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Author : Rainer Behrisch,Klaus Wittmaack
Publisher : Unknown
Page : 410 pages
File Size : 54,6 Mb
Release : 1991
Category : Sputtering (Physics)
ISBN : OCLC:760581159
Author : Rainer Behrisch,Klaus Wittmaack
Publisher : Springer
Page : 415 pages
File Size : 44,7 Mb
Release : 2014-03-12
Category : Science
ISBN : 3662311038
Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.
Author : Rainer Behrisch
Publisher : Unknown
Page : 128 pages
File Size : 40,6 Mb
Release : 1981
Category : Solids
ISBN : LCCN:81004313
Author : Michael Nastasi,James W. Mayer,James K. Hirvonen
Publisher : Cambridge University Press
Page : 572 pages
File Size : 50,8 Mb
Release : 1996-03-29
Category : Science
ISBN : 9780521373760
Comprehensive guide to an important materials science technique for students and researchers.
Author : P. Misaelides
Publisher : Springer Science & Business Media
Page : 668 pages
File Size : 54,5 Mb
Release : 2013-03-09
Category : Technology & Engineering
ISBN : 9789401584593
The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and supemard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their qUality. This volume includes most of the lectures and contributions delivered at the NATO-funded Advanced Study Institute "Application of Particle and Laser Beams in Materials Technology", which was held in Kallithea, Chalkidiki, in Northern Greece, from the 8th to the 21st of May, 1994 and attended by 73 participants from 21 countries. The aim of this ASI was to provide to the participants an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale were presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection.
Author : Donald M. Mattox
Publisher : William Andrew
Page : 378 pages
File Size : 44,6 Mb
Release : 2018-08-21
Category : Technology & Engineering
ISBN : 9780128130858
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating
Author : Daniel Lundin,Jon Tomas Gudmundsson,Tiberiu Minea
Publisher : Unknown
Page : 398 pages
File Size : 51,9 Mb
Release : 2019-09-13
Category : Technology & Engineering
ISBN : 9780128124543
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications
Author : Bernd Schmidt,Klaus Wetzig
Publisher : Springer Science & Business Media
Page : 425 pages
File Size : 51,7 Mb
Release : 2012-12-13
Category : Technology & Engineering
ISBN : 9783211993569
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Author : Amit Bandyopadhyay,Susmita Bose
Publisher : Newnes
Page : 450 pages
File Size : 47,9 Mb
Release : 2013-03-12
Category : Technology & Engineering
ISBN : 9780124158634
One of the key challenges current biomaterials researchers face is identifying which of the dizzying number of highly specialized characterization tools can be gainfully applied to different materials and biomedical devices. Since this diverse marketplace of tools and techniques can be used for numerous applications, choosing the proper characterization tool is highly important, saving both time and resources. Characterization of Biomaterials is a detailed and multidisciplinary discussion of the physical, chemical, mechanical, surface, in vitro and in vivo characterization tools and techniques of increasing importance to fundamental biomaterials research. Characterization of Biomaterials will serve as a comprehensive resource for biomaterials researchers requiring detailed information on physical, chemical, mechanical, surface, and in vitro or in vivo characterization. The book is designed for materials scientists, bioengineers, biologists, clinicians and biomedical device researchers seeking input on planning on how to test their novel materials, structures or biomedical devices to a specific application. Chapters are developed considering the need for industrial researchers as well as academics. Biomaterials researchers come from a wide variety of disciplines: this book will help them to analyze their materials and devices taking advantage of the multiple experiences on offer. Coverage encompasses a cross-section of the physical sciences, biological sciences, engineering and applied sciences characterization community, providing gainful and cross-cutting insight into this highly multi-disciplinary field. Detailed coverage of important test protocols presents specific examples and standards for applied characterization
Author : Tetsuo Tanabe
Publisher : Springer Nature
Page : 209 pages
File Size : 45,7 Mb
Release : 2021-03-08
Category : Science
ISBN : 9789811603280
This book is a primer on the interplay between plasma and materials in a fusion reactor, so-called plasma–materials interactions (PMIs), highlighting materials and their influence on plasma through PMI. It aims to demonstrate that a plasma-facing surface (PFS) responds actively to fusion plasma and that the clarifying nature of PFS is indispensable to understanding the influence of PFS on plasma. It describes the modern insight into PMI, namely, relevant feedback to plasma performance from plasma-facing material (PFM) on changes in a material surface by plasma power load by radiation and particles, contrary to a conventional view that unilateral influence from plasma on PFM is dominant in PMI. There are many books and reviews on PMI in the context of plasma physics, that is, how plasma or plasma confinement works in PMI. By contrast, this book features a materials aspect in PMI focusing on changes caused by heat and particle load from plasma: how PFMs are changed by plasma exposure and then, accordingly, how the changed PFM interacts with plasma.
