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Author : Hans Paul Zappe
Publisher : Unknown
Page : 498 pages
File Size : 54,8 Mb
Release : 1989
Category : Electronic
ISBN : UCAL:$C73258
Author : Anonim
Publisher : Unknown
Page : 896 pages
File Size : 43,7 Mb
Release : 1995
Category : Dissertation abstracts
ISBN : UOM:39015086908210
Author : J Pimbley
Publisher : Elsevier
Page : 305 pages
File Size : 51,6 Mb
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 9780323156806
Advanced CMOS Process Technology is part of the VLSI Electronics Microstructure Science series. The main topic of this book is complementary metal-oxide semiconductor or CMOS technology, which plays a significant part in the electronics systems. The topics covered in this book range from metallization, isolation techniques, reliability, and yield. The volume begins with an introductory chapter that discusses the microelectronics revolution of the 20th century. Then Chapter 2 puts focus on the CMOS devices and circuit background, discussing CMOS capacitors and field effect transistors. Metallization topics and concepts are covered in Chapter 3, while isolation techniques are tackled in Chapter 4. Long-term reliability of CMOS is the topic covered in Chapter 5. Finally, the ability of semiconductor technology to yield circuits is discussed in Chapter 6. The book is particularly addressed to engineers, scientists, and technical managers.
Author : Anonim
Publisher : Unknown
Page : 994 pages
File Size : 50,5 Mb
Release : 2008
Category : Dissertations, Academic
ISBN : STANFORD:36105131549656
Author : Khaled Elleithy
Publisher : Springer Science & Business Media
Page : 582 pages
File Size : 55,7 Mb
Release : 2010-03-10
Category : Computers
ISBN : 9789048136605
Advanced Techniques in Computing Sciences and Software Engineering includes a set of rigorously reviewed world-class manuscripts addressing and detailing state-of-the-art research projects in the areas of Computer Science, Software Engineering, Computer Engineering, and Systems Engineering and Sciences. Advanced Techniques in Computing Sciences and Software Engineering includes selected papers form the conference proceedings of the International Conference on Systems, Computing Sciences and Software Engineering (SCSS 2008) which was part of the International Joint Conferences on Computer, Information and Systems Sciences and Engineering (CISSE 2008).
Author : Anonim
Publisher : Unknown
Page : 624 pages
File Size : 53,5 Mb
Release : 1988
Category : Cryoelectronics
ISBN : UCAL:B4295438
Author : Ban P. Wong,Anurag Mittal,Greg W. Starr,Franz Zach,Victor Moroz,Andrew Kahng
Publisher : John Wiley & Sons
Page : 408 pages
File Size : 50,8 Mb
Release : 2008-12-29
Category : Technology & Engineering
ISBN : 9780470382813
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.
Author : David Huang
Publisher : The Electrochemical Society
Page : 1124 pages
File Size : 52,6 Mb
Release : 2009-03
Category : Science
ISBN : 9781566777032
ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Author : J. A. Martino,J. P. Raskin,S. Selberherr,H. Ishii,F. Gamiz,B. Y. Nguyen,A. Yoshino
Publisher : The Electrochemical Society
Page : 230 pages
File Size : 53,5 Mb
Release : 2018-05-04
Category : Science
ISBN : 9781607688365
Author : F. Roozeboom
Publisher : The Electrochemical Society
Page : 377 pages
File Size : 55,9 Mb
Release : 2011-04-25
Category : Science
ISBN : 9781566778633
This issue of ECS Transactions covers emerging materials, process and technology options for large-area silicon wafers to enhance advanced IC performance or to enable revolutionary device structures with entirely new functionalities. Topics : high-mobility channel materials, (e.g. strained Si/Ge, compound semiconductors and graphene), high-performance gate stacks and low-resistivity junctions and contacts on new, Si-compatible materials; new materials and processes for 3-D (TSV) integration ; synthesis of nano-structures including wires, pores and membranes of Si-compatible materials; novel MEMS/NEMS structures and their integration with the mainstream Si-IC technology.
Author : Oleg Semenov,Hossein Sarbishaei,Manoj Sachdev
Publisher : Springer Science & Business Media
Page : 237 pages
File Size : 50,8 Mb
Release : 2008-04-26
Category : Technology & Engineering
ISBN : 9781402083013
ESD Protection Device and Circuit Design for Advanced CMOS Technologies is intended for practicing engineers working in the areas of circuit design, VLSI reliability and testing domains. As the problems associated with ESD failures and yield losses become significant in the modern semiconductor industry, the demand for graduates with a basic knowledge of ESD is also increasing. Today, there is a significant demand to educate the circuits design and reliability teams on ESD issues. This book makes an attempt to address the ESD design and implementation in a systematic manner. A design procedure involving device simulators as well as circuit simulator is employed to optimize device and circuit parameters for optimal ESD as well as circuit performance. This methodology, described in ESD Protection Device and Circuit Design for Advanced CMOS Technologies has resulted in several successful ESD circuit design with excellent silicon results and demonstrates its strengths.
Author : Anonim
Publisher : Unknown
Page : 692 pages
File Size : 46,8 Mb
Release : 1995
Category : Aeronautics
ISBN : MINN:30000006324630
Author : Xiuying Wang,Bangxian Mo
Publisher : World Scientific Publishing Company
Page : 880 pages
File Size : 55,8 Mb
Release : 1986
Category : Technology & Engineering
ISBN : UOM:39015011737635
Patterning technology; Selective doping techniques; Materials; Rapid thermal annealing; Thin film technology; Amorphous silicon; Superconductor electronics; Advanced device technology; MOS and bipolar technology; Circuit design; Silicon on insulator technologies; Yield/reliability; Process characterization; Materials characterization; Fab operations.
Author : Anonim
Publisher : Unknown
Page : 2540 pages
File Size : 48,6 Mb
Release : 2002
Category : Chemistry
ISBN : UOM:39015057321377
Author : IEEE, Taipei Section Staff
Publisher : Unknown
Page : 328 pages
File Size : 52,9 Mb
Release : 2001
Category : Technology & Engineering
ISBN : CORNELL:31924091322374
