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Proceedings Of The Symposium On Interconnect And Contact Metallization Book in PDF, ePub and Kindle version is available to download in english. Read online anytime anywhere directly from your device. Click on the download button below to get a free pdf file of Proceedings Of The Symposium On Interconnect And Contact Metallization book. This book definitely worth reading, it is an incredibly well-written.
Author : Harzara S. Rathore
Publisher : The Electrochemical Society
Page : 292 pages
File Size : 47,8 Mb
Release : 1998
Category : Computers
ISBN : 1566771846
Author : G. S. Mathad,Hamir Singh Rathore,Y. Arita
Publisher : The Electrochemical Society
Page : 358 pages
File Size : 49,8 Mb
Release : 2000
Category : Science
ISBN : 1566772540
Author : L. B. Rothman,T. Herndon
Publisher : Unknown
Page : 288 pages
File Size : 42,6 Mb
Release : 1987
Category : Electronics
ISBN : UCAL:B4418474
Author : T. O. Herndon
Publisher : Unknown
Page : 520 pages
File Size : 42,5 Mb
Release : 1993
Category : Dielectrics
ISBN : UCAL:$B247019
Author : Paul S. Ho,Chao-Kun Hu,Martin Gall,Valeriy Sukharev
Publisher : Cambridge University Press
Page : 128 pages
File Size : 42,6 Mb
Release : 2022-05-12
Category : Technology & Engineering
ISBN : 9781009287791
Learn to assess electromigration reliability and design more resilient chips in this comprehensive and practical resource. Beginning with fundamental physics and building to advanced methodologies, this book enables the reader to develop highly reliable on-chip wiring stacks and power grids. Through a detailed review on the role of microstructure, interfaces and processing on electromigration reliability, as well as characterisation, testing and analysis, the book follows the development of on-chip interconnects from microscale to nanoscale. Practical modeling methodologies for statistical analysis, from simple 1D approximation to complex 3D description, can be used for step-by-step development of reliable on-chip wiring stacks and industrial-grade power/ground grids. This is an ideal resource for materials scientists and reliability and chip design engineers.
Author : Anonim
Publisher : Unknown
Page : 806 pages
File Size : 53,8 Mb
Release : 2006
Category : Integrated circuits
ISBN : UOM:39015058764807
Author : Electrochemical Society. Dielectric Science and Technology Division,Electrochemical Society. Electrodeposition Division,Electrochemical Society. Meeting
Publisher : Unknown
Page : 290 pages
File Size : 45,5 Mb
Release : 1999
Category : Science
ISBN : UOM:39015057617741
Author : Yoshio Nishi,Robert Doering
Publisher : CRC Press
Page : 1720 pages
File Size : 41,9 Mb
Release : 2017-12-19
Category : Technology & Engineering
ISBN : 9781420017663
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Author : J. W. McPherson
Publisher : Springer
Page : 463 pages
File Size : 43,6 Mb
Release : 2018-12-20
Category : Technology & Engineering
ISBN : 9783319936833
This third edition textbook provides the basics of reliability physics and engineering that are needed by electrical engineers, mechanical engineers, civil engineers, biomedical engineers, materials scientists, and applied physicists to help them to build better devices/products. The information contained within should help all fields of engineering to develop better methodologies for: more reliable product designs, more reliable materials selections, and more reliable manufacturing processes— all of which should help to improve product reliability. A mathematics level through differential equations is needed. Also, a familiarity with the use of excel spreadsheets is assumed. Any needed statistical training and tools are contained within the text. While device failure is a statistical process (thus making statistics important), the emphasis of this book is clearly on the physics of failure and developing the reliability engineering tools required for product improvements during device-design and device-fabrication phases.
Author : James R. Lloyd
Publisher : Unknown
Page : 214 pages
File Size : 46,6 Mb
Release : 1985
Category : Electrodiffusion
ISBN : PSU:000011177180
Author : Krishna Seshan,Dominic Schepis
Publisher : William Andrew
Page : 470 pages
File Size : 55,8 Mb
Release : 2018-02-23
Category : Technology & Engineering
ISBN : 9780128123126
Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics
Author : G. S. Mathad
Publisher : The Electrochemical Society
Page : 262 pages
File Size : 48,8 Mb
Release : 2001
Category : Science
ISBN : 156677294X
Author : Anonim
Publisher : Unknown
Page : 128 pages
File Size : 43,8 Mb
Release : 2016
Category : Interconnects (Integrated circuit technology)
ISBN : 150900386X
Author : Günter Weimann,Hans S. Rupprecht,G. Weimann
Publisher : CRC Press
Page : 880 pages
File Size : 46,6 Mb
Release : 1994-01-01
Category : Technology & Engineering
ISBN : 075030295X
Gallium Arsenide and Related Compounds 1993 covers III-V compounds from crystal growth of materials to their device applications. Focusing on the fields of optical communications and satellite broadcasting, the book describes the practical applications for GaAs and III-V compounds in devices and circuits, both conventional and those based on quantum effects. It also discusses ultrafast GaAs transistors and integrated circuits, novel laser diodes, and tunneling devices, and considers the direction for future technologies. In addition, this volume addresses the increasing demands of ultra high speed systems that require careful selection of III-V materials to optimize the performance of electronic and optoelectronic components. It is ideal reading for physicists, materials scientists, electrical, and electronics engineers investigating III-V compound materials, properties, and devices.
Author : Harzara S. Rathore,G. C. Schwartz,Robin A. Susko
Publisher : Unknown
Page : 516 pages
File Size : 50,9 Mb
Release : 1989
Category : Integrated circuits
ISBN : STANFORD:36105030501295
