Ion Beam Induced Defects And Their Effects In Oxide Materials
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Ion Beam Induced Defects and Their Effects in Oxide Materials by Parmod Kumar,Jitendra Pal Singh,Vinod Kumar,K. Asokan Pdf
This book provides an overview of the applications of ion beam techniques in oxide materials. Oxide materials exhibit defect-induced physical properties relevant to applications in sensing, optoelectronics and spintronics. Defects in these oxide materials also lead to magnetism in non-magnetic materials or to a change of magnetic ordering in magnetic materials. Thus, an understanding of defects is of immense importance. To date, ion beam tools are considered the most effective techniques for producing controlled defects in these oxides. This book will detail the ion beam tools utilized for creating defects in oxides.
Defect-Induced Magnetism in Oxide Semiconductors by Parmod Kumar,Jitendra Pal Singh,Vinod Kumar Pdf
Defect-Induced Magnetism in Oxide Semiconductors provides an overview of the latest advances in defect engineering to create new magnetic materials and enable new technological applications. First, the book introduces the mechanisms, behavior, and theory of magnetism in oxide semiconductors and reviews the methods of inducing magnetism in these materials. Then, strategies such as pulsed laser deposition and RF sputtering to grow oxide nanostructured materials with induced magnetism are discussed. This is followed by a review of the most relevant postdeposition methods to induce magnetism in oxide semiconductors including annealing, ion irradiation, and ion implantation. Examples of defect-induced magnetism in oxide semiconductors are provided along with selected applications. This book is a suitable reference for academic researchers and practitioners and for people engaged in research and development in the disciplines of materials science and engineering. Reviews the magnetic, electrical, dielectric and optical properties of oxide semiconductors with defect-induced magnetism Discusses growth and post-deposition strategies to grow oxide nanostructured materials such as oxide thin films with defect-induced magnetism Provides examples of materials with defect-induced magnetism such as zinc oxide, cerium dioxide, hafnium dioxide, and more
Calcium-Based Materials by S.S. Nanda,Jitendra Pal Singh,Sanjeev Gautam,Dong Kee Yi Pdf
Calcium-based natural minerals are important for a wide range of applications. Though these materials are available in nature, researchers are working toward developing them in the laboratory. Calcium-Based Materials: Processing, Characterization, and Applications introduces the possibility of designing these materials for particular applications. Introduces a variety of calcium-based materials and discusses synthesis, growth, and stability Provides in-depth coverage of calcium carbonate Discusses applications of calcium-based minerals in different fields Includes details on synchrotron X-ray tools for case minerals This comprehensive text is aimed at researchers in materials science, engineering, and bioengineering.
Advanced Synthesis and Medical Applications of Calcium Phosphates by S.S. Nanda,Jitendra Pal Singh,Sanjeev Gautam,Dong Kee Yi Pdf
Calcium phosphate materials are used in many medical and dental applications. Advanced Synthesis and Medical Applications of Calcium Phosphates covers the structure, chemistry, synthesis, and properties of both natural and synthetic calcium-based biomaterials and details a variety of medical applications. Depicts the latest advances in using calcium phosphates in bone regeneration and tissue engineering Includes the latest generation of regenerative biomaterials with an integrated perspective combining both research and clinical issues Provides an understanding of the clinical targets and requirements for regenerative medicine Detailing fundamentals through applications, this book helps biomaterials researchers to better understand the clinical targets and requirements for use of these materials for optimal synthesis and development.
Metal Oxide Defects by Vijay Kumar,Sudipta Som,Vishal Sharma,Hendrik C. Swart Pdf
Metal Oxide Defects: Fundamentals, Design, Development and Applications provides a broad perspective on the development of advanced experimental techniques to study defects and their chemical activity and catalytic reactivity in various metal oxides. This book highlights advances in characterization and analytical techniques to achieve better understanding of a wide range of defects, most importantly, state-of-the-art methodologies for controlling defects. The book provides readers with pathways to apply basic principles and interpret the behavior of metal oxides. After reviewing characterization and analytical techniques, the book focuses on the relationship of defects to the properties and performance of metal oxides. Finally, there is a review of the methods to control defects and the applications of defect engineering for the design of metal oxides for applications in optoelectronics, energy, sensing, and more. This book is a key reference for materials scientists and engineers, chemists, and physicists. Reviews advances in characterization and analytical techniques to understand the behavior of defects in metal oxide materials Introduces defect engineering applied to the design of metal oxide materials with desirable properties Discusses applications of defect engineering to enhance the performance of materials for a wide range of applications, with an emphasis on optoelectronics
Beam Effects, Surface Topography, and Depth Profiling in Surface Analysis by Alvin W. Czanderna,Theodore E. Madey,Cedric J. Powell Pdf
Many books are available that detail the basic principles of the different methods of surface characterization. On the other hand, the scientific literature provides a resource of how individual pieces of research are conducted by particular labo- tories. Between these two extremes the literature is thin but it is here that the present volume comfortably sits. Both the newcomer and the more mature scientist will find in these chapters a wealth of detail as well as advice and general guidance of the principal phenomena relevant to the study of real samples. In the analysis of samples, practical analysts have fairly simple models of how everything works. Superimposed on this ideal world is an understanding of how the parameters of the measurement method, the instrumentation, and the char- teristics of the sample distort this ideal world into something less precise, less controlled, and less understood. The guidance given in these chapters allows the scientist to understand how to obtain the most precise and understood measu- ments that are currently possible and, where there are inevitable problems, to have clear guidance as the extent of the problem and its likely behavior.