Author : Gordon W. F. Drake
Publisher : Springer Science & Business Media
Page : 1505 pages
File Size : 48,5 Mb
Release : 2007-02-05
Category : Science
ISBN : 9780387263083
Comprises a comprehensive reference source that unifies the entire fields of atomic molecular and optical (AMO) physics, assembling the principal ideas, techniques and results of the field. 92 chapters written by about 120 authors present the principal ideas, techniques and results of the field, together with a guide to the primary research literature (carefully edited to ensure a uniform coverage and style, with extensive cross-references). Along with a summary of key ideas, techniques, and results, many chapters offer diagrams of apparatus, graphs, and tables of data. From atomic spectroscopy to applications in comets, one finds contributions from over 100 authors, all leaders in their respective disciplines. Substantially updated and expanded since the original 1996 edition, it now contains several entirely new chapters covering current areas of great research interest that barely existed in 1996, such as Bose-Einstein condensation, quantum information, and cosmological variations of the fundamental constants. A fully-searchable CD- ROM version of the contents accompanies the handbook.
Author : Michael Nastasi,James W. Mayer
Publisher : Springer Science & Business Media
Page : 271 pages
File Size : 49,5 Mb
Release : 2007-05-16
Category : Science
ISBN : 9783540452980
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Author : Isao Yamada
Publisher : CRC Press
Page : 260 pages
File Size : 44,8 Mb
Release : 2015-08-20
Category : Science
ISBN : 9781498711760
Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f
Author : Huaiyu Wang,Paul K. Chu
Publisher : Elsevier Inc. Chapters
Page : 450 pages
File Size : 46,8 Mb
Release : 2013-03-12
Category : Science
ISBN : 9780128070987
The biomaterials surface, which may only be a few atomic layers thick, constitutes the important interface between the biomaterials and the external biological environment and plays a key role in the chemical and biological actions in vitro and in vivo. Hence, in order to monitor and fathom the biological performance of biomaterials, the surface properties must be well known. Recently, surface modification of biomaterials has attracted considerable attention as selective surface properties such as cytocompatibility can be altered while desirable bulk properties such as mechanical strength can be retained. In this respect, surface characterization techniques are indispensable in this important and burgeoning research area. No single technique can provide all the information, and quite often, different analytical tools are required to address a problem related to biomaterials research. To obtain surface chemical and morphological information, spectroscopic techniques such as X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), secondary ion mass spectroscopy (SIMS), and microscopic methods such as confocal microscopy, scanning electron microscopy, atomic force microscopy (AFM) are typically carried out. Other surface characterization methods such as contact angle (CA) measurement and ellipsometry are also widely used in biomaterials research. It should be emphasized that each technique has its strengths and weaknesses, and complete characterization frequently requires more than one method. In this chapter, we introduce and describe some of the common surface characterization techniques suitable for biomaterials. Initial discussion starts with spectroscopic techniques, their operation principles, and data analysis with specific examples. The discussions related to spectroscopic characterization are focused on XPS, AES, SIMS, surface matrix-assisted laser desorption ionization mass spectrometry (Surface-MALDI-MS), infrared spectroscopy, Raman spectroscopy, electron energy loss spectroscopy and ultraviolet spectroscopy. After spectroscopic characterization techniques, this chapter focuses on microscopic characterization. This part of the chapter is specifically focused on optical, electron and confocal microscopic techniques. Microscopic technique also discusses recent advances in atomic level characterization using scanning tunnelling microscopy and AFM. Finally, the chapter deals with specific surface characterization techniques for morphology with profilometry followed by surface charge measurement using CAs. The last section of the chapter deals with ellipsometry, a specular optical technique which provides unequalled capabilities for thin film metrology. Throughout this chapter, specific discussions are focused on examples based on applications as well as advantages, disadvantages, and challenges.
Author : Rainer Behrisch,Klaus Wittmaack
Publisher : Springer
Page : 440 pages
File Size : 41,5 Mb
Release : 1991-09-10
Category : Science
ISBN : 3540534288
Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.