X Ray Scattering From Semiconductors

Author : Fewster Paul F
Publisher : World Scientific
Page : 512 pages
File Size : 51,5 Mb
Release : 2015-02-12
Category : Technology & Engineering
ISBN : 9789814436946

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X-ray Scattering From Semiconductors And Other Materials (3rd Edition) by Fewster Paul F Pdf

This third edition has been extended considerably to incorporate more information on instrument influences on the interpretation of X-ray scattering profiles and reciprocal space maps. Another significant inclusion is on the scattering from powder samples, covering a new theoretical approach that explains features that conventional theory cannot. The new edition includes some of the latest methodologies and theoretical treatments, including the latest thinking on dynamical theory and diffuse scattering. Recent advances in detectors also present new opportunities for rapid data collection and some very different approaches in data collection techniques; the possibilities associated with these advances will be included.This edition should be of interest to those who use X-ray scattering to understand more about their samples, so that they can make a better judgment of the parameter and confidence levels in their analyses, and how the combination of instrument, sample and detection should be considered as a whole to ensure this.

Author : Paul F. Fewster
Publisher : World Scientific
Page : 510 pages
File Size : 53,8 Mb
Release : 2015
Category : Science
ISBN : 9789814436939

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X-Ray Scattering from Semiconductors and Other Materials by Paul F. Fewster Pdf

This third edition has been extended considerably to incorporate more information on instrument influences on the interpretation of X-ray scattering profiles and reciprocal space maps. Another significant inclusion is on the scattering from powder samples, covering a new theoretical approach that explains features that conventional theory cannot. The new edition includes some of the latest methodologies and theoretical treatments, including the latest thinking on dynamical theory and diffuse scattering. Recent advances in detectors also present new opportunities for rapid data collection and some very different approaches in data collection techniques; the possibilities associated with these advances will be included. This edition should be of interest to those who use X-ray scattering to understand more about their samples, so that they can make a better judgment of the parameter and confidence levels in their analyses, and how the combination of instrument, sample and detection should be considered as a whole to ensure this.

Author : Paul F. Fewster
Publisher : Imperial College Pr
Page : 299 pages
File Size : 45,6 Mb
Release : 2003
Category : Science
ISBN : 1860943608

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X-Ray Scattering from Semiconductors (2n by Paul F. Fewster Pdf

This book presents a practical guide to the analysis of materials and includes a thorough description of the underlying theories and instrumental aberrations caused by real experiments. The main emphasis concerns the analysis of thin films and multilayers, primarily semiconductors, although the techniques are very general. Semiconductors can be very perfect composite crystals and therefore their study can lead to the largest volume of information, since X-ray scattering can assess the deviation from perfection.The description is intentionally conceptual so that the reader can grasp the real processes involved. In this way the analysis becomes significantly easier, making the reader aware of misleading artifacts and assisting in the determination of a more complete and reliable analysis. The theory of scattering is very important and is covered in such a way that the assumptions are clear. Greatest emphasis is placed on the dynamical diffraction theory including new developments extending its applicability to reciprocal space mapping and modelling samples with relaxed and distorted interfaces.A practical guide to the measurement of diffraction patterns, including the smearing effects introduced to the measurement, is also presented.

Author : D. Keith Bowen,Brian K. Tanner
Publisher : CRC Press
Page : 304 pages
File Size : 43,5 Mb
Release : 2018-10-03
Category : Technology & Engineering
ISBN : 1420005650

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X-Ray Metrology in Semiconductor Manufacturing by D. Keith Bowen,Brian K. Tanner Pdf

The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.

Author : Paul F Fewster
Publisher : World Scientific
Page : 304 pages
File Size : 51,5 Mb
Release : 2000-10-27
Category : Science
ISBN : 9781783262076

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X-ray Scattering From Semiconductors by Paul F Fewster Pdf

X-ray scattering is used extensively to provide detailed structural information about materials. Semiconductors have benefited from X-ray scattering techniques as an essential feedback method for crystal growth, including compositional and thickness determination of thin layers. The methods have been developed to reveal very detailed structural information concerning material quality, interface structure, relaxation, defects, surface damage, etc.This book provides a thorough description of the techniques involved in obtaining that information, including X-ray diffractometers and their associated instrument functions, data collection methods, and the simulation of the diffraction patterns observed. Also presented are examples and procedures for interpreting the data to build a picture of the sample, much of which will be common to materials other than semiconductors./a

Author : Paul F Fewster
Publisher : World Scientific
Page : 316 pages
File Size : 55,8 Mb
Release : 2003-07-07
Category : Technology & Engineering
ISBN : 9781783260980

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X-Ray Scattering from Semiconductors by Paul F Fewster Pdf

This book presents a practical guide to the analysis of materials and includes a thorough description of the underlying theories and instrumental aberrations caused by real experiments. The main emphasis concerns the analysis of thin films and multilayers, primarily semiconductors, although the techniques are very general. Semiconductors can be very perfect composite crystals and therefore their study can lead to the largest volume of information, since X-ray scattering can assess the deviation from perfection. The description is intentionally conceptual so that the reader can grasp the real processes involved. In this way the analysis becomes significantly easier, making the reader aware of misleading artifacts and assisting in the determination of a more complete and reliable analysis. The theory of scattering is very important and is covered in such a way that the assumptions are clear. Greatest emphasis is placed on the dynamical diffraction theory including new developments extending its applicability to reciprocal space mapping and modelling samples with relaxed and distorted interfaces. A practical guide to the measurement of diffraction patterns, including the smearing effects introduced to the measurement, is also presented. Contents:An Introduction to Semiconductor MaterialsAn Introduction to X-Ray ScatteringEquipment for Measuring Diffraction PatternsA Practical Guide to the Evaluation of Structural Parameters Readership: Postgraduate researchers in crystallography, materials science, semiconductors and physics. Keywords:X-Ray;Diffraction;Scattering;Semiconductors;Rocking Curve;Reciprocal Space;Topography;High Resolution;Thin Films;Reflectometry;Dynamical Theory

Author : Martin Schmidbauer
Publisher : Springer Science & Business Media
Page : 224 pages
File Size : 40,7 Mb
Release : 2004-01-09
Category : Science
ISBN : 3540201793

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X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures by Martin Schmidbauer Pdf

This monograph represents a critical survey of the outstanding capabilities of X-ray diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.

