf file of Proceedings Of The Symposia On Interconnects Contact Metallization And Multilevel Metallization And Reliability For Semiconductor Devices Interconnects And Thin Insulator Materials book. This book definitely worth reading, it is an incredibly well-written.
Author : T. O. Herndon
Publisher : Unknown
Page : 520 pages
File Size : 42,7 Mb
Release : 1993
Category : Dielectrics
ISBN : UCAL:$B247019
Author : Anonim
Publisher : The Electrochemical Society
Page : 636 pages
File Size : 45,9 Mb
Release : 2000
Category : Technology & Engineering
ISBN : 1566772591
Author : Karen A. Reinhardt,Richard F. Reidy
Publisher : John Wiley & Sons
Page : 596 pages
File Size : 43,7 Mb
Release : 2011-04-12
Category : Technology & Engineering
ISBN : 9781118099513
Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.
Author : Anonim
Publisher : Unknown
Page : 636 pages
File Size : 45,6 Mb
Release : 2000
Category : Semiconductor wafers
ISBN : UOM:39015058889547
Author : Anonim
Publisher : Unknown
Page : 982 pages
File Size : 53,5 Mb
Release : 1994
Category : Conference proceedings
ISBN : STANFORD:36105013127332
Author : Krishna Seshan
Publisher : CRC Press
Page : 72 pages
File Size : 45,9 Mb
Release : 2002-02-01
Category : Science
ISBN : 9781482269680
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Author : Anonim
Publisher : Unknown
Page : 324 pages
File Size : 48,5 Mb
Release : 1995
Category : Integrated circuits
ISBN : UOM:39015034829427
Author : Krishna Seshan
Publisher : William Andrew
Page : 430 pages
File Size : 51,6 Mb
Release : 2001-02-01
Category : Technology & Engineering
ISBN : 9780815517788
New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Author : Zhiqiang Li
Publisher : Unknown
Page : 234 pages
File Size : 42,6 Mb
Release : 2002
Category : Electronic
ISBN : CORNELL:31924095243527
Author : James R. Lloyd
Publisher : Unknown
Page : 214 pages
File Size : 46,5 Mb
Release : 1985
Category : Electrodiffusion
ISBN : PSU:000011177180
Author : American Chemical Society. Chemical Abstracts Service
Publisher : Unknown
Page : 2064 pages
File Size : 41,6 Mb
Release : 1907
Category : Chemistry
ISBN : UOM:39015045488825
A key source to journal and conference abbreviations in the sciences. Although it focuses on chemistry, other scientific and engineering disciplines are also well represented. In addition to the abbreviation and full title, each entry also contains publishing info, title changes, language and frequency of publication, and libraries owning that title. Over 130,000 entries representing more than 70,000 publications dating back to 1907 are included.
Author : Krishna Seshan
Publisher : William Andrew
Page : 408 pages
File Size : 55,9 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781437778748
The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films. A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned ‘Moore’s Law’ relating to the technology development cycle in the semiconductor industry
Author : Anonim
Publisher : Unknown
Page : 3310 pages
File Size : 55,8 Mb
Release : 1997
Category : American literature
ISBN : UOM:39015054057792
Author : Anonim
Publisher : Unknown
Page : 1860 pages
File Size : 42,5 Mb
Release : 1997
Category : Electrical engineering
ISBN : OSU:32435059588608
Author : Anonim
Publisher : Unknown
Page : 776 pages
File Size : 51,9 Mb
Release : 1995
Category : Computers
ISBN : STANFORD:36105016603396
