Download Full eBooks in PDF
The Stopping And Range Of Ions In Solids Book in PDF, ePub and Kindle version is available to download in english. Read online anytime anywhere directly from your device. Click on the download button below to get a free pdf file of The Stopping And Range Of Ions In Solids book. This book definitely worth reading, it is an incredibly well-written.
Author : James F. Ziegler,Jochen P. Biersack,U. Littmark
Publisher : Unknown
Page : 0 pages
File Size : 49,8 Mb
Release : 1985
Category : Electronic
ISBN : OCLC:636439962
Author : James F. Ziegler,J. P. Biersack,Uffe Littmark
Publisher : Unknown
Page : 321 pages
File Size : 54,6 Mb
Release : 1985
Category : Electronic
ISBN : OCLC:488796481
Author : H. Ryssel,H. Glawischnig
Publisher : Springer Science & Business Media
Page : 377 pages
File Size : 41,9 Mb
Release : 2012-12-06
Category : Science
ISBN : 9783642687792
In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.
Author : J. F. Ziegler
Publisher : Unknown
Page : 43 pages
File Size : 46,7 Mb
Release : 1982
Category : Electronic
ISBN : OCLC:931957494
Author : J. F. Ziegler
Publisher : Unknown
Page : 367 pages
File Size : 50,5 Mb
Release : 1977
Category : Electronic
ISBN : 0080216064
Author : James F. Ziegler,J. P. Biersack,Matthias D. Ziegler
Publisher : Lulu.com
Page : 683 pages
File Size : 53,6 Mb
Release : 2008
Category : Ion bombardment
ISBN : 096542071X
"This is a textbook the gives the background of the stopping and range of ions in matter (www.SRIM.org). It is written to be the prime resource for those who use SRIM in scientific work."--Lulu.com.
Author : H. Schlüter,A. Shivarova
Publisher : Springer Science & Business Media
Page : 580 pages
File Size : 45,8 Mb
Release : 2013-06-29
Category : Science
ISBN : 9789401706339
This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas
Author : Muradin Abubekirovich Kumakhov,Fadeĭ Fadeevich Komarov
Publisher : CRC Press
Page : 310 pages
File Size : 47,7 Mb
Release : 1981
Category : Ion implanation
ISBN : 0677212208
Author : Michael Nastasi,James W. Mayer,James K. Hirvonen
Publisher : Cambridge University Press
Page : 572 pages
File Size : 47,9 Mb
Release : 1996-03-29
Category : Science
ISBN : 9780521373760
Comprehensive guide to an important materials science technique for students and researchers.
Author : J.F. Ziegler
Publisher : Elsevier
Page : 324 pages
File Size : 47,9 Mb
Release : 2013-10-22
Category : Science
ISBN : 9781483100968
Hydrogen: Stopping Powers and Ranges in All Elements, Volume 3 of The Stopping and Ranges of Ions in Matter, provides a nearly complete presentation of absolute experimental energy loss data for hydrogen over the energy range 10 keV The book is comprised of seven parts that present various topics about stopping power theory. Part I provides an introductory discourse about the book. Part II reviews the stopping power theory, and Part III presents the status of experimental data. Part IV talks about fitting the high-energy region, while Part V deals with fitting at low energies. Part VI covers interpolation using two-parameter fitting, and Part VII discusses pathlength and projected range. The text will be of great interest to researchers whose work concerns the stopping and ranges of ions in matter.
Author : J.F. Ziegler
Publisher : Elsevier
Page : 648 pages
File Size : 44,7 Mb
Release : 2012-12-02
Category : Science
ISBN : 9780323144018
Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
Author : C.J. McHargue,R. Kossowsky,Wolfgang O. Hofer
Publisher : Springer Science & Business Media
Page : 517 pages
File Size : 40,7 Mb
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9789400909830
The use of ion beams for the modification of the structure and properties of the near-surface region of ceramics began in earnest in the early 19805. Since the mechanical properties of such materials are dominated by surface flaws and the surface stress state, the use of surface modification tech niques would appear to be an obvious application. As is often the case in research and development, most of the initial studies can be characterized as cataloging the response of various ceramic materials to a range of ion beam treatments. The systematic study of material and ion beam parameters is well underway and we are now designing experiments to provide specific information about the processing parameter - structure-property rela tionships. This NATO-Advanced Study Institute was convened in order to assess our current state of knowledge in this field, to identify opportunities and needs for further research, and to identify the potential of such processes for technological application. It became apparent that this class of inorganic compounds, loosely termed ceramics, presents many challenges to the understanding of ion-solid inter actions, the relationships among ion-beam parameters, materials parameters, and the resulting structures, as well as relationships between structure and properties. In many instances, this understanding will represent a major extension of that learned from the study of metals and semiconductors.
Author : Hartmut Frey,Hamid R. Khan
Publisher : Springer Science & Business Media
Page : 380 pages
File Size : 43,7 Mb
Release : 2015-05-06
Category : Technology & Engineering
ISBN : 9783642054303
“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.
Author : Wolfgang Eckstein
Publisher : Springer Science & Business Media
Page : 303 pages
File Size : 53,5 Mb
Release : 2013-03-12
Category : Science
ISBN : 9783642735134
In this book the author discusses the investigation of ion bombardment of solids by computer simulation, with the aim of demonstrating the usefulness of this approach to the problem of interactions of ions with solids. The various chapters present the basic physics behind the simulation programs, their structure and many applications to different topics. The two main streams, the binary collision model and the classical dynamics model, are discussed, as are interaction potentials and electronic energy losses. The main topics investigated are backscattering, sputtering and implantation for incident atomic particles with energies from the eV to the MeV range. An extensive overview of the literature is given, making this book of interest to the active reseacher as well to students entering the field.
Author : J.F. Ziegler
Publisher : Elsevier
Page : 508 pages
File Size : 53,7 Mb
Release : 2012-12-02
Category : Science
ISBN : 9780323161657
Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject. The book is divided into two parts - Part 1: Ion Implantation Science and Part 2: Ion Implantation Technology. Part 1 covers topics such as the stopping and range of ions in solids; ion implantation damage in silicon; experimental annealing and activation; and the measurement on ion implantation. Part 2 includes ion optics and focusing on implanter design; photoresist problems and particle contamination; ion implantation diagnostics and process control; and emission of ionizing radiation from ion implanters. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.