Author : Klaus Debertin,Richard G. Helmer
Publisher : North Holland
Page : 420 pages
File Size : 42,6 Mb
Release : 1988
Category : Science
ISBN : UCAL:B5012422

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Gamma- and X-ray Spectrometry with Semiconductor Detectors by Klaus Debertin,Richard G. Helmer Pdf

Hardbound. This book covers the topics essential to gamma- and x-ray spectrometry as it is now practiced with semiconductor detectors in the energy range from 5keV to 3MeV. This includes useful physical and mathematical background information, the components of a standard photon spectrometer, spectrum analysis procedures, the energy and efficiency calibration, energy and emission-rate measurement methods and some application examples.

Author : B. G. Lowe,R. A. Sareen
Publisher : CRC Press
Page : 626 pages
File Size : 42,8 Mb
Release : 2013-12-07
Category : Technology & Engineering
ISBN : 9781466554009

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Semiconductor X-Ray Detectors by B. G. Lowe,R. A. Sareen Pdf

Identifying and measuring the elemental x-rays released when materials are examined with particles (electrons, protons, alpha particles, etc.) or photons (x-rays and gamma rays) is still considered to be the primary analytical technique for routine and non-destructive materials analysis. The Lithium Drifted Silicon (Si(Li)) X-Ray Detector, with its good resolution and peak to background, pioneered this type of analysis on electron microscopes, x-ray fluorescence instruments, and radioactive source- and accelerator-based excitation systems. Although rapid progress in Silicon Drift Detectors (SDDs), Charge Coupled Devices (CCDs), and Compound Semiconductor Detectors, including renewed interest in alternative materials such as CdZnTe and diamond, has made the Si(Li) X-Ray Detector nearly obsolete, the device serves as a useful benchmark and still is used in special instances where its large, sensitive depth is essential. Semiconductor X-Ray Detectors focuses on the history and development of Si(Li) X-Ray Detectors, an important supplement to the knowledge now required to achieve full understanding of the workings of SDDs, CCDs, and Compound Semiconductor Detectors. The book provides an up-to-date review of the principles, practical applications, and state of the art of semiconductor x-ray detectors. It describes many of the facets of x-ray detection and measurement using semiconductors, from manufacture to implementation. The initial chapters present a self-contained summary of relevant background physics, materials science, and engineering aspects. Later chapters compare and contrast the assembly and physical properties of systems and materials currently employed, enabling readers to fully understand the materials and scope for applications.

Author : Ullrich Pietsch,Vaclav Holy,Tilo Baumbach
Publisher : Springer Science & Business Media
Page : 410 pages
File Size : 49,6 Mb
Release : 2013-03-09
Category : Technology & Engineering
ISBN : 9781475740509

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High-Resolution X-Ray Scattering by Ullrich Pietsch,Vaclav Holy,Tilo Baumbach Pdf

During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.

Author : E M Anastassakis,John D Joannopoulos
Publisher : World Scientific
Page : 2768 pages
File Size : 42,9 Mb
Release : 1990-11-29
Category : Electronic
ISBN : 9789814583633

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Physics Of Semiconductors - Proceedings Of The 20th International Conference (In 3 Volumes) by E M Anastassakis,John D Joannopoulos Pdf

Gathering top experts in the field, the 20th ICPS proceedings reviews the progress in all aspects of semiconductor physics. The proceedings will include state-of-the-art lectures with special emphasis on exciting new developments. It should serve as excellent material for researchers in this and related fields.

Author : Tingkai Li,Michael Mastro,Armin Dadgar
Publisher : CRC Press
Page : 588 pages
File Size : 44,7 Mb
Release : 2016-04-19
Category : Science
ISBN : 9781439815236

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III-V Compound Semiconductors by Tingkai Li,Michael Mastro,Armin Dadgar Pdf

Silicon-based microelectronics has steadily improved in various performance-to-cost metrics. But after decades of processor scaling, fundamental limitations and considerable new challenges have emerged. The integration of compound semiconductors is the leading candidate to address many of these issues and to continue the relentless pursuit of more

Author : Tobias Schülli,Vincent Favre-Nicolin,Marie-Ingrid Richard,Gilles Renaud
Publisher : Elsevier Inc. Chapters
Page : 828 pages
File Size : 55,9 Mb
Release : 2013-04-11
Category : Science
ISBN : 9780128083376

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Characterization of Semiconductor Heterostructures and Nanostructures by Tobias Schülli,Vincent Favre-Nicolin,Marie-Ingrid Richard,Gilles Renaud Pdf

Author : D. Keith Bowen,Brian K. Tanner
Publisher : CRC Press
Page : 296 pages
File Size : 48,9 Mb
Release : 2018-10-03
Category : Technology & Engineering
ISBN : 9781420005653

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X-Ray Metrology in Semiconductor Manufacturing by D. Keith Bowen,Brian K. Tanner Pdf

The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.

Author : ASM International,EDFAS Organizing Committee, editors
Publisher : ASM International
Page : 643 pages
File Size : 44,7 Mb
Release : 2012
Category : Technology & Engineering
ISBN : 9781615039951

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ISTFA 2012 by ASM International,EDFAS Organizing Committee, editors Pdf