Ion-Irradiation-Induced Damage in Nuclear Materials by Diana Bachiller Perea Pdf
This thesis investigates the behavior of two candidate materials (a-SiO2 and MgO) for applications in fusion (e.g., the International Thermonuclear Experimental Reactor ITER) and Generation IV fission reactors. Both parts of the thesis – the development of the ionoluminescence technique and the study of the ion-irradiation effects on both materials – are highly relevant for the fields of the ion-beam analysis techniques and irradiation damage in materials. The research presented determines the microstructural changes at different length scales in these materials under ion irradiation. In particular, it studies the effect of the irradiation temperature using several advanced characterization techniques. It also provides much-needed insights into the use of these materials at elevated temperatures. Further, it discusses the development of the ion-beam-induced luminescence technique in different research facilities around the globe, a powerful in situ spectroscopic characterization method that until now was little known. Thanks to its relevance, rigorosity and quality, this thesis has received twoprestigious awards in Spain and France.
Ion Beam Modification of Materials by J.S. Williams,R.G. Elliman,M.C. Ridgway Pdf
This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Radiation Synthesis of Materials and Compounds by Boris Ildusovich Kharisov,Oxana Vasilievna Kharissova,Ubaldo Ortiz Mendez Pdf
Researchers and engineers working in nuclear laboratories, nuclear electric plants, and elsewhere in the radiochemical industries need a comprehensive handbook describing all possible radiation-chemistry interactions between irradiation and materials, the preparation of materials under distinct radiation types, the possibility of damage of material
Author : John M. Hanchar,Paul W. O. Hoskin Publisher : Walter de Gruyter GmbH & Co KG Page : 520 pages File Size : 42,5 Mb Release : 2018-12-17 Category : Science ISBN : 9781501509322
Volume 53 of Reviews in Mineralogy and Geochemistry covers the most important aspects of zircon-related research over the past twenty-years and highlight possible future research avenues. The chapters review the structure of zircon and other mineral (and synthetic) phases with the zircon structure; the minor and trace element compositions of igneous, metamorphic and hydrothermal zircons; the study of melt inclusions in zircon; experimental and natural studies of zircon saturation and the use of zircon saturation thermometry for natural rocks; cation diffusion and oxygen diffusion in zircon; the historical development of zircon geochronology from the mid-1950s to the present; ID-TIMS, SIMS and ICP-MS; the application of zircon chronology in constraining sediment provenance and the calibration ofthe geologic time-scale; other isotopic systematics; the spectroscopy of zircon, both crystalline and metamict and an atlas of internal textures of zircon.
Scientific and Technical Aerospace Reports by Anonim Pdf
Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physiochemical Characterization by Anonim Pdf
Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer afterhigh temperature annealing. Electrical and Physicochemical Characterization focuses on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented. Provides basic knowledge of ion implantation-induced defects Focuses on physical mechanisms of defect annealing Utilizes electrical and physico-chemical characterization tools for processed semiconductors Provides the basis for understanding the problems caused by the defects generated by implantation and the means for their characterization and elimination
Ion Beam Modification of Solids by Werner Wesch,Elke Wendler Pdf
This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the physical basics of ion-solid interaction and on ion-beam induced structural modifications of solids. Ion beams are widely used to modify the physical properties of materials. A complete theory of ion stopping in matter and the calculation of the energy loss due to nuclear and electronic interactions are presented including the effect of ion channeling. To explain structural modifications due to high electronic excitations, different concepts are presented with special emphasis on the thermal spike model. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed. The effect of nuclear and electronic energy loss on structural modifications of solids such as damage formation, phase transitions and amorphization is reviewed for insulators and semiconductors. Finally some selected applications of ion beams are given.
Engineering Thin Films and Nanostructures with Ion Beams by Emile Knystautas Pdf
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th