Download Full eBooks in PDF
Semiconductor Silicon 1981 Book in PDF, ePub and Kindle version is available to download in english. Read online anytime anywhere directly from your device. Click on the download button below to get a free pdf file of Semiconductor Silicon 1981 book. This book definitely worth reading, it is an incredibly well-written.
Author : Howard R. Huff,Rudolph J. Kriegler,Yoshiyuki Takeishi
Publisher : Unknown
Page : 1076 pages
File Size : 48,8 Mb
Release : 1981
Category : Semiconductors
ISBN : CORNELL:31924004820746
Author : Howard R. Huff,László Fábry,Seigo Kishino
Publisher : The Electrochemical Society
Page : 650 pages
File Size : 51,5 Mb
Release : 2002
Category : Science
ISBN : 1566773741
Author : Dieter K. Schroder
Publisher : John Wiley & Sons
Page : 800 pages
File Size : 49,8 Mb
Release : 2006-02-10
Category : Technology & Engineering
ISBN : 9780471749080
This Third Edition updates a landmark text with thelatest findings The Third Edition of the internationally laudedSemiconductor Material and Device Characterization bringsthe text fully up-to-date with the latest developments in the fieldand includes new pedagogical tools to assist readers. Not only doesthe Third Edition set forth all the latest measurementtechniques, but it also examines new interpretations and newapplications of existing techniques. Semiconductor Material and Device Characterizationremains the sole text dedicated to characterization techniques formeasuring semiconductor materials and devices. Coverage includesthe full range of electrical and optical characterization methods,including the more specialized chemical and physical techniques.Readers familiar with the previous two editions will discover athoroughly revised and updated Third Edition, including: Updated and revised figures and examples reflecting the mostcurrent data and information 260 new references offering access to the latest research anddiscussions in specialized topics New problems and review questions at the end of each chapter totest readers' understanding of the material In addition, readers will find fully updated and revisedsections in each chapter. Plus, two new chapters have been added: Charge-Based and Probe Characterization introduces charge-basedmeasurement and Kelvin probes. This chapter also examinesprobe-based measurements, including scanning capacitance, scanningKelvin force, scanning spreading resistance, and ballistic electronemission microscopy. Reliability and Failure Analysis examines failure times anddistribution functions, and discusses electromigration, hotcarriers, gate oxide integrity, negative bias temperatureinstability, stress-induced leakage current, and electrostaticdischarge. Written by an internationally recognized authority in the field,Semiconductor Material and Device Characterization remainsessential reading for graduate students as well as forprofessionals working in the field of semiconductor devices andmaterials. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment.
Author : Anonim
Publisher : Unknown
Page : 894 pages
File Size : 42,6 Mb
Release : 1998
Category : Semiconductors
ISBN : UIUC:30112032998889
Author : Anonim
Publisher : Unknown
Page : 1146 pages
File Size : 54,5 Mb
Release : 1986
Category : Semiconductors
ISBN : UCAL:B4492024
Author : Fumio Shimura
Publisher : Elsevier
Page : 435 pages
File Size : 43,6 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9780323150484
Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.
Author : Anonim
Publisher : Academic Press
Page : 711 pages
File Size : 48,5 Mb
Release : 1994-08-15
Category : Technology & Engineering
ISBN : 9780080864396
This volume reviews the latest understanding of the behavior and roles of oxygen in silicon, which will carry the field into the ULSI era from the experimental and theoretical points of view. The fourteen chapters, written by recognized authorities representing industrial and academic institutions, cover thoroughly the oxygen related phenomena from the crystal growth to device fabrication processes, as well as indispensable diagnostic techniques for oxygen. Comprehensive study of the behavior of oxygen in silicon Discusses silicon crystals for VLSI and ULSI applications Thorough coverage from crystal growth to device fabrication Edited by technical experts in the field Written by recognized authorities from industrial and academic institutions Useful to graduate students, scientists in other disciplines, and active participants in the arena of silicon-based microelectronics research 297 original line drawings
Author : Hisham Z. Massoud
Publisher : The Electrochemical Society
Page : 686 pages
File Size : 41,6 Mb
Release : 1997
Category : Computers
ISBN : 1566771307
Author : United States. National Bureau of Standards
Publisher : Unknown
Page : 116 pages
File Size : 50,8 Mb
Release : 1988
Category : Integrated circuits
ISBN : COLUMBIA:CU14496372
Author : National Institute of Standards and Technology (U.S.)
Publisher : Unknown
Page : 140 pages
File Size : 44,9 Mb
Release : 1990
Category : Semiconductors
ISBN : IND:30000097323293
Author : Dinesh C. Gupta
Publisher : ASTM International
Page : 472 pages
File Size : 44,6 Mb
Release : 1989
Category : Metallizing
ISBN : 9780803112735
Author : Badih El-Kareh,Lou N. Hutter
Publisher : Springer Science & Business Media
Page : 605 pages
File Size : 53,8 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9781461522096
The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.
Author : Benedetto Vigna,Paolo Ferrari,Flavio Francesco Villa,Ernesto Lasalandra,Sarah Zerbini
Publisher : Springer Nature
Page : 988 pages
File Size : 48,5 Mb
Release : 2022-04-12
Category : Technology & Engineering
ISBN : 9783030801359
This book thoroughly reviews the present knowledge on silicon micromechanical transducers and addresses emerging and future technology challenges. Readers will acquire a solid theoretical and practical background that will allow them to analyze the key performance aspects of devices, critically judge a fabrication process, and then conceive and design new ones for future applications. Envisioning a future complex versatile microsystem, the authors take inspiration from Richard Feynman’s visionary talk “There is Plenty of Room at the Bottom” to propose that the time has come to see silicon sensors as part of a “Feynman Roadmap” instead of the “More-than-Moore” technology roadmap. The sharing of the author’s industrially proven track record of development, design, and manufacturing, along with their visionary approach to the technology, will allow readers to jump ahead in their understanding of the core of the topic in a very effective way. Students, researchers, engineers, and technologists involved in silicon-based sensor and actuator research and development will find a wealth of useful and groundbreaking information in this book.
Author : Klaus Graff
Publisher : Springer Science & Business Media
Page : 228 pages
File Size : 45,9 Mb
Release : 2013-03-08
Category : Technology & Engineering
ISBN : 9783642975936
A discussion of the different mechanisms responsible for contamination together with a survey of their impact on device performance. The author examines the specific properties of main and rare impurities in silicon, as well as the detection methods and requirements in modern technology. Finally, impurity gettering is studied along with modern techniques to determine gettering efficiency. Throughout all of these subjects, the book presents only reliable and up-to-date data so as to provide a thorough review of recent scientific investigations.
Author : Yoshio Nishi,Robert Doering
Publisher : CRC Press
Page : 1720 pages
File Size : 41,7 Mb
Release : 2017-12-19
Category : Technology & Engineering
ISBN : 9781420017663
